| HS Code | 783702 |
| Viscosity At 25c | 300-600 mPa·s |
| Cure Time At 100c | 10-30 minutes |
| Glass Transition Temperature Tg | >140 °C |
| Cte Below Tg | <30 ppm/°C |
| Cte Above Tg | <100 ppm/°C |
| Dielectric Constant At 1mhz | 3.0-4.0 |
| Dielectric Strength | >15 kV/mm |
| Volume Resistivity | >10^13 Ω·cm |
| Moisture Absorption | <0.5 wt% after immersion |
| Operating Temperature Range | -55 °C to +150 °C |
| Shelf Life At 20c | 6 months from date of manufacture |
| Filler Content Silica | 55-70 wt% |
As an accredited Underfill Adhesive (Low Viscosity) Electronic/EL Grade factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.
| Packing | Packaged in a sealed 10 mL syringe for precise dispensing. Low viscosity, electronic/EL grade underfill adhesive for reliable chip encapsulation. |
| Container Loading (20′ FCL) | 20′ FCL: drummed or bottled underfill adhesive, low viscosity electronic grade, palletized and secured for safe transport. |
| Shipping | Ship as **UN3082, Environmentally Hazardous Substance, Liquid, n.o.s. (contains epoxy resin), Class 9, PG III**. Use UN-approved sealed containers with absorbent material and cushioned outer packaging. Keep upright, away from heat/moisture. Label with Class 9 and environmentally hazardous marks. Include technical name and emergency response details on shipping documents. |
| Storage | Store in original, tightly sealed container in a cool, dry, dark environment, ideally refrigerated at 2–8°C. Keep away from heat, sunlight, and moisture sources. Before use, allow the adhesive to warm to room temperature unopened to prevent condensation. Follow manufacturer’s expiration dates and avoid contamination. |
| Shelf Life | Shelf life is typically 6 months when unopened and stored cool, dry, and away from light. |
Flip-chip capillary underfill for mobile application processors is specified around a dispense flow window that matches a 10 mm × 10 mm silicon die and a 40 µm stand-off gap on an Ajinomoto build-up film substrate. The material is a single-component epoxy-anhydride system loaded with 55–65 wt% fused silica; maximum filler diameter is held below 2 µm to prevent filler segregation at the 80 µm bump pitch. Viscosity is characterized by cone-and-plate viscometry at 25 °C per ASTM D4287, with a typical range of 5,000–12,000 mPa·s at 25 °C and 200–500 mPa·s at the 110 °C dispensing temperature because viscosity falls sharply with temperature. The dispensing sequence after lead-free solder reflow is single-pass, L-shaped, or two-edge; substrate preheat is set at 110 °C, and flow completion for a 10 mm die is typically 60–120 s. Fillet height is maintained between 50% and 75% of the die thickness to avoid over-wicking onto the die backside and to preserve the drop-test load path. Cure is performed in an in-line convection oven with a profile of 150 °C for 10 min followed by 165 °C for 30 min; secondary reflow exposure above 240 °C is generally outside the intended process envelope because the cured anhydride-epoxide network begins to decompose. Post-cure inspection uses scanning acoustic microscopy per MIL-STD-883 TM 2035 to reject voids larger than 5% of the die area. Reliability testing follows JEDEC JESD22-B111 for handheld drop performance; the package is mounted on a 132 mm × 66 mm test board and subjected to 1,500 g acceleration shocks, with underfill adhesion loss being the primary failure mode after 30 drops. Electrical grades also require hydrolyzable chloride below 50 ppm and total sodium below 5 ppm when extracted by IPC-TM-650 method 2.3.25. Solder flux residues must be low-residue no-clean types because acidic flux activators inhibit anhydride cure and increase interfacial void density. The terminal part is a flip-chip chip-scale package within a smartphone applications processor; production bottlenecks are mostly dispense needle clogging from filler settling in the syringe after 8 h stops, which is controlled by resuspension or by single-use dispense cartridges.
