Products

Tetramethylammonium Hydroxide

    • Product Name: Tetramethylammonium Hydroxide
    • Alias: TMAH
    • Einecs: 215-900-8
    • Mininmum Order: 1 g
    • Factroy Site: Yudu County, Ganzhou, Jiangxi, China
    • Price Inquiry: sales3@ascent-chem.com
    • Manufacturer: Ascent Petrochem Holdings Co., Limited
    • CONTACT NOW
    Specifications

    HS Code

    145965

    Chemical Name Tetramethylammonium Hydroxide
    Chemical Formula C4H13NO
    Molar Mass 91.16 g/mol
    Appearance Colorless to pale yellow liquid (commonly as aqueous solution)
    Odor Ammonia-like
    Melting Point 66 °C (anhydrous)
    Density 1.015 g/cm³ (25% w/w aqueous solution)
    Solubility In Water Miscible
    Ph Strongly basic (pH > 13 in aqueous solution)
    Cas Number 75-59-2
    Storage Temperature Store at 2-8 °C

    As an accredited Tetramethylammonium Hydroxide factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.

    Packing & Storage
    Packing Tetramethylammonium Hydroxide is packaged in a 500 mL high-density polyethylene (HDPE) bottle with a tamper-evident sealed cap.
    Shipping Tetramethylammonium Hydroxide is shipped in tightly sealed, corrosion-resistant containers under ventilated and temperature-controlled conditions. It is classified as a corrosive hazardous material and must be handled following all regulatory guidelines. Proper labeling and documentation are required, and packages must be protected from heat, moisture, and incompatible substances during transit.
    Storage Tetramethylammonium Hydroxide should be stored in a cool, dry, well-ventilated area, away from direct sunlight, heat sources, and incompatible substances such as acids and oxidizers. Containers must be tightly sealed and made of compatible materials, typically polyethylene or glass. Proper labeling and secondary containment are essential to prevent leaks and exposure. Personal protective equipment (PPE) should be accessible nearby.
    Application of Tetramethylammonium Hydroxide

    Purity 25%: Tetramethylammonium Hydroxide purity 25% is used in semiconductor photoresist stripping processes, where it enables efficient and selective residue removal.

    Aqueous Solution 2.38%: Tetramethylammonium Hydroxide aqueous solution 2.38% is used in silicon wafer wet etching, where it provides precise anisotropic etch profiles.

    High Stability Temperature 50°C: Tetramethylammonium Hydroxide high stability temperature 50°C is used in TFT-LCD panel manufacture, where it maintains consistent etch rates during high-temperature processing.

    Molecular Weight 91.15 g/mol: Tetramethylammonium Hydroxide molecular weight 91.15 g/mol is used in organic synthesis quaternization reactions, where it ensures reliable reagent stoichiometry.

    Particle Size <10 μm: Tetramethylammonium Hydroxide particle size <10 μm is used in catalytic applications, where it enhances reaction kinetics and uniform distribution.

    Low Metal Impurity <1 ppm: Tetramethylammonium Hydroxide low metal impurity <1 ppm is used in microelectronic device fabrication, where it minimizes contamination and defect rates.

    Viscosity Grade 1.1 mPa·s: Tetramethylammonium Hydroxide viscosity grade 1.1 mPa·s is used in resist developer formulations, where it improves coating uniformity and development fidelity.

    Melting Point 40°C: Tetramethylammonium Hydroxide melting point 40°C is used in specialty solvent systems, where it facilitates controlled melting and handling processes.

    Free Quote

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    For samples, pricing, or more information, please contact us at +8615365186327 or mail to sales3@ascent-chem.com.

