Electronic Grade Propyl Propionate

Electronic-Grade Propyl Propionate

    • Product Name: Electronic-Grade Propyl Propionate
    • Factroy Site: Yinchuan, Ningxia, China
    • Price Inquiry: sales8@ascent-chem.com
    • Manufacturer: Ascent Petrochem Holdings Co., Limited
    • CONTACT NOW
    VTB
    Specifications
    HS Code 261308
    Productname Electronic-Grade Propyl Propionate
    Grade Electronic grade
    Chemicalname Propyl propanoate
    Synonyms n-Propyl propionate; Propanoic acid propyl ester
    Casnumber 106-36-5
    Ecnumber 203-389-7
    Molecularformula C6H12O2
    Molecularweight 116.16 g/mol
    Appearance Colorless clear liquid
    Odor Mild fruity ester-like odor
    Purity ≥99.5%
    Density 0.881 g/cm³ at 25 °C
    Boilingpoint 122–123 °C
    Meltingpoint -76 °C
    Flashpoint 25 °C
    Refractiveindex 1.393–1.395 at 20 °C
    Watercontent ≤0.05%
    Acidity ≤0.01% as propionic acid
    Nonvolatileresidue ≤0.001%
    Metalioncontent ≤1 ppm
    Solubility Soluble in alcohols, ethers, and most organic solvents; slightly soluble in water

    As an accredited Electronic-Grade Propyl Propionate factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.

    Packing & Storage
    Packing Electronic-Grade Propyl Propionate is supplied in 20 L fluorinated HDPE containers, sealed and labeled for semiconductor use.
    Container Loading (20′ FCL) Electronic-grade propyl propionate is palletized in sealed, labeled drums/IBCs and loaded into a 20′ FCL container under controlled chemical-handling conditions.
    Shipping Electronic-Grade Propyl Propionate ships as a flammable liquid in UN-approved, clean, sealed containers. Typical description: UN 3272, Esters, n.o.s. (Propyl propionate), Class 3, PG III. Protect from ignition sources, moisture, and static; label flammable and keep cool, dry, and ventilated. Verify carrier-specific regulations.
    Storage Store Electronic-Grade Propyl Propionate in a cool, dry, well-ventilated, fire-resistant area, away from heat, sparks, flames, and strong oxidizers. Keep containers tightly closed, correctly labeled, and electrically grounded to prevent static buildup. Protect from moisture, direct sunlight, and contamination. Use clean, dry, compatible containers, preferably under inert gas, and segregate from incompatible materials. Follow local fire and chemical-storage regulations.
    Shelf Life Electronic-grade propyl propionate typically has a 12–24 month shelf life when kept sealed under inert gas in a cool, dry place.
    Application of Electronic-Grade Propyl Propionate

    Removal of no-clean solder paste residues from electroformed stencils in SMT lines

    Electroformed stencil apertures as narrow as 100 µm in thicknesses of 80–150 µm accumulate no-clean solder paste containing SAC305 alloy powder, modified rosin resin, dicarboxylic acid activators and thixotropic castor derivatives. Electronic-grade propyl propionate, CAS 106-36-5, dissolves the organic vehicle of ROL0 and ROL1 no-clean pastes under low-shear wipe conditions without attacking the nickel-plated electroformed stencil surface or the stainless steel mesh border. Inline understencil wipe modules apply the neat solvent at 0.8–1.2 mL/100 cm² of stencil underside through low-lint polyester-cellulose wipes, with contact pressure held at 0.15–0.35 MPa and dwell time per print cycle limited to 0.3–0.6 s. The solvent's closed-cup flash point of 18–21 °C requires explosion-proof wipe module construction, conductive grounding and local exhaust ventilation complying with ATEX directive 2014/34/EU or equivalent national electrical codes. Batch ultrasonic immersion cleaning of heavily contaminated stencils is performed at 25–35 °C in tanks with 40 kHz transducers and power density of 10–20 W/L, with residence time of 3–8 min followed by forced warm-air drying at 40–50 °C. After cleaning, ionic contamination is verified by ROSE extraction per IPC-TM-650 2.3.25; common acceptance thresholds for high-reliability assemblies are held at ≤1.56 µg/cm² NaCl equivalent. The solvent is unsuitable for removing fully polymerised no-clean flux white residues or thermal degradation products from prolonged reflow, which require alkalised saponifier chemistry or mechanical brushing. Solvent absorption into the stencil tensioning adhesive or sealed frame gaskets is prevented by limiting total immersion time to 8 min per batch and by using perfluoroelastomer seals rather than nitrile or silicone elastomers.

