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Boric Acid Electronic/EL Grade

    • Product Name: Boric Acid Electronic/EL Grade
    • Factroy Site: Yudu County, Ganzhou, Jiangxi, China
    • Price Inquiry: admin@ascent-chem.com
    • Manufacturer: Ascent Petrochem Holdings Co., Limited
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    Specifications
    HS Code 121159
    Product Name Boric Acid Electronic/EL Grade
    Chemical Formula H3BO3
    Cas Number 10043-35-3
    Molecular Weight 61.83 g/mol
    Grade Electronic/EL Grade
    Appearance White crystalline powder
    Purity Assay ≥99.99%
    Melting Point 171 °C (decomposes)
    Water Solubility 5.7 g/100 mL at 20 °C
    Density 1.435 g/cm³
    Ph 0 1 M Aqueous Solution ~5.1
    Chloride Content ≤1 ppm
    Sulfate Content ≤1 ppm
    Iron Content ≤0.5 ppm
    Heavy Metals As Pb Content ≤1 ppm

    As an accredited Boric Acid Electronic/EL Grade factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.

    Packing & Storage
    Packing 25 kg net in sealed polyethylene-lined fiber drum with tamper-evident closure, labeled as Boric Acid Electronic/EL Grade.
    Container Loading (20′ FCL) 20′ FCL: Boric Acid Electronic/EL Grade packed in sealed bags/pails, palletized, secured against moisture and contamination for safe transit.
    Shipping Boric Acid Electronic/EL Grade ships as a non-hazardous, high-purity dry solid in sealed, moisture-resistant polyethylene-lined containers or drums. No UN/DG classification applies. Handle with clean, dry equipment and standard PPE; store in a cool, dry area away from moisture and incompatible materials. Common ground/air carrier acceptable.
    Storage Store Boric Acid Electronic/EL Grade in a tightly sealed, original container in a cool, dry, well-ventilated area. Protect from moisture, humidity, and direct sunlight. Keep away from strong bases and oxidizing agents. Ensure container is clearly labeled and inaccessible to unauthorized personnel. Maintain stable temperatures; avoid extreme heat to preserve purity and electronic-grade performance.
    Shelf Life Shelf life is typically 24 months when stored in a tightly sealed container in a cool, dry area.
    Application of Boric Acid Electronic/EL Grade

    B₂O₃ Source Integrity in Fusion-Drawn Aluminoborosilicate Glass

    Batch formulation for alkali-free aluminoborosilicate glass requires electronic-grade boric acid as the primary B₂O₃ carrier because sulfate and chloride residues from technical-grade material alter furnace volatilisation rates and accelerate refractory corrosion. For a typical TFT-LCD substrate composition, the boric acid charge is maintained between 15 kg and 22 kg per 100 kg of batch, yielding 8–12 wt% B₂O₃ in the final glass; the exact setpoint is adjusted against cullet ratio and alkali contamination. Electronic-grade material used in this application is specified with Fe below 0.5 ppm, Cu below 0.3 ppm, Ni below 0.3 ppm, Mn below 0.3 ppm, chloride below 20 ppm and sulfate below 50 ppm, because transition metals introduce optical absorption bands between 380 nm and 1100 nm and impair dielectric homogeneity. Incoming boric acid is blended with silica flour, calcined alumina, magnesium oxide, calcium carbonate and strontium carbonate in a closed pneumatic conveying system to avoid boron-rich segregation; a controlled particle size distribution with D50 below 150 µm and loss-in-weight dosing are used because moisture variation above 0.5 wt% changes batch oxidation state and glass redox. Boric acid dehydration to metaboric acid begins at 100–130°C and proceeds to B₂O₃ above 300°C, so pre-heating above 350°C is avoided before charging to prevent volatile H₂O-B₂O₃ losses.

