Electronic Grade Butyl Acetate

Electronic-Grade Butyl Acetate

    • Product Name: Electronic-Grade Butyl Acetate
    • Factroy Site: Yinchuan, Ningxia, China
    • Price Inquiry: sales8@ascent-chem.com
    • Manufacturer: Ascent Petrochem Holdings Co., Limited
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    Specifications
    HS Code 254416
    Productname Electronic-Grade Butyl Acetate
    Grade Electronic Grade
    Chemicalformula C6H12O2
    Casnumber 123-86-4
    Molecularweight 116.16 g/mol
    Appearance Colorless clear liquid
    Purity ≥99.5% by GC
    Watercontent ≤500 ppm
    Acidityasaceticacid ≤0.01%
    Colorapha ≤10
    Densityat20c 0.88 g/cm³
    Boilingpoint 126 °C
    Flashpoint 22 °C closed cup
    Refractiveindexat20c 1.394
    Viscosityat20c 0.73 mPa·s
    Evaporationrate 1.0 vs n-butyl acetate
    Metalioncontent ≤1 ppm typical
    Residueafterevaporation ≤0.005%

    As an accredited Electronic-Grade Butyl Acetate factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.

    Packing & Storage
    Packing Packaged in 200 L high-purity HDPE drums with tamper-evident seals and nitrogen blanketing for Electronic-Grade Butyl Acetate.
    Container Loading (20′ FCL) Electronic-grade butyl acetate is drummed and securely loaded into a 20′ FCL container in compliance with IMDG flammable-liquid requirements.
    Shipping Electronic-Grade Butyl Acetate is shipped as UN1123, Butyl acetates, Class 3 flammable liquid, Packing Group II, in sealed, compatible, contamination-free containers. Packages require flammable-liquid labels and must comply with DOT, IMDG, and IATA regulations; store and transport away from ignition sources, oxidizers, and moisture.
    Storage Store Electronic-Grade Butyl Acetate in a cool, dry, well-ventilated, fire-resistant area away from heat, sparks, open flames, and strong oxidizers, acids, and bases. Keep containers tightly closed, grounded, labeled, and in original or compatible packaging. Use explosion-proof equipment, protect from sunlight and moisture, avoid static discharge, provide spill containment, and maintain appropriate temperature and inventory controls.
    Shelf Life Electronic-grade butyl acetate typically has a 24-month shelf life when sealed in its original container, away from heat, moisture, and ignition sources.
    Application of Electronic-Grade Butyl Acetate

    Wafer-level photoresist processing at 300 mm diameter uses solvent blends that must maintain metal ion levels below 10 ppb for each transition metal and total non-volatile residue below 5 ppm; electronic-grade n-butyl acetate meeting SEMI C36-0618 is metered into edge bead remover formulations at 30–45 wt%, with PGMEA at 40–55 wt% and cyclohexanone at 10–15 wt%. Dispensing occurs through electropolished 316L stainless steel nozzles at 0.5–2.0 mL/s while wafer spin accelerates to 800–2500 rpm; the coater/developer track is maintained at 20–23°C and 40–50% RH to limit evaporative cooling that alters edge bead geometry. The solvent flash point of 22°C requires Class I Division 1 electrical classification for exhaust and dispensing systems. Terminal finished products include logic, DRAM, NAND, and CMOS image sensor wafers where edge bead remnants over 0.5 µm in height are rejected at post-develop inspection. Operational boundaries: point-of-use dry gas sparging with molecular sieve filtration is required when ambient RH exceeds 60%; direct blending with aqueous tetramethylammonium hydroxide 2.38 wt% developer or strong oxidizing stripper solutions is incompatible without controlled separation and pH-buffered rinse staging because hydrolysis of the ester generates acetic acid and n-butanol at uncontrolled aqueous interfaces. Compliance for wafer-level use is anchored to SEMI C36-0618, cleanroom management under ISO 14644-1:2015 Class 4, and surface particle classification under IEST-STD-CC1246E.