    Electronic-grade propyl propionate acceptance limits by application class
    ParameterTest methodSMT stencil cleaningDisplay shadow mask degreasing
    AssayGC-FID≥99.5 wt%≥99.9 wt%
    WaterASTM E203-16≤500 ppm≤200 ppm
    ChlorideASTM D512-12≤1.0 ppm≤0.2 ppm
    Total metalsICP-MS≤1.0 ppm≤0.1 ppm
    Non-volatile residueASTM D1353-13≤20 ppm≤5 ppm
    Particles ≥ 0.5 µmLaser particle counter≤500 mL−1≤100 mL−1

    In stencil cleaning applications, the relevant process risk is not solvency but ionic transfer. Propyl propionate with total metal content above 1.0 ppm can deposit cationic and anionic species inside apertures, producing electrical leakage or electrochemical migration after reflow. For that reason, SMT cleaning grades are filtered through 0.2 µm polytetrafluoroethylene cartridges immediately before use, and wipe rolls are monitored for particle shedding by optical microscopy at 50× magnification. The solvent should not be blended with water in an attempt to raise flash point; propyl propionate is sparingly miscible with water, and two-phase mixtures create uneven flux dissolution, entrained water pools in fine apertures, and elevated post-clean chloride readings under ASTM D512-12.

    In selective conformal coating lines running acrylic and acrylic-urethane boundary materials on assembled PCBAs, electronic-grade propyl propionate functions as a low-ion viscosity reducer rather than a general-purpose thinner. Addition of 1–5 wt% to needle-applied coating batches with initial viscosity of 120–180 mPa·s at 25 °C shifts flow time into the 50–70 mPa·s window required by reciprocating needle dispensers with 0.2–0.5 mm stainless steel or PTFE needles, measured on a Brookfield RV spindle at 20 rpm under ASTM D2196-20. The ester content remains low enough that IPC-CC-830B qualification parameters retain the margins established for the unthinned coating, including dielectric withstand, moisture and insulation resistance and hydrolytic stability. Mixing is conducted in closed stainless or high-density polyethylene vessels at 300–500 rpm for 15–30 min, followed by vacuum degas at 20–30 kPa absolute until bubble breakthrough ceases. The solvent’s H225 flammability classification under CLP EC 1272/2008 requires local exhaust and conductive grounding during addition. Addition above 10 wt% is not recommended for moisture-curing silicone or UV-cationic systems because viscosity reduction is accompanied by slower solvent release from low-energy surfaces and potential cure interference at the coating-substrate interface. End-use assemblies include automotive body control modules and industrial motor drives where conformal coating thickness is held at 25–75 µm dry film.

    Comparative physical data for solvent selection in conformal coating viscosity adjustment
    PropertyElectronic-grade propyl propionatePGMEAn-Butyl acetate
    Boiling point at 101.3 kPa120–124 °C145–146 °C124–127 °C
    Closed-cup flash point18–21 °C42–45 °C22–26 °C
    Density at 20 °C0.878–0.883 g/cm³0.965–0.975 g/cm³0.878–0.885 g/cm³
    Dynamic viscosity at 25 °C0.70–0.85 mPa·s1.10–1.40 mPa·s0.70–0.80 mPa·s
    Relative evaporation rate1.2–1.40.32–0.401.0

    The choice of propyl propionate over PGMEA in conformal coating adjustment is driven by faster evaporation at the same film thickness, but that advantage becomes a defect source when the coating is applied through narrow air-spray nozzles in ambient humidity above 60% RH. Under those conditions, rapid evaporative cooling can pull water into the wet film and produce blushing or microvoids. Preconditioning the coating and the board at 30–40 °C and maintaining booth humidity below 50% RH is therefore mandatory for air-atomised application of acrylic coatings thinned with this solvent.