    Impurity/ParameterMaximum concentrationTypical test method
    Fe0.5 ppmICP-MS
    Cu0.3 ppmICP-MS
    Ni0.3 ppmICP-MS
    Mn0.3 ppmICP-MS
    Chloride20 ppmIon chromatography
    Sulfate50 ppmIon chromatography
    Moisture0.5 wt%Karl Fischer titration

    Melting for fusion-drawn substrates is run in oxy-fuel or hybrid electric furnaces at 1600–1680°C with glass residence time of 24–48 h. The B₂O₃ network former lowers the 10³ dPa·s melt temperature by approximately 30–50°C compared with boric-free aluminosilicate batches and suppresses devitrite crystallisation on the isopipe. Forming is performed on a zircon or alumina-zirconia-silica isopipe at 1180–1280°C; the root-to-tip gradient is controlled within ±3°C across the width to maintain thickness variation below ±0.03 mm. Boric oxide improves fusion draw operability by reducing surface tension and liquidus velocity, but B₂O₃ above 13 wt% reduces strain point below 640°C and increases wet etch rate, which is incompatible with a-Si and IGZO backplane threshold-voltage stability. The final substrate is supplied in 0.25–0.7 mm thickness after edge grinding, inspection and laser marking; product compliance is verified by XRF and ICP-MS following ASTM C169-16 and RoHS Directive 2011/65/EU, with alkali content below 0.1 wt% to prevent ion migration in TFT arrays.

    In reel-to-reel selective nickel plating of copper alloy leadframes and connector terminals, electronic-grade boric acid is maintained at 30–45 g/L, with a typical nickel sulfamate bath setpoint of 37.5 g/L, because the pH at the cathode diffusion layer rises from hydrogen co-evolution and technical-grade boric acid introduces iron and copper into the deposit. The bath is operated at pH 3.8–4.2, temperature 55–60°C and current density 8–20 A/dm² for strip speed 1–4 m/min; boric acid supplies the buffer capacity that prevents nickel hydroxide precipitation within the high-pH boundary layer, and its buffer index is depleted when titration values in a 2 mL bath sample fall outside the high-purity specification. Analytical control is performed every shift by AAS or ICP-OES; depletion below 30 g/L produces rough, nodular deposits and above 50 g/L risks boric acid crystallisation in plate heat exchangers below 35°C. Electronic-grade purity with chloride below 20 ppm and sulfate below 50 ppm is specified to avoid stress cracking in leadframe plating, while Fe and Cu levels below 1 ppm total prevent particulate inclusion at the die bond pad. The electroplated coating is supplied under ISO 4526:2004 for engineering nickel and ASTM B689-97(2018) for electroplated nickel coatings; final components are silver spot- or tin-finished leadframes used in QFP, SOP and QFN packages. High-speed selective plating lines use 400–800 L bath volumes, and drag-out losses from strip edges range from 0.8–1.5 L/h; boric acid replenishment is calculated from mass balance rather than fixed addition, and the dosing system delivers a pre-dissolved 50 g/L solution at 50°C to avoid uncontrolled crystallisation. Published data for boric acid as a direct tin-whisker suppressor is limited; its effect in nickel sulfamate electrolytes remains pH control and deposit stress reduction.

    What Limits Borate Ester Stability in High-Ripple Aluminum Electrolytic Capacitors?

    Ethylene glycol-based electrolytes for 16–450 V aluminum electrolytic capacitors are formulated with electronic-grade boric acid at 5–15 wt%, neutralised with anhydrous ammonia or primary amines to pH 6.5–7.5, forming ammonium borate and borate ester species. The manufacturing sequence consists of heating the glycol to 120–130°C under 20–50 kPa vacuum, adding boric acid at a controlled rate to avoid foaming, stripping residual water to below 3 wt%, and then cooling to 30–40°C before vacuum impregnation into the wound element. Electronic-grade boric acid is required with chloride below 10 ppm, sulfate below 30 ppm and phosphate below 5 ppm, because free chloride attacks the etched aluminium foil and causes leakage current drift, while sulfate promotes gas evolution and pressure venting. The impregnated element is aged at 1.15–1.20 times rated voltage at 85–105°C for 1–4 h, during which the borate electrolyte reforms the anodic oxide at flaws and reduces leakage current below 0.03 CV µA under IEC 60384-4:2016 and JIS C 5101-4. Boric acid above 18 wt% raises electrolyte viscosity and degrades low-temperature ESR at -40°C, while water above 10 wt% increases internal pressure and may lift safety vents at rated ripple current. Final products are radial, snap-in and screw-terminal aluminum electrolytic capacitors used in switch-mode power supplies, solar inverters and motor drives.