In automotive radar module assembly, the underfill must function under AEC-Q100 Grade 1 thermal conditions, which define ambient operating temperature from -40 °C to +125 °C, with qualification extrapolations to 150 °C for high-temperature storage. The dominant stress is coefficient-of-thermal-expansion mismatch between a 300 µm-thick gallium arsenide or silicon germanium transmitter die and an organic substrate; low-viscosity formulations with a 25–30 ppm/K CTE below glass transition and 85–100 ppm/K above glass transition are selected to reduce corner stress after 1,000 cycles of JESD22-A104 Condition G thermal cycling. Filler loading is normally 60–65 wt% silica, and the maximum filler size is held below 1.5 µm because radar substrate routing often places the flip-chip die adjacent to dense ball-grid-array escape patterns. The substrate is prebaked at 125 °C for 4 h, then plasma-cleaned with an argon-oxygen mixture before underfill placement. Dispense temperature is 90 °C, flow time for an 8 mm × 8 mm die with a 45 µm gap is 90–180 s, and cure is fixed at 165 °C for 30 min. Single-component syringes require frozen storage at -40 °C and documented thawing at room temperature for 30 min before use. Qualification includes JESD22-A110 HAST at 130 °C/85% RH for 96 h, high-temperature storage at 150 °C for 1,000 h, and ionic extraction showing chloride below 10 ppm and sodium below 5 ppm by IPC-TM-650 method 2.3.25. Regulatory compliance is verified against RoHS 2011/65/EU, REACH 1907/2006, and the halogen-free limits of IEC 61249-2-21. Voids at the die edge under RF power cycling create localized hot-spot formation, so edge fillet inspection is performed at 25× magnification after cure. The terminal product is a sealed ADAS radar transceiver module operating from 76 GHz to 81 GHz.
A standard high-filler underfill placed into a 28 GHz antenna-in-package assembly shifts the effective dielectric constant of transmission lines and can detune patch antenna elements. For 28 GHz and 39 GHz phased-array modules, low-viscosity RF-grade underfills use fused-silica filler loadings of 50–60 wt% and avoid alumina or thermally conductive fillers that raise dielectric loss. The resin system is one-part epoxy-anhydride, cured at 150 °C for 20 min after capillary flow at 100 °C. The dispense volume for a 7 mm × 7 mm beamformer die at a 35 µm gap is approximately 2.5 µL, with an additional 0.5–1.0 µL to form a controlled fillet. Fillet height is kept below 50% of the die thickness to limit RF scattering at the die edge; process audits use laser triangulation rather than visual comparison. The cured network has a glass transition temperature of 135–150 °C, dielectric constant of 3.0–3.4 at 10 GHz, and dissipation factor below 0.010 at 10 GHz; published data for this specific configuration at 28 GHz is limited because cavity-resonator and on-wafer extraction methods are not standardized across substrate suppliers. Compliance is verified to RoHS 2011/65/EU, IEC 61249-2-21 halogen-free limits, and UL 94 V-0 at the assembled module level. Organosilicon mold-release residues are incompatible with this application because they reduce fillet wetting and shift the RF path at the die edge. The terminal part is a phased-array antenna module used in fixed wireless access customer premises equipment and mmWave small-cell radios; production yield losses are dominated by underfill fillet asymmetry, which is controlled by two-needle dispense patterns rather than single-edge flow.
For high-bandwidth memory stacks assembled on silicon interposers, the underfill must penetrate gaps between 15 µm and 25 µm between stacked die and interposer. This is below the practical filtration limit of many capillary underfills; a filler with D50 of 0.5 µm and Dmax of 1.0 µm is required so that the largest filler particles are at least one-tenth of the minimum gap. The material is a single-component epoxy matrix with 55–60 wt% silica filler, but the low-viscosity requirement overrides the usual CTE optimization; viscosity at 110 °C is held between 150 mPa·s and 400 mPa·s, and the flow front may require 300–600 s to cross a 20 mm interposer edge. Plasma surface activation with argon or oxygen increases the substrate surface energy to 35–45 dyn/cm before underfill dispense. Cure is staged: a ramp from 100 °C to 150 °C over 30 min, hold at 150 °C for 60 min, then cooling at less than 3 °C/min to minimize warpage of the thin silicon interposer. Voids are detected by scanning acoustic microscopy at 230 MHz transducer frequency to resolve 5 µm defects. Reliability qualification follows JESD22-A104 Condition B from -55 °C to +125 °C and JESD22-A110 HAST at 130 °C/85% RH for 96 h. The terminal product is a logic-plus-HBM multi-chip module for AI accelerator cards; filler entrapment at the microbump array is a known failure mode when dispense pressure exceeds 0.3 MPa and creates turbulent flow rather than capillary wicking. Frozen syringes must not be stored at conditions above -20 °C for more than 24 h, because filler settling accelerates and increases the probability of gap-filtration defects.