    When High-Density Interconnect Solder Mask Ink Requires Low-Metal Thinning

    Inkjet-grade solder mask concentrates require thinning before piezo print-head deposition, and electronic-grade propyl propionate is added at 2–8 wt% to reduce viscosity into the 80–150 mPa·s range at 25 °C for print heads with nozzle diameters of 20–50 µm and firing frequencies of 10–40 kHz. The solvent is blended under low-shear stirring in polypropylene vessels, and the resulting liquid is deaerated at 5–10 kPa absolute for 10–20 min to remove microbubbles that would otherwise cause nozzle dropout. After inkjet deposition, the wet solder mask film is prebaked at 75–85 °C for 20–30 min, then exposed to UV dose of 500–1000 mJ/cm² and thermally cured at 150 °C for 60 min. The cured mask must pass cross-hatch adhesion under ASTM D3359-17 Method B and chemical resistance testing in molten solder at 255–265 °C for 10 s. Because propyl propionate is not part of the final crosslinked matrix, its residues must be eliminated before cure; residual solvent above 0.5 wt% in the film can cause blistering at thermal cure and decrease die shear strength on covered copper surfaces. This solvent is not suitable for amine-catalysed epoxy solder mask inks in which rapid gelation occurs before solvent release. End products include high-density interconnect boards with solder dams between 40 µm and 80 µm width, where ionic contamination from the solvent must remain below 1.56 µg/cm² NaCl equivalent as measured by IPC-TM-650 2.3.25 on coupons after thermal cure.

    For fine metal mask degreasing in OLED evaporation lines, organic contamination from handling, storage and vacuum pump oil is removed by immersion in electronic-grade propyl propionate at 25–35 °C inside class ISO 4 cleanrooms. The fine metal mask is supported in a chemically resistant jig, immersed for 5–10 min in a first-stage ultrasonic bath operating at 40 kHz and 12–18 W/L, then transferred to a second-stage rinse of fresh solvent filtered through 0.1 µm polytetrafluoroethylene cartridges. After solvent rinsing, the mask is dried in a filtered nitrogen stream at 40–50 °C until residual solvent is below 1 ppm by thermal desorption gas chromatography. The critical material requirement is not cleaning speed but low extractable metal release; individual sodium, potassium, iron, copper and zinc concentrations are specified below 5 ppb by ICP-MS to prevent dark spot formation at the OLED emission layer. Chloride below 0.2 ppm and non-volatile residue below 5 ppm are applied as acceptance limits because mask-borne ionic films can shift the electron-injection energy barrier at the cathode interface. Published data for this specific configuration is limited, and qualification programs typically require post-cleaning verification by time-of-flight secondary ion mass spectrometry or X-ray photoelectron spectroscopy on sacrificial mask material before release to production.

    What Limits Propyl Propionate Use in Automated Optical Alignment Bonding Prep?

    The upper process limit is not solvency but post-evaporation residue and water content. In automated optical alignment bonding, the solvent is dispensed through 0.2 µm PTFE point-of-use filters onto lens surfaces or optical housing lands at 0.05–0.1 mL per surface immediately before UV-cure adhesive placement. Electronic-grade propyl propionate removes finger oil, light mold release and condensed organic films from borosilicate or acrylic optical elements without attacking anti-reflective coatings, provided contact time is kept below 30 s and drying is carried out with dry nitrogen at 25–30 °C. The solvent leaves a uniform evaporative layer only when its water content is below 200 ppm; above that limit, evaporative cooling can produce microhaze that reduces optical transmission and increases surface roughness on witness samples. Acidic impurities are controlled below 0.5 ppm as propionic acid, because acidic condensate can lower bond strength in cyanate ester or epoxy optical adhesives and can etch unprotected aluminium-coated aperture stops. The use of propyl propionate in this operation is therefore limited to surfaces that are subsequently adhesively bonded or mechanically coupled; it is not recommended for final cleaning of printed optical coatings or diffraction gratings without additional aqueous final rinse. Cleaning efficacy is routinely verified by contact angle measurement on borosilicate witness slides before adhesive dispensing, with acceptance generally set at ≤10° water contact angle after solvent dry.