    ParameterTypical value/toleranceControl method
    Boric acid concentration5–15 wt%Mannitol titration
    pH6.5–7.5Potentiometric pH meter
    Residual water<3 wt%Karl Fischer titration
    Chloride<10 ppmIon chromatography
    Sulfate<30 ppmIon chromatography
    Ageing voltage1.15–1.20 V_RCapacitor ageing rack
    Ageing temperature85–105°CThermocouple-controlled chamber
    Final leakage current<0.03 CV µAConstant voltage test per IEC 60384-4:2016

    Manufacturing low-dielectric woven glass fabric for 28 GHz millimetre-wave multilayer boards uses boroaluminosilicate glass fibre in which electronic-grade boric acid provides 7–22 wt% B₂O₃ depending on glass type—traditional E-glass at 7–10 wt%, low-Dk D-glass at 20–22 wt%. Batch preparation uses electronic-grade boric acid at 12–40 kg per 100 kg of glass batch, with the higher addition only for low-Dk glass that must pass IPC-4103A fabric classification and IPC-4101E laminate requirements. Melting is performed in oxy-gas or electric-melt furnaces at 1550–1620°C; the melt is conditioned in forehearth channels at 1170–1220°C and fibreised through platinum-rhodium bushings with 2,000–4,000 tips, followed by water spray, aqueous sizing, drying and winding. The glass fabric is then woven into 106, 1080, 2116 styles and stacked with epoxy or PPE/PPO prepregs under vacuum lamination at 190–210°C and 1.5–3.0 MPa. Boric acid impurity limits are aligned with IEC 61249-2-26 halogen-free laminate requirements; chloride contamination in the glass batch above 25 ppm reduces bushing life and promotes platinum dissolution. Terminal products include rigid multilayer PCB laminates with Dk below 3.6 and Df below 0.004 at 10 GHz, used in 5G base station antenna feeders, automotive radar modules and high-speed backplanes. Production-scale failure occurs when glass melt phase separation appears after B₂O₃ exceeds 25 wt%, causing low chemical durability and filament breakouts; the practical upper addition limit is therefore tied not only to dielectric performance but also to bushing stability and fabric tensile strength above 0.5 N/tex.

    When Silver Co-Firing Demands Low-Fire Borosilicate Frits

    Low-temperature co-fired ceramic tape fabrication requires electronic-grade boric acid as a batch ingredient for crystallisable boroaluminosilicate frits that densify below the silver conductor melting point. The frit batch typically includes 10–20 wt% boric acid to generate 5–12 wt% B₂O₃ in the quenched glass, with the addition tuned so that the glass transition temperature remains below 500°C and the crystallisation onset is above 700°C. Glass is melted at 1300–1450°C in platinum-lined or quartz crucibles, water-quenched, wet-milled to D50 1–3 µm, and mixed with alumina and an acrylic or PVB binder in MEK/ethanol to cast 50–250 µm green tape. The tape is blanked, via-formed, screen-printed with silver paste, laminated at 70–90°C and 10–20 MPa, and co-fired at 850–900°C in air. Boric acid purity is controlled to keep total transition metals below 1 ppm because Fe and Cu promote unplanned crystallisation and reduce insulation resistance below 10¹² Ω·cm after 85°C / 85% RH ageing. Compliance testing follows IPC-TM-650 2.5.5.13 for relative permittivity and loss tangent, and RoHS Directive 2011/65/EU for Pb and Cd restrictions; final LTCC modules are used in RF filters, baluns, Bluetooth front-end modules and automotive radar antenna-in-package. Published data for optimal boric acid ratio in specific proprietary LTCC formulations is limited, and differential thermal analysis is required for each new boric acid source to validate densification shrinkage within ±0.5%.