    ParameterTest methodElectronic-grade control
    n-Butyl acetate assayASTM D4614-11≥ 99.8%
    Water contentASTM D1364-02≤ 500 ppm
    Acidity as acetic acidASTM D1613-17≤ 0.01 wt%
    Non-volatile residueASTM D1353-13≤ 10 ppm
    Transition metal ionsICP-MS after evaporation≤ 10 ppb each
    Particles ≥ 0.2 µmOptical particle counter≤ 50 counts/mL

    What Changes When Electronic-Grade Butyl Acetate Dries Below 40°C on Gen 8.5 Glass?

    In Gen 8.5 glass substrate color filter and photo-spacer photolithography, n-butyl acetate is used as a low-viscosity diluent in solvent-loaded photoresist for slit coating. The addition ratio is 15–35 wt% of total photoresist solvent mass, balancing viscosity between 2.5–6.0 mPa·s and wet film thickness between 1.8–3.2 µm before vacuum-dry. Slit coating on 2,200 mm × 2,500 mm glass is followed by an initial vacuum-dry phase at 25–40°C and a proximity suction manifold held at −80 to −120 Pa to remove solvent without condensing on the substrate backside. When the butyl acetate addition ratio exceeds 40 wt%, film thickness uniformity degrades beyond ±5% due to meniscus instability at the slot-die lip; below 10 wt%, micro-bubble formation in the wet film becomes difficult to degas before prebake. Compliance is governed by SEMI C36-0618 for solvent purity, RoHS 2011/65/EU for restricted substances, and IEC 62321-8:2017 for phthalate and solvent-related materials validation. Terminal finished products include TFT-LCD and OLED panels for smartphones, monitors, and automotive displays. The process is not suited to uncontrolled cleanroom humidity above 55% RH because water absorption into the solvent blend alters the ester hydrolysis equilibrium and produces free acetic acid that shifts critical dimension uniformity; published data for Gen 10.5 plus vacuum drying at solvent loadings above 3 mL/cm² is limited.

    Shadow Mask Cleaning Solvent Design and Drying Manifold Pressure Limits

    High-purity n-butyl acetate in the 99.8–99.9% assay range is applied in multi-stage ultrasonic immersion and vapor degreasing for Invar shadow masks used in OLED RGB deposition. Formulation usage is typically 60–100 wt% as the primary rinse solvent, with surfactant-free formulation to avoid metallic residue after drying. The cleaning sequence uses 40 kHz ultrasonic immersion at 25–35°C, followed by vapor degreasing at solvent vapor temperature near 126°C and vacuum drying at 1×10⁻¹ Pa for 20–40 min depending on mask cell density. Adding butyl acetate below 60 wt% in the rinse stage leads to slower displacement of high-boiling particulate-laden carrier fluids from 2–10 µm mask apertures; above 95 wt%, the drying rate may exceed the capillary flow rate from fine apertures and deposit non-volatile organic residue at the mask edge. Compliance is anchored to SEMI C36-0618, REACH EC 1907/2006, and RoHS 2011/65/EU. Terminal finished products are OLED displays with shadow mask aligned RGB subpixel arrays. The solvent must be dried with molecular sieves to water content below 300 ppm; water content above 500 ppm contributes to incomplete drying and increases the risk of corrosion on Invar surfaces during extended storage.

    On roll-to-roll printed electronics lines producing silver flake conductive inks, electronic-grade butyl acetate functions as a medium evaporation rate regulator in solvent blends that also contain diethylene glycol ethyl ether acetate and dibasic ester solvents. The addition ratio is 3–12 wt% of total ink mass, adjusted within that range to maintain flexographic and inkjet rheology between 8–25 mPa·s at 25°C and surface tension below 32 mN/m. The printing process uses flexographic anilox rolls at 100–200 LPI or piezoelectric inkjet heads with 20–40 pL drop volume, followed by forced-air drying at 120–150°C for 3–10 min. If the butyl acetate fraction rises above 12 wt%, the silver flake suspension begins flocculating due to reduced solvation of the dispersant shell; below 3 wt%, drying on flexible substrates becomes insufficient and leads to smearing at press speeds above 30 m/min. Compliance for this application is not governed by a single SEMI standard; suppliers align with REACH EC 1907/2006, RoHS 2011/65/EU, and internal metal contamination limits below 1 ppm. Terminal finished products include RFID antennas, membrane touch switches, flexible heater circuits, and smart packaging. Wetted parts must be limited to 316L stainless steel, PTFE, or high-density polyethylene because butyl acetate swells Buna-N and natural rubber seals in some printhead modules; published data for specific piezoelectric printhead elastomer compatibility is limited and must be verified by immersion testing under ISO 175:2010.