    Low metal cation content alone does not qualify a solvent for automated dispense needle cleaning.

    In capillary underfill operations, needle cleaning solvent must combine flux-like residue solubility with compatibility with wetted materials, and electronic-grade propyl propionate is used in needle cup purge stations at 1–2 mL per purge cycle with purge pressure of 0.4–0.6 MPa. The solvent removes uncured anhydride-filled epoxy underfill from stainless steel and tungsten carbide needle seats, and prevents deposits at the needle exit that can change dispense volume by 5–10% across an 8-hour shift. The solvent is compatible with polytetrafluoroethylene, PEEK and 316L stainless steel wetted components, but repeated exposure attacks natural rubber and low-acrylonitrile nitrile seals, causing swelling and particulate release into the dispense path. For that reason, dispense equipment seals and valve diaphragms must be specified as perfluoroelastomer or ethylene propylene diene monomer before the solvent is introduced into automated purge routines. Electrical conductivity of the solvent is measured after each lot release; values above 0.1 µS/cm indicate ionic contamination and disqualify the solvent for needle cleaning on high-voltage power module underfill lines. This application is operationally narrow because propyl propionate evaporates rapidly from open purge cups, and solvent consumption rises sharply when ambient temperature exceeds 28 °C; closed cup purge designs with vapor recovery are used to maintain batch-to-batch dispense consistency.

    Inkjet marking cells for ceramic chip capacitors and molded passive devices use electronic-grade propyl propionate as a purge solvent for nozzle plates and recirculating printhead channels. The solvent is circulated at 2–5 mL/min through 10–20 µm orifice plates during maintenance cycles to remove pigment-resin agglomerates and dried binder from the non-imaged zone. Its low non-volatile residue specification of ≤20 ppm is critical because any residual oligomer left after purge can redeposit inside the nozzle array and produce missing dot defects. The terminal printed mark must withstand subsequent taping and reflow at 260 °C for 5 s, and the solvent must not interact with ceramic dielectric surfaces or terminate surface termination tin-lead or tin alloys. This is the shallowest application because the solvent does not remain in the final part and the main process control is limited to filtrate particle content, electrical conductivity, and dry time after purge.

    Free Quote

    Competitive Electronic-Grade Propyl Propionate prices that fit your budget—flexible terms and customized quotes for every order.

    For samples, pricing, or more information, please contact us at +8618005193850 or mail to sales8@ascent-chem.com.

    We will respond to you as soon as possible.

    Tel: +8618005193850

    Email: sales8@ascent-chem.com

    Inquiry

    Get Free Quote of Ascent Petrochem Holdings Co., Limited

    Flexible payment, competitive price, premium service - Inquire now!

    Certification & Compliance
    More Introduction

    Electronic-grade propyl propionate is supplied as a high-purity, low-metal ester solvent for semiconductor photolithography, edge bead removal, and associated wet-process cleaning. The product, CAS 106-36-5, is n-propyl propanoate, CH3CH2COOCH2CH2CH3, with a formula weight of 116.16 g/mol. Commercial lot-release grades are designated by minimum chromatographic assay; a 3N5 grade corresponds to 99.95 % assay, while a 4N grade corresponds to 99.99 % assay. Supplier model strings may appear as EGPP-3N5 or EGPP-4N, but the numeric suffix refers to minimum assay rather than a standardized industry designation. Packaging typically consists of 200 L fluoropolymer-lined drums or 20 L stainless-steel dispensing cans, nitrogen-blanketed and filtered at point of use through 0.05 µm polytetrafluoroethylene membranes. The electronic-grade product differs from technical-grade propyl propionate in that propanoic acid, n-propanol, water, dissolved metal ions, and particulate matter are reduced to levels compatible with chemically amplified photoresists.