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    Certification & Compliance
    More Introduction

    Boric acid Electronic/EL Grade, chemical formula H3BO3, CAS 10043-35-3, molecular weight 61.83 g/mol, is supplied as a white crystalline powder or granular material with a theoretical B2O3 content of 56.3 wt%. The term “Electronic/EL Grade” is a purity class rather than a harmonized model number; supplier catalog designations may include 4N, 4N5, 5N, BA-EL, or manufacturer-specific product codes. Qualification therefore requires comparison of the certificate of analysis and the application-specific impurity budget, not reliance on product labeling alone. Typical initial specification parameters include H3BO3 assay at ≥99.99 wt% and, for high-purity 5N material, ≥99.999 wt%, with chloride ≤5 ppm, sulfate ≤10 ppm, iron ≤5 ppm, and total heavy metals as lead ≤5 ppm. Particle-size distribution is commonly controlled by laser diffraction per ISO 13320 to a D50 window of 150–500 µm, though the exact range is supplier-specific. Bulk density is typically reported in the 0.75–1.00 g/cm³ range. The material is used where alkali, alkaline-earth, transition-metal, and halide contamination must be minimized: electroplating baths, display-glass batches, semiconductor packaging fluxes, and borate precursor formulations.

    What Purity Metrics Define Electronic/EL Grade Qualification?

    Qualification of Electronic/EL grade does not rely on a single harmonized model number. Manufacturer technical data sheets define the grade by a three-part control set: primary assay by acid-base titration in the presence of mannitol, trace-cation analysis by inductively coupled plasma mass spectrometry using EPA Method 6020B or equivalent digestion methods, and trace-anion analysis by ion chromatography. The H3BO3 assay alone is insufficient because technical grades can exceed 99.0 wt% and still contain >200 ppm chloride or >20 ppm iron, which are disqualifying for electronic process baths. Table 1 presents a comparative COA window derived from publicly available supplier data sheets for electronic/EL grade, general technical grade, and pharmacopoeial-grade boric acid. The ranges are not a harmonized ISO specification; batch-specific COAs vary.

    ParameterElectronic/EL GradeTechnical GradeBP/USP Pharmacopoeial Grade
    H3BO3 assay≥99.99 wt%; some COAs ≥99.999 wt%99.0–99.5 wt%99.5–100.5 wt%
    Chloride≤5 ppm≤200 ppm≤50 ppm
    Sulfate≤10 ppm≤500 ppm≤100 ppm
    Iron≤5 ppm≤20 ppm≤20 ppm
    Heavy metals as Pb≤5 ppm≤15 ppm≤10 ppm
    Arsenic≤1 ppm≤3 ppm≤2 ppm
    Calcium, sodium, potassium, magnesium≤2–5 ppm each typicalNot routinely specifiedLimited by monograph

    The defining difference is not the boric acid assay but the maximum allowable ionic and metallic residues. Electronic/EL grade typically requests chloride ≤5 ppm, sulfate ≤10 ppm, iron ≤5 ppm, and calcium, sodium, potassium, and magnesium each ≤2–5 ppm. Pharmacopoeial grades may permit higher chloride and sulfate while technical grades often permit sulfate up to 500 ppm and iron up to 20 ppm. For plating baths and optical glass, the transition-metal and halide budget controls deposit morphology, internal stress, and transmission loss. Method codes on supplier COAs vary; however, the assay is routinely determined by potentiometric titration of the mannitol-boric acid complex with 0.1 mol/L sodium hydroxide, a procedure described in pharmacopoeial monographs. Chloride and sulfate are often quantified by ion chromatography using EPA Method 300.1 after dissolution in high-purity water at 0.1 wt% sample loading. Trace metals are digested in 5 mol/L HNO3 and measured by ICP-MS per EPA Method 6020B. The reported limit of detection for iron is typically <0.5 ppm.

    In acid nickel electroplating, boric acid Electronic/EL Grade is introduced at 37–45 g/L as a weak buffer in Watts and nickel sulfamate electrolytes. A 267 mL Hull cell run at 1 A for 10 min can expose the effect of chloride contamination on bright nickel: pitting increases when chloride exceeds 5–10 ppm because chloride adsorption at high-current-density sites destabilizes the brightener film. The solubility of boric acid in water is approximately 48 g/L at 20 °C, 89 g/L at 40 °C, and 148 g/L at 60 °C, so the 37–45 g/L operating window at 55–60 °C is sufficiently below the solubility limit for a continuously filtered bath. Internal stress shifts are measured with a spiral contractometer according to ASTM B636; iron contamination above 5 ppm can increase tensile stress in bright nickel deposits. Iron, copper, and zinc enter the bath through impure boric acid and from drag-in; technical-grade boric acid is a known source of iron and chloride excursions in medium-sized plating lines.