    When Ceramic Slip Casting Requires a Solvent with Water Content Below 300 ppm

    Multilayer ceramic capacitor tape casting incorporates electronic-grade n-butyl acetate at 15–40 wt% of total solvent mass in a polyvinyl butyral-based dielectric slip containing BaTiO₃ or X7R temperature-stable formulations. The solvent fraction is blended with ethanol or toluene-based co-solvents to control evaporation rate and maintain slip viscosity between 800–2,500 mPa·s for doctor blade casting. Downstream processing uses a tape casting head with blade gap of 50–150 µm, followed by multi-zone drying at 60–100°C with laminar counterflow air at 0.5–2.0 m/s. Water content in the solvent must remain below 300 ppm because higher levels deactivate the phosphate ester dispersant and promote polyvinyl butyral gelation, increasing green tape shrinkage variance above ±0.5%. Terminal products include 0201, 0402, and 0603 MLCCs used in mobile devices, automotive engine control units, and wireless modules. Compliance is linked to IEC 60384-1:2016 for ceramic capacitors and RoHS 2011/65/EU for lead and cadmium restrictions. The solvent is incompatible with strong acid catalyst systems that drop slip pH below 5, causing ester hydrolysis and acetic acid formation that flocculates BaTiO₃ slurries; published data for specific X7R dopant packages with butyl acetate-rich solvent systems is limited.

    Flexography and Inkjet Printhead Compatibility with 99.8% n-Butyl Acetate

    Acrylic conformal coatings and permanent legend inks for automotive and industrial printed circuit assemblies incorporate electronic-grade butyl acetate as a viscosity and evaporation modifier. For conformal coatings, the addition ratio is 5–20 wt% of sprayed formulation mass, maintaining viscosity between 25–60 mPa·s and dry film thickness between 25–75 µm; for legend inks, the ratio ranges from 20–40 wt% to allow screen printing through 80–160 mesh polyester or stainless steel screens. Selective spray coating uses 0.3–1.0 mm nozzle diameters at 2–4 bar atomization pressure, while legend ink curing uses thermal or UV cycles at 80–150°C for 10–30 min. The solvent improves leveling but must be excluded from polycarbonate components because stress crazing occurs within 24–72 h of residual solvent contact. Compliance for assembled boards is governed by IPC-CC-830C for conformal coating qualification, IPC-A-600K for printed board acceptance, and RoHS 2011/65/EU for restricted substances. Terminal finished products include PCBA modules for electric vehicle power systems, industrial motor drives, and medical electronic assemblies. Formulations must avoid combination with unreacted amine curing agents because butyl acetate can participate in slow transesterification at storage temperatures above 35°C, reducing usable pot life and increasing viscosity drift.

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    Certification & Compliance
    More Introduction

    When specified for edge-bead removal, photoresist thinning, and dispense-line cleaning in semiconductor fabrication, electronic-grade n-butyl acetate (CAS 123-86-4) is procured as a low-moisture, low-trace-metal solvent package rather than by a universal model code. Common order descriptions include “Electronic-Grade n-Butyl Acetate, SEMI C41,” “VLSI-grade n-BuAc,” or a supplier-specific product code appended to the same CAS number. The material is filled into fluoropolymer-lined drums, glass bottles, or electro-polished 316L stainless steel canisters after circulation through 0.05 µm filters and nitrogen blanketing. Unlined carbon-steel packaging is rejected because iron leaching can raise trace-metal results above the 5 µg/L VLSI limit. In sub-90 nm logic and memory processes, water and acidity control are critical because residual moisture drives hydrolysis to n-butanol and acetic acid, shifting resist dissolution rate and increasing after-develop defect density. The specification package, differentiation from industrial-grade butyl acetate and PGMEA, and wafer-track process behavior are detailed below.