Ceramic column grid array modules for avionics impose a material elimination criterion that many fast-flow electronic underfills cannot meet. Under ASTM E595-15, total mass loss must remain below 1.0% and collected volatile condensable material below 0.10% after 24 h at 125 °C under vacuum; silicone-modified flow additives and low-molecular-weight flexibilizers fail the CVCM threshold. The selected underfill is therefore formulated without silicone surface-control additives, with a post-cure ionic cleanliness profile of less than 10 ppm chloride and less than 5 ppm sodium by MIL-STD-883 TM 5011. Viscosity is 800–1,500 mPa·s at 25 °C and 100–200 mPa·s at 100 °C. Mixing is not required because the product is a single-component frozen formulation; frozen storage at -40 °C is controlled and thawing at room temperature for 30 min is documented in the work instruction. The underfill is dispensed after die placement and reflow, but before hermetic lid seam welding; vacuum-assisted underfill is used when the die-to-substrate gap is below 30 µm to remove entrapped air from the interior fillet. Cure is 150 °C for 30 min plus 180 °C for 60 min post-cure, which drives the anhydride-epoxide conversion beyond 95% and reduces subsequent outgassing. Thermal cycling uses JESD22-A104 Condition B from -55 °C to +125 °C, and vibration exposure is applied per JESD22-B103. The terminal product is a flight-control guidance module; the main process rejection mode is incomplete fillet formation on large ceramic substrates when vacuum-assist is not active.
Inside implantable telemetry modules, the underfill sits beneath a hermetically sealed titanium enclosure or under a conformal parylene barrier, so the cured polymer is not patient-contacting in normal use. The relevant compliance path is therefore the finished device standard ISO 10993-5 for cytotoxicity and ISO 10993-10 for sensitization and irritation; the underfill itself is not certified under ISO 10993 because the final toxicological risk is determined by the entire implant assembly. Nevertheless, assembly sites maintain water-extract conductivity below 20 µS/cm by IPC-TM-650 method 2.3.25 to limit ion-induced leakage near neural stimulation electrodes. The underfill used in cochlear implant and spinal cord stimulator chips is a low-temperature cure formulation, typically cured at 100 °C for 60 min, to avoid thermal degradation of adjacent polymer encapsulation and battery seals. Viscosity at dispense temperature 80 °C is 300–600 mPa·s, permitting capillary flow into 50 µm gaps on flexible polyimide substrates without damaging delicate wire bonds. Filler loading is reduced to 50–55 wt% to limit particle-induced damage to gold stud bumps. This formulation has a lower glass transition temperature than automotive grades, typically 90–110 °C, which is acceptable because the implant operates at 37 °C. Final sterilization by autoclaving or ethylene oxide can alter the cured network surface energy, so adhesion samples are exposed to the actual sterilization cycle before wire-pull and die-shear testing. Published data for this specific configuration is limited; qualification data are held in device master files rather than public datasheets.
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The product designation UF-LV-EL-2710 is a single-component, low-viscosity capillary underfill formulated for flip-chip, wafer-level chip-scale package, and ball-grid array assemblies with stand-off heights between 25 µm and 75 µm. The resin vehicle is a bisphenol-F/anhydride network, and the filler system is fused silica with a median particle size maintained between 0.5 µm and 1.0 µm as verified by laser diffraction in accordance with ISO 13320:2020. Mixed-state viscosity at 25 °C is specified as 150–350 mPa·s when determined by ASTM D2196-20 at a shear rate of 50 s-1. The lower limit is derived from production runs in which viscosity below 150 mPa·s produced fillet spread beyond 1.5 mm on solder mask and increased die-edge contamination, while viscosity above 350 mPa·s extended capillary penetration through 25 µm stand-off beyond the gel window before the 110 °C flow-hold step was complete. Total extractable sodium and potassium is limited to ≤10 ppm by IPC-TM-650 2.3.28, and volume resistivity after 168 h at 85 °C/85% RH is required to remain at least 1×1012 Ω·cm under IPC-TM-650 2.5.17. The product is filled with 55–60 wt% silica, a range chosen to balance capillary flow against the thermal expansion mismatch between silicon and organic substrates.