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    Tel: +8615365186327

    Email: sales3@ascent-chem.com

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    Certification & Compliance
    More Introduction

    Tetramethylammonium Hydroxide: A Practical Look From the Manufacturing Floor

    Proudly Introducing Our Tetramethylammonium Hydroxide Solution

    Tetramethylammonium Hydroxide, or TMAH as we call it in the plant, stands as one of our key wet-process chemicals. Our technicians and chemists work closely together to produce TMAH solutions that match the requirements of evolving semiconductor and electronics manufacturing. The solution typically comes in concentrations from 2.38% to 25%, clear and nearly odorless, with purity levels that reach electronic and photolithography standards. We know every batch will find its way into a cleanroom, a research center, or a high-performance etching line in a wafer fab, so each step in our process matters—from handling raw tetramethylammonium chloride, to running pure water through our columns, to maintaining stainless tanks dedicated only to TMAH blends.

    Why TMAH Matters in Microelectronics

    Some chemicals work in the background without much recognition; TMAH gets noticed because of its role in etching silicon, developing photoresist, and controlling the shapes of micro-circuits. A single spill or a trace of metallic contamination can ruin mass-produced chips worth millions. Our workforce knows customers depend on repeatable results. In practice, TMAH brings sharp anisotropy during silicon wet etching, making it possible to produce MEMS structures or to open trenches with crisp, straight walls. No other hydroxide delivers this kind of control at the micro or nano scale, and we have confirmed this in repeated trials as fabs specify different concentrations and grades for their own processes.

    Quality Through Real-World Production

    In our facility, the real differences between high-purity TMAH for microelectronics and industrial-grade alkali show themselves. TMAH demands careful separation from heavy metals, organic contamination, and other ionic species. Many lower-spec hydroxides will include traces of alkali metals, which poison circuits or thin films, while TMAH needs almost nothing except the tetramethylammonium ion and hydroxide. Our QC lab runs repeated measurements with ICP-MS and conductivity checks. The consistency we guarantee matters most when a customer switches process lots—no one in a fab line wants to cope with lot-to-lot variability. In comparison to older potassium or sodium hydroxide, TMAH in our formulation avoids alkali ion drift, reduces sodium-induced glass corrosion, and lowers the risk of corrosion on aluminum pads. Most of the complaints we hear about those alternatives vanish when switching to our TMAH.

    Meeting Demands for Clean Process

    Semiconductor and optoelectronic demands drive us to make TMAH as pure and stable as possible. While chemical suppliers can make an average TMAH solution, only direct manufacturers can guarantee origins, supply-chain history, and every upstream process variable. Many research institutions we serve want certificates showing results for part-per-billion metal content, carbon, sulfur, and chloride. Our lab heads track traceability not just for audits, but because a microelectronics customer can lose valuable wafers to a few ppb of iron or copper. Unlike sodium or potassium hydroxide, which accumulate as salts and cause memory effects in glass or plastic handling gear, TMAH decomposes into volatile trimethylamine and methanol, reducing the legacy of contaminants in reactor lines. Instead of stacking barrels or drums in generic warehouse settings, our plant stores TMAH in closed-loop, drained containment, and pre-cleans every valve before filling.

    Safety and Worker Experience

    TMAH holds an infamous reputation among those who work with it—our training team reminds new staff of its toxicity and the need for personal protective equipment. This chemical, at high concentrations, introduces severe biological risk, and most work in our factory means full coveralls, dual nitrile gloves, and frequent ventilation checks. We maintain regular first-aid drills specifically for TMAH, and our safety record with high-volume batches depends on this culture. There’s never any room for shortcuts. Comparing this to sodium hydroxide, both act as strong bases, but TMAH carries risks through skin absorption and accidental splashes far beyond what most expect. Many handlers outside the manufacturing world have underestimated TMAH’s toxicity, but we consider these procedures a basic component of responsible process management. Our management reviews every incident, no matter how small, learning from near-miss events just as carefully as actual spills.