    Nickel Plating Bath Buffer Behaviour and Solubility Constraints

    The operational buffer window of boric acid in mixed nickel sulfate-chloride electrolytes is observed at pH 4.0–5.0, despite the simple pKa1 of 9.24 in pure water. This divergence arises from the weak coordination chemistry of boric acid with nickel-hydroxy species and from the high ionic strength of the bath; published mechanistic data for the complete speciation model is limited. In a 1,000 L production bath, buffering failure appears as pH drift at the cathode boundary layer, not simply as bulk-solution pH drop. At pH below 3.8, cathode efficiency decreases and hydrogen evolution increases; at pH above 5.2, nickel hydroxide precipitation can form sludge and increase surface roughness. Boric acid additions are therefore made by metering a slurry through a 100 µm filter screen to avoid undissolved crystals on anode bags. In shut-down conditions, bath temperature falling from 55 °C to 20 °C brings the boric acid concentration closer to the 48 g/L solubility limit, which may cause crystal nucleation on heater surfaces and filter housings if the bath is not maintained above 30 °C.

    Electrochemical response can be evaluated in a 267 mL Hull cell with a polished brass panel at 23–25 °C or 55–60 °C. At 1 A cell current for 10 min, the current density range is approximately 0.1–8 A/dm²; bright nickel systems containing electronic/EL grade boric acid typically produce a fully bright range from 0.5–5 A/dm² when chloride is below 5 ppm. A control panel produced with technical-grade boric acid at the same 37 g/L loading may show pitting above 3 A/dm² and a dull band below 0.8 A/dm². The pitting mechanism is linked to chloride adsorption and breakdown of the nickel-plated layer, not to anode passivation. Internal stress measurements according to ASTM B636 on a 25 µm nickel foil show that iron contamination of 5–10 ppm can shift stress by 20–40 MPa; this is one reason electronic/EL grade COAs specify iron at ≤5 ppm.

    In a 1,000 L bath, the acid addition rate is typically 0.5–1.5 L/h of 30% sulfuric acid to maintain pH 4.0–4.5 under plating at 2–3 A/dm². When boric acid is absent or below 30 g/L, the pH at the cathode boundary layer rises rapidly, leading to nickel hydroxide precipitation and rough deposits. At 45 g/L, the buffering capacity of the bath is sufficient to maintain a pH swing of less than 0.3 units across a 10 Ah/L load. In a bath with 37 g/L, pH swing may reach 0.5 units over the same charge load. Solubility constraints impose an upper limit: adding boric acid above 50 g/L provides diminishing buffer capacity and risks crystallization when bath temperature falls below 30 °C. The material is therefore fed as a slurry through a 100 µm filter to avoid undissolved particles; this equipment configuration is used on both 500 L pilot lines and 5,000 L production vessels.

    For high-speed acid tin electroplating, anionic contamination from technical-grade boric acid is a documented root cause for low-current-density dullness and poor solderability after reflow. Electronic/EL grade reduces sulfate and chloride to ≤10 ppm and ≤5 ppm, respectively, so that a methanesulfonic acid bath running at 30–40 A/dm² can maintain a bright tin deposit over 0.1–1.0 A/dm² low-current-density zones in a Hull cell. The same grade is used in fluoroborate tin and tin-lead baths at 20–30 g/L as a grain refiner and pH buffer, although the exact grain-refinement mechanism is not fully standardized and published data for specific configurations is limited.