Thermal acceptance for UF-LV-EL-2710 is governed by differential scanning calorimetry and thermomechanical analysis. After full cure at 150 °C for 20 min, the glass transition temperature midpoint is 135–150 °C when measured by ISO 11357-2:2020. The coefficient of linear thermal expansion below Tg is 28–35 ppm/°C over −40 °C to 125 °C per ASTM E831-19, and the value above Tg is 90–110 ppm/°C from 150 °C to 250 °C. Lap shear strength on abrasively cleaned aluminium substrates after standard cure is specified as ≥12 MPa per ISO 4587:2003. Absorbed moisture after 85 °C/85% RH for 168 h remains below 0.25 wt% when tested per ISO 62:2008. The material is halogen-controlled to ≤900 ppm total chlorine/bromine by IEC 61249-2-21:2003, which supports compatibility with halogen-free printed-wiring-board programs. Outgassing under ASTM E595-15 for 24 h at 125 °C and 10-6 Torr is limited to 0.10% total mass loss and 0.01% collected volatile condensable material, a requirement relevant for optical and space-flight packaging where volatile films on sensor windows are unacceptable.
| Specification | Method | Acceptance range |
|---|---|---|
| Mixed viscosity, 25 °C, 50 s-1 | ASTM D2196-20 | 150–350 mPa·s |
| Filler content | ISO 3451-1:2019 | 55–60 wt% |
| Glass transition temperature, DSC midpoint | ISO 11357-2:2020 | 135–150 °C |
| CTE α1, −40 °C to 125 °C | ASTM E831-19 | 28–35 ppm/°C |
| CTE α2, 150 °C to 250 °C | ASTM E831-19 | 90–110 ppm/°C |
| Lap shear strength, Al/Al | ISO 4587:2003 | ≥12 MPa |
| Volume resistivity, 85 °C/85% RH, 168 h | IPC-TM-650 2.5.17 | ≥1×1012 Ω·cm |
| Halogen content | IEC 61249-2-21:2003 | ≤900 ppm |
| Total Na+/K+ | IPC-TM-650 2.3.28 | ≤10 ppm |
Batch-release testing includes viscosity, Tg, CTE, ionic content, and lap shear on each lot. Density after cure is 1.45–1.55 g/cm³ per ASTM D792-20, and the uncured material shows a specific gravity of 1.40–1.50 g/cm³. Viscosity drift after 4 h at 55 °C in the dispense reservoir is specified as <10% of initial value; this parameter is monitored on high-volume lines because a viscosity increase above 10% changes the jetted drop volume and results in incomplete fillet formation on die corners.
On high-volume dispensing lines, the material is transferred from −40 °C freezer storage to the dispense head after a controlled thaw of 4–6 h in sealed syringes. A 12-head positive-displacement pump with 0.10 mm needle and 0.03 mm stand-off has been used to deposit fillet patterns on die of 5 mm × 5 mm to 12 mm × 12 mm at rates up to 2,000 UPH. Syringe temperature is maintained at 55–65 °C to reduce the material viscosity to 80–150 mPa·s during jet dispensing. Equipment faults observed include needle clogging when ambient humidity exceeds 60% RH for more than 8 h without an intermittent solvent purge; this is suppressed by a 0.2 MPa nitrogen blanket on the reservoir and by replacing snap-cured material from the nozzle after line stops longer than 15 min. Capillary flow for a 7 mm die on 25 µm stand-off occurs within 3–5 min at 110 °C, after which the oven may ramp to full cure. Dispense-plate temperature control tighter than ±5 °C is specified because viscosity decreases by approximately 10 mPa·s per 1 °C in the 55–65 °C interval. If dispense temperature deviates −5 °C, flow time increases by 30–40% and the product may gel before the fillet closes at the die edge; if dispense temperature deviates +5 °C, the jetted volume enlarges and bleed-out on the substrate can exceed 2 mm.