    Differences That Shape Applications

    Working closely with the world’s largest chip makers and photovoltaic houses, we understand how TMAH’s behavior stands apart. In silicon wet etching, potassium hydroxide (KOH) was widely used because of its aggressive base strength, but left potassium contamination in device layers and required more labor-intensive post-cleaning. TMAH’s structure, with no metal cation, lets fabs run single-step, reduced-rinse processes, saving water, and limiting device corrosion. We observed that even advanced memory fabs, which once relied on KOH, started shifting toward TMAH for critical feature geometries. Glassmakers and LCD panel fabs add their voices too: sodium hydroxide attacks certain display coatings—TMAH gives the same base effect, but keeps sodium out of the a-Si glass matrix. Our product flows directly into display etch, TFT pattern, and color-filter processes without raising the risk of sodium leakage or migration.

    Model Variants and Application Specifics

    We have spent years refining grades to fit real process needs. Low-particle, ultrapure TMAH blends go toward semiconductor photolithography lines, where a single micron-sized particle can ruin dozens of wafers. We manufacture another line for MEMS etching—these solutions target high bulk-etch rates at carefully controlled temperatures, favored by engineers needing precise aspect ratios on etched cavities. Our team has tested batch homogeneity with each scale-up, knowing even tiny air bubbles or unstable pH can hurt yield downstream. For printed circuit board (PCB) stripping, a less pure model, free from most metal ions but not called “semiconductor-grade,” gets routed to contract manufacturers—these end-users demand reliability when stripping resist, not ppb-level purity. Each customer group comes back to us today with feedback about edge definition, chemical stability, and process speed, which our production team uses as the basis for the next round of improvements.

    Technology Improvements—What We’ve Changed

    Our journey manufacturing TMAH brought plenty of lessons. Five years ago, we started integrating ion-exchange resin technology to catch stray ammonium salts before final formulation. The difference wasn’t just in purity—equipment lifetime increased, and customers reported fewer device failures attributed to metal doping. More recently, inline NDIR sensors help us verify total organic carbon (TOC) and ammonia before each batch leaves the plant. The benefits show up both in lab test reports and in complaints—much rarer than before. Our plant avoids chlorine-based precursors; old routes produced chlorinated byproducts that show up in high-resistance measurements on finished products. We committed extra cost to fully stainless mixing and storage to cut chloride cross-contamination. Some competitors dilute cost by letting TMAH through generic pipework, but a single misstep can show up as uncontrolled photoresist swelling or lens haze under a microscope.

    Process-Driven Reliability

    No production line lives by certificates alone. Our staff regularly visits customer fabs and labs, watching new processes run in real time with our TMAH. By working side by side with engineers and operators, we notice small trouble spots—unusually long development times, unexpected residue formation, or etch uniformity breaks. The customer-relations team feeds exact data back to our process engineers, who can trace issues to raw material variation, storage container wettability, or unexpected outgassing from caps. In several cases, we modified batch schedules to deliver TMAH within two weeks of production, cutting exposure to atmospheric carbon dioxide and maintaining the target pH for sensitive device structures. This approach, built on feedback, gives our customers confidence in what leaves our yard.

    Regulatory and Environmental Concerns

    Our experience manufacturing and shipping TMAH around the world showed us the changing regulatory landscape. Several regions monitor TMAH as a high-risk substance, setting strict guidelines for transport, storage, and personal exposure. Our compliance experts constantly update protocols so we can issue up-to-date SDS and labeling without confusion. More importantly, as countries move toward zero-discharge or closed-cycle water practices, we work directly with end users to install recovery and neutralization systems. In some facilities, we designed collection lines that return post-etch TMAH solutions to our plant, saving waste, cost, and environmental impact. These closed cycles demand process discipline and close tracking of batch histories, an approach learned from years of direct operation, not regulation alone.

    Innovation for Quality and Sustainability

    As fabs move towards higher density and ever-smaller geometries, their need for cleaner, more predictable TMAH keeps growing. Our in-house chemists experiment with new stabilizers to lengthen shelf life without introducing trace unwanted ions. We partner with equipment makers developing next-generation dispense and mixing units; feedback from their pilot installations flows straight into our process modifications. From the loading dock to the final inspection lab, staff review each process, hunting for overlooked factors that could impact the next shipment. There’s no place for a ‘standard’ batch—we tailor conditions batch by batch, because historic averages don’t erase a single bad result.