    Because the material is a flammable liquid with a closed-cup flash point of 19 °C, storage and dispensing systems must follow NFPA 30 or equivalent local fire-code separation from oxidizers. Exposure to ambient moisture increases water content; production facilities commonly sample from the dispense line every 24 h to 72 h and analyze by coulometric Karl Fischer titration according to ASTM E203. The product is not a drop-in replacement for PGMEA in every resist platform, but its lower kinematic viscosity and moderate boiling range make it suitable for selected thinning and edge-bead removal processes.

    What Distinguishes Electronic-Grade Propyl Propionate from PGMEA and Ethyl Lactate in Thinning Applications?

    In photoresist thinning, propyl propionate lowers the kinematic viscosity of the base resist while maintaining solubility for many ester-compatible polymers. Direct substitution of PGMEA with propyl propionate changes the drying rate, the flash point, the wetting behavior, and the post-coat film thickness profile. The lower closed-cup flash point of propyl propionate relative to PGMEA and ethyl lactate imposes stricter handling limits: pumping systems must be grounded, and any heating above 25 °C requires explosion-proof electrical classification. The lower surface tension of propyl propionate may improve wetting on hydrophobic silicon nitride and low-k films, but it can also increase solvent penetration into porous spin-on dielectrics, which must be evaluated before integration.

    PropertyElectronic-grade propyl propionatePGMEAEthyl lactaten-Butyl acetateTest method
    Boiling range at 101.3 kPa122–124 °C145–146 °C151–155 °C126–127 °CASTM D1078
    Density at 20 °C0.880–0.883 g/cm³0.969–0.975 g/cm³1.029–1.034 g/cm³0.878–0.883 g/cm³ASTM D4052
    Kinematic viscosity at 25 °C0.68–0.72 mm²/s1.10–1.20 mm²/s2.3–2.7 mm²/s0.70–0.75 mm²/sASTM D445
    Closed-cup flash point19 °C42 °C46 °C22 °CASTM D93
    Water content after lot release≤100 ppm≤500 ppm≤500 ppm≤300 ppmASTM E203
    Surface tension at 25 °C24–25 mN/m27–29 mN/m28–30 mN/m25–26 mN/mdu Noüy ring

    Comparative dissolution rates for resist edge beads in propyl propionate versus PGMEA at identical wafer rotational speeds are not fully published; process engineers should generate wafer-level data with the specific resist lot and substrate stack. Viscosity reduction is not the sole predictor of final film thickness, because solvent vapor pressure and substrate temperature influence drying during the spinning transition. The data in Table 1 indicate that propyl propionate is closer to n-butyl acetate in evaporation and viscosity than to PGMEA, but its electronic-grade metal and particle specifications are the primary differentiator for semiconductor use.

    Resist thinning experiments should be designed with the same substrate topography, because solvent penetration into the film is thickness-dependent. In a typical evaluation, a 15 wt% to 30 wt% addition of propyl propionate reduces kinematic viscosity from 8.0 mm²/s to 2.5 mm²/s or below for low-viscosity positive resists; however, the exact viscosity reduction depends on the base resin and solids content. The use of propyl propionate at addition levels above 40 wt% may destabilize polymer solubility and increase particle formation, so process limits should be established by particle-size analysis after 0.05 µm filtration.

    Specification Boundaries and Analytical Control for 4N Lot Release

    Lot-release control for the 4N product is built around assay, water, acidity, trace metals, particulate count, and nonvolatile residue. Assay is measured by capillary GC-FID and requires 99.99 % total ester peak area. Water content is measured by ASTM E203 coulometric Karl Fischer titration and is controlled to ≤100 ppm at packaging; points above this limit are associated with higher dark erosion in chemically amplified resists. Acidity as propanoic acid is held to ≤30 ppm because free acid can protonate acid-labile protecting groups and shift photospeed. Trace metals such as sodium, potassium, calcium, iron, and aluminum are determined by inductively coupled plasma mass spectrometry after matrix removal, with individual limits of ≤10 ppb for the 4N grade and ≤50 ppb for the 3N5 grade. Particulate counts for particles ≥0.2 µm are limited to ≤200 particles/mL, referenced to ISO 14644-1 sampling principles. Nonvolatile residue after evaporation is held to ≤10 ppm to reduce post-develop defectivity. For the 3N5 grade, water is typically ≤200 ppm, acidity ≤50 ppm, and nonvolatile residue ≤20 ppm.