    When Electronic/EL Grade Is Used in Borosilicate Batch Oxidation

    When added as a batch ingredient, H3BO3 undergoes thermal dehydration to HBO2 at approximately 170 °C and then to B2O3 in the furnace; the theoretical B2O3 contribution is 56.3 wt%. In an air-fired continuous glass furnace operating at 1500–1600 °C, boric oxide acts as a flux that lowers batch melting temperature, improves homogeneity, and suppresses thermal expansion through the formation of trigonal BO3 units in the silicate network. Electronic/EL grade is specified for display-grade alkali-borosilicate glass because transition-metal impurities such as Fe2O3, Cr2O3, and CuO introduce absorption bands in the 400–800 nm visible window. A typical low-iron display glass may hold Fe2O3 below 100 ppm, requiring the boric acid source to contribute no more than 2–5 ppm iron at its usage level. Boron volatility during melting is a process conflict: B2O3 can volatilize as alkali borate species, with published losses of 5–15% depending on furnace atmosphere, temperature, and batch humidity; the exact loss for a given furnace is determined by mass-balance reconciliation.

    Batched glass formulas using electronic/EL grade calculate the required boric acid mass by dividing the target B2O3 weight by 0.563. For a 1,000 kg glass batch requiring 10 wt% B2O3, the boric acid input is approximately 177.6 kg. The actual feed is adjusted by 2–5% to compensate for volatilization losses. In melters with oxy-fuel firing and no batch preheating, boron retention may be lower than in regenerative end-port furnaces because of higher flame and crown temperatures. A boric acid source with iron above 5 ppm can add 0.9–1.8 ppm iron to the final glass when used at 17.8 wt% of the batch, which shifts chromaticity in display glass. The electronic/EL grade is therefore integrated into the batch only after a lot-specific COA review.

    At batching scale, pre-blending the electronic/EL grade with sodium carbonate and silica sand reduces segregation. The material is normally milled to match the sand fraction; if the D50 exceeds 500 µm, dissolution in the melt can be incomplete and produce cord defects. Storage at relative humidity below 60% and re-drying at 40–60 °C before gravimetric batching reduce caking and mass correction errors. Dissolution for plating baths is best performed in a side tank at 60 °C with a high-shear disperser operating at 1,500 rpm; the powder is added at a maximum rate of 5 kg/min per 1,000 L to avoid local supersaturation and crystal nucleation. A 10 wt% stock solution at 60 °C remains stable for transfer if the transfer line is heat-traced above 40 °C. The stock solution should not be stored below 20 °C because the 48 g/L solubility limit is approached and precipitation can form in low-flow dead legs.

    In semiconductor packaging fluxes, boric acid Electronic/EL Grade is incorporated at 0.5–2.0 wt% as a non-halide oxide scavenger in no-clean flux systems. The critical specification is chloride ≤5 ppm because post-reflow chloride residues above 5 ppm can reduce surface insulation resistance under bias moisture testing. Flux performance is commonly screened by IPC J-STD-004 SIR criteria at 85 °C and 85% relative humidity with a 50 V DC bias; a pass is typically defined as an SIR value above 108 Ω after 168 h. Technical-grade boric acid introducing 200 ppm chloride can depress SIR by two to three orders of magnitude in the same test. The Electronic/EL grade also controls sodium and potassium below 5 ppm to limit mobile-ion contamination in packaged devices.

    Trace-Metal Control and REACH/CLP Exposure Boundaries

    Electronic/EL grade material enters EU and global supply chains under two overlapping regulatory obligations. Boric acid is included on the REACH Candidate List as a substance of very high concern under Regulation (EC) No 1907/2006 because of reproductive toxicity, and it carries a harmonized CLP classification of Repr. 1B H360FD under Regulation (EC) No 1272/2008. These classifications impose exposure-minimization controls during batching, sampling, and laboratory analysis. Industrial handling therefore uses enclosed transfer systems, local exhaust ventilation with a capture velocity of 0.5–1.0 m/s at powder drop points, and HEPA-filtered dust collection. In analytical laboratories, trace-cation ratios are measured by ICP-MS following digestion in high-purity water and nitric acid, using method codes such as EPA Method 6020B; anion measurement for chloride and sulfate is typically performed by ion chromatography with conductivity detection. The grade should not be blended with strong reducing agents or concentrated alkali in a closed container because neutralization and reduction reactions can generate heat and aerosolized borate mist. For aqueous electroplating baths, a 10 wt% stock solution prepared at 60 °C under agitation is used; the solution should be re-dissolved gently at 60 °C if crystals appear, not by adding strong mineral acid.

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