    Sustainability pressures increase as global chemical use grows. In our own plant, we run continuous risk assessments for TMAH releases, and all operators learn how to spot leaks and contain waste. Rather than leaving disposal to waste processors, we work out direct partnerships with customer EHS teams, reclaiming and neutralizing TMAH for reuse or safe disposal within the local context. This hands-on approach, built through our day-to-day reality running a chemical plant, gives us first-hand insight into what actually reduces environmental load and exposure risk.

    Why Direct Manufacturing Experience Counts

    Working as direct manufacturers, we witness every variable that touches TMAH quality—ambient humidity, incoming water conductivity, filter life, tank agitation, and even the training level of every operator. Shifting those variables can alter the product far beyond what lab specs sometimes show. This experience gives us the responsibility and ability to explain batch-to-batch consistency and make credible adjustments for specific site needs, something brokers and third parties rarely see up close. Because our team gets feedback from assembly lines and field service techs, we innovate not from market theory but from the physical reality of modern chemical handling. Questions often come to us about substitution, shelf-life, or cycle time. We share what we’ve seen from direct runs, and resist upselling anything that doesn't fit the real application. We’ve learned that transparency about supply chain, process history, and test results builds stronger relationships than simply pushing product.

    Talking Straight: Choosing the Right TMAH Solution

    Some buyers focus only on price. Through practical day-to-day work, our staff has found that a low unit price often hides hidden costs: higher rates of defective devices, line downtime, and troubleshooting labor. For sensitive wafers or displays, jumping from generic alkalis to true TMAH shifts defect rates downward, produces more reliable edge geometry, and upgrades device longevity. In contrast, mistakenly downgrading TMAH grades for short-term savings will likely cost much more in reruns and lost time. We encourage partners to share upcoming process changes with us, so we can recalibrate our production to match their next challenge.

    Future Growth and TMAH Development

    The TMAH market continues to develop as new applications arise in fields such as 3D NAND, quantum computing, and advanced sensor production. Each of these next-generation products presents its own set of etching and resist development constraints. We stay ahead by involving our R&D staff in collaborative projects with these industries—our chemists attend process startups, help refine dilution schedules, and troubleshoot both new and legacy equipment. This integrated approach tightens the link between chemical production and technological innovation, producing not just chemicals, but lasting progress in how they are applied. In the long run, the best improvements come from constant attention to what is actually happening at the level of the tank and the cleanroom, not just from market research or literature alone.

    Open Lines with Real Manufacturers, Not Middlemen

    As longstanding, specialized producers of Tetramethylammonium Hydroxide, our team puts value on open communication. If a new issue arises in a customer’s fab, we send our technical leads to investigate in person, discuss root causes, and propose changes at the chemical and process level. Price fluctuation, raw material shortages, or evolving local standards: all these are ordinary parts of our world. What stands apart is the confidence customers gain from being able to speak directly to those who make and control the process every day. Our people know the refill schedule of each reactor, the specifics of pre-wash routines, and the logistics of ultra-clean delivery even outside standard work hours—a level of accountability that simply isn’t possible through intermediaries.

    Why Trust Matters, Batch by Batch

    In a field where a few parts per billion decide millions of dollars in yield, every barrel, every tote, and every test count. Our facility has built up a record not just from documents, but from thousands of real-world production cycles, installations, and support calls. Staff share pride in knowing each shipment carries not just a label, but a history of disciplined control, consistent improvement, and regular customer feedback. In practical terms, we seek solutions, not just specifications. Whether working through unexpected etch rate shifts, purity bottlenecks, safety developments, or facility expansion, we maintain a direct, everyday connection to the people who use and rely on our TMAH. That’s the root of real manufacturing experience—a reality forged by day-to-day challenge, production discipline, and long-term collaboration.

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