    When Propyl Propionate Replaces n-Butyl Acetate in Edge Bead Removal

    On a coating track, the edge bead removal dispense is applied through a top-side or bevel nozzle while the wafer rotates at low speed; common dispense rotation is 60 min⁻¹ to 120 min⁻¹, followed by spin-off at 1500 min⁻¹ to 2500 min⁻¹. Propyl propionate removes the edge bead and residual resist from the bevel without attacking the bulk device pattern when the dispense angle and exhaust are correctly set. Compared with n-butyl acetate, propyl propionate has a similar boiling range and comparable solvent strength, but its lower surface tension promotes narrower wetting of the wafer edge. The lower flash point requires edge bead removal lines to be electrically bonded and inert-padded; dispense volumes in production are typically 0.2 mL to 0.5 mL per 300 mm wafer, with exact values set by the nozzle orifice and track automation. Production coating tracks equipped with chemical dispense pumps have shown that propyl propionate can swell some elastomeric seals; perfluoroelastomer wetted components are required. Published data for this specific solvent-resist pairing is limited, so qualification should include bevel inspection by dark-field microscopy and backside metal analysis after etching.

    Storage temperature is maintained below 25 °C in a flammable-liquid cabinet with continuous leak detection and explosion-proof ventilation. The material is incompatible with strong oxidizing agents, strong mineral acids, alkali metal hydroxides, and primary or secondary amines. Contact with aqueous alkaline developer can hydrolyze the ester to n-propanol and propanoic acid; therefore, drain lines from edge bead removal and resist dispense must be separated from developer waste. Bulk transfer should use 316L stainless steel or fluoropolymer wetted surfaces, with electrical grounding and 10 kPa to 20 kPa nitrogen overpressure to exclude atmospheric moisture. Moisture excursions can be corrected by drying with acid-washed 4A molecular sieves followed by 0.05 µm filtration; however, repeated drying can increase sodium and calcium if the sieve is not acid-leached.

    Peroxide Screening Is Required After 18 Months of Nitrogen-Blanketed Storage

    Stability studies under nitrogen indicate that the ester is hydrolytically stable at room temperature, but opened containers exposed to ambient humidity show measurable water increase over 72 h. Peroxide-forming potential is lower than that of ether solvents; nonetheless, stored material beyond 18 months should be screened for peroxides by ASTM E298 before use. Acid number should also be retested because hydrolysis can release propanoic acid and decrease the pH of any aqueous extract. Facilities with high-humidity ambient conditions above 60 % RH should pre-dry or sample more frequently, because water uptake in dispense lines can produce defects in acid-catalyzed resists. If the product is transferred into day tanks, the tank should be rinsed with dry nitrogen and sealed within 30 min of opening.

    Use as a cleaning solvent for spin coater bowls and resist dispense lines requires attention to polymer compatibility. Propyl propionate is compatible with fluoropolymers and stainless-steel components but can soften acrylic, polycarbonate, and some polycarbonate blends. For bowl cleaning, low-pressure dispense at 30 kPa to 50 kPa through a PTFE nozzle removes dried photoresist without generating high aerosol; exhaust ventilation rates should follow SEMI S2 guidelines for flammable solvent handling. Because the product has a lower surface tension than PGMEA, it penetrates tight gaps in dispense valves and may mobilize aged resist residues; this can be advantageous for cleaning but can also increase particle loading when used on heavily fouled equipment. Filtration through 0.05 µm membranes is recommended during recirculation.

    Top