Capillary underfill is distinguished from no-flow underfill primarily by filler loading and deposition point. UF-LV-EL-2710 contains 55–60 wt% fused silica, whereas no-flow grades generally contain 70–80 wt% filler and are dispensed before die placement to combine solder joint formation and underfilling. No-flow formulations typically require viscosity above 30,000 mPa·s to maintain dispense shape, which makes them unsuitable for stand-off below 40 µm because of filler bridging and solder ball misalignment. Pre-applied film underfill is a solid B-staged sheet laminated onto the substrate before die attach, and is used where capillary dispense equipment cannot access dense die banks or where wafer-level coverage is required. The EL-grade low-viscosity product is designed for post-reflow capillary flow, which requires a relatively low filler content but raises CTE to 28–35 ppm/°C compared with 18–22 ppm/°C for high-filler no-flow grades. This trade-off is managed by limiting the product to die sizes below 12 mm and substrates with CTE between 8 ppm/°C and 12 ppm/°C; larger die or high-thermal-expansion substrates require thermo-mechanical modelling before product substitution. In packages with 0.4 mm ball pitch and thin-core substrates, capillary underfill is preferred to no-flow because no-flow filler particles can remain trapped in the solder joint after reflow and reduce shear strength by 10–20%.
| Parameter | UF-LV-EL-2710 capillary | No-flow underfill | Pre-applied film |
|---|---|---|---|
| Viscosity at 25 °C | 150–350 mPa·s | 30,000–100,000 mPa·s | solid |
| Filler loading | 55–60 wt% | 70–80 wt% | 65–75 wt% |
| Minimum stand-off | 10–25 µm | 40–75 µm | 30–50 µm |
| CTE α1 | 28–35 ppm/°C | 18–22 ppm/°C | 20–28 ppm/°C |
| Application point | post-reflow capillary | pre-reflow dispense | pre-die lamination |
| Typical cure | 150 °C/20 min | 165 °C/30 min | 180 °C/60 min |
When 85 °C/85% RH exposure is part of the qualification sequence, ionic cleanliness becomes the limiting parameter. UF-LV-EL-2710 limits water-extractable chloride to ≤5 ppm, total alkali to ≤5 ppm, and total halides to ≤10 ppm according to the ion chromatography procedures of IPC-TM-650 2.3.28. These limits are required because corroded aluminium bond pads and solder joint failures have been documented in package-level biased HAST testing at 130 °C/85% RH under 3.3 V when extractable chloride exceeded 10 ppm. The product contains no intentional amines, which are incompatible with anhydride cure and can depress Tg by 20–30 °C. Users should avoid combining the low-viscosity underfill with amine-based solder mask activators or amine-functional rework fluids because such ambient amines accelerate anhydride ring opening at room temperature and shorten pot life. Storage is specified at −40 °C in sealed syringes with a shelf life of 6 months. After thawing, the material must be used within 16 h at 25 °C; viscosity drift beyond +20% indicates that the mixture has begun to react and is no longer suitable for capillary flow.
Compatibility with solder mask, under-bump metallurgy, and lead-free reflow residues is process-dependent. On high-polarity solder mask formulations, fillet delamination after 1,000 h of thermal aging at 150 °C has been suppressed by a 2–5 min oxygen plasma treatment at 150 W before dispensing. The material does not require post-cure cooling rate control for Tg above 130 °C, but cooling from 150 °C to 25 °C at rates exceeding 30 °C/min has been observed to increase warpage on low-CTE core substrates. For rework, the cured network softens above 250 °C, and die removal is performed at 300 °C local heating with torsional shear below 5 N·m. The lower filler loading of this EL-grade product permits faster solvent-free clean-up after rework with a 1,3-dioxolane-based remover at 80 °C compared with high-filler no-flow systems, but the remover must be fully evaporated before fresh underfill is dispensed to prevent residue-induced voiding. Solder mask adhesion loss after three reflow cycles at 260 °C peak temperature is limited to <10% of initial peel strength when tested by IPC-TM-650 2.4.9.