    Assay, Water, and Trace-Metal Specifications Under SEMI C41

    The assay window is not a single purity number but a control of the non-assay fraction. A minimum assay of 99.5 area% by ASTM D5386 may still contain C6 and C8 acetate isomers, alcohols, and olefinic impurities that can leave carbonaceous post-ash residue. Water is controlled to 200–500 mg/kg by Karl Fischer analysis according to ASTM D1364; this range prevents excessive ester hydrolysis during storage while keeping moisture low enough to avoid changes in photoresist solvent retention. Acidity is held at ≤50 mg/kg as acetic acid under ASTM D1613 because free acid can alter the acid-labile chemistry of chemically amplified resists. Non-volatile residue is held at ≤5 mg/L by ASTM D1353; higher values are not acceptable for post-etch defect control. Color is controlled to ≤10 Pt-Co by ASTM D1209, and specific gravity is 0.878–0.883 at 20/20 °C by ASTM D4052. Trace-metal control by ICP-MS follows the SEMI C41 framework, with individual critical metals at ≤25 µg/L for standard electronic grade and ≤5 µg/L per element for VLSI subgrade. Sodium, potassium, iron, copper, and zinc are monitored tightly because these species degrade gate oxide integrity or increase leakage in front-end-of-line structures. Particle counts at ≥0.5 µm are typically ≤25 particles/mL using light-scattering liquid particle counters calibrated with NIST-traceable latex spheres.

    Lot-to-lot variance is a production concern. In-line GC assay can drift because butyl acetate absorbs water from humid air, but the ester peak area is unaffected; Karl Fischer water must be used in addition to GC. Acidity methods by ASTM D1613 require anhydrous titration solvent, otherwise the blank titration obscures the ≤50 mg/kg limit. Non-volatile residue by ASTM D1353 is sensitive to beaker cleanliness and fume hood particulate; fabs often require a dedicated clean-furnace glassware set and blank subtraction. Trace-metal ICP-MS data require multi-element internal standards and cleanroom sample preparation because ambient sodium and potassium backgrounds can exceed the 5 µg/L VLSI threshold. The solvent is stored under dry nitrogen at 15–25 °C; if transfer lines are exposed to relative humidity above 60 %, moisture ingress can raise water and acidity within 72 h. Contact with strong oxidizing agents or strong bases is not recommended because ester hydrolysis is accelerated above pH 8.

    ParameterRepresentative specificationTest method
    Assay as n-butyl acetate99.5–99.9 area%ASTM D5386
    Water200–500 mg/kgASTM D1364
    Acidity as acetic acid≤50 mg/kgASTM D1613
    Non-volatile residue≤5 mg/LASTM D1353
    Color, Pt-Co≤10ASTM D1209
    Specific gravity at 20/20 °C0.878–0.883ASTM D4052
    Individual critical metals≤25 µg/L; ≤5 µg/L per element for VLSIICP-MS per SEMI C41
    Particle count ≥0.5 µm≤25 particles/mLLight-scattering liquid particle counter

    What Differentiates Electronic-Grade Butyl Acetate from Coatings-Grade Material?

    The primary difference is not the solvent molecule, but the specification package and packaging. Industrial/urethane-grade n-butyl acetate with the same CAS number may be sold at 99.0–99.5 % assay without trace-metal data; water can reach 1000–2000 mg/kg, acidity can approach 200 mg/kg, and non-volatile residue can exceed 20 mg/L. In semiconductor use these are failure modes: water hydrolyses the ester, acidity shifts chemically amplified resist chemistry, and NVR creates post-ash defects. Packaging also differs; industrial-grade material is often shipped in unlined steel drums, whereas electronic-grade material requires fluoropolymer-lined or glass containers. The electronic-grade product is not a general surface-cleaning solvent; it is a process chemical controlled for trace species that interact with device layers.

