| HS Code | 758322 |
| Appearance | Clear transparent liquid, free of particles |
| Refractive Index