    PropertyElectronic-grade n-butyl acetateIndustrial-grade n-butyl acetatePGMEA electronic grade
    Assay≥99.5 %99.0–99.5 %≥99.5 %
    Water200–500 mg/kg1000–2000 mg/kg200–500 mg/kg
    Acidity as acetic acid≤50 mg/kg≤200 mg/kg≤50 mg/kg
    Non-volatile residue≤5 mg/L≤20 mg/L≤5 mg/L
    Trace metals≤25 µg/L; VLSI ≤5 µg/Lnot specified≤25 µg/L; VLSI ≤5 µg/L
    Boiling point126.1 °C126.1 °C146 °C
    Closed-cup flash point22 °C22 °C45 °C
    Vapor pressure at 25 °C10 mmHg10 mmHg3.8 mmHg
    Viscosity at 25 °C0.68 cP0.68 cP1.10 cP

    In contrast to plain PGMEA, electronic-grade n-butyl acetate produces faster edge-bead clearing but is more susceptible to evaporative cooling at the dispense tip. On a coater/developer track with a 4-zone exhaust and 316L electro-polished stainless steel dispense line, the higher vapor pressure can cause intermittent diaphragm-pump cavitation when the line temperature exceeds 28 °C. Published data for this specific configuration is limited, but the known vapor-pressure difference explains why dispense lines for butyl acetate are often run at 0.2–0.4 MPa lower pressure than for PGMEA to reduce shear heating. Because n-butyl acetate has a closed-cup flash point of 22 °C, open trays must not be heated above ambient, and exhaust flow should be sufficient to keep vapor concentration below 10 % of the lower explosive limit of 1.7 % v/v. The lower viscosity of 0.68 cP relative to PGMEA at 1.10 cP reduces pump stroke resistance but also reduces line pressure as an indicator of filter loading; flow-rate checks are adjusted accordingly.

    When N-Butyl Acetate Replaces PGMEA in Edge-Bead Removal

    N-butyl acetate is used primarily as a cleaning, thinning, and edge-bead removal solvent rather than as the main photoresist solvent. In these roles, its viscosity and vapor pressure produce rapid solvent release after dispense. The Hansen solubility parameters are approximately δD 15.8 MPa1/2, δP 3.7 MPa1/2, and δH 6.3 MPa1/2, placing it within the solvency window for many acrylic and novolac resist polymers but with stronger hydrogen-bonding character than some hydrocarbon thinners. When used as a photoresist thinner, addition levels typically range from 10–20 mass % to reduce formulation viscosity without replacing the base solvent; the exact viscosity shift is resist-specific and should be verified with cone-and-plate rheometry at 25 °C rather than estimated from single-point measurements. In edge-bead removal, the solvent is dispensed from a nozzle directed at the wafer edge while the wafer rotates. The lower surface tension relative to PGMEA improves wetting of the edge exclusion zone, but the faster evaporation reduces contact time and can leave a visible residue ring if the spin-speed ramp is too slow or the exhaust imbalance is high.

    Surface tension data support this behavior. The surface tension of n-butyl acetate at 20 °C is approximately 25 mN/m, whereas PGMEA is higher near 28 mN/m; this improves edge wetting but shortens the time window before film skinning. In a process with a 40 s spin-dry step, the faster evaporative flux of butyl acetate can reduce residual solvent from edge-bead areas but can also leave an organic residue if the nozzle dispense stops before the solvent film fully shears off. The edge-bead removal recipe must therefore be tuned with high-speed camera inspection of the edge exclusion zone rather than visual inspection through the track window. Because dispensers and bowl exhaust systems vary by platform, the dispense volume and nozzle radial position are process-specific; published data for a fixed 300 mm recipe is limited.

    Because n-butyl acetate is a rapidly evaporating ester, process engineers use it when the requirement is fast edge-bead clearing, low moisture content, and low trace-metal burden at a lower boiling point than PGMEA. For thick-film photoresist applications requiring longer leveling, n-butyl acetate may be blended at 10–20 mass % to reduce viscosity without replacing the high-boiling base solvent. The selection between n-butyl acetate, PGMEA, and ethyl lactate is governed by solvent release rate, Hansen solubility range, and trace-metal specification; no single solvent is universally optimal. Substituting industrial-grade n-butyl acetate can introduce water, acids, and non-volatile residue that exceed the limits required by SEMI C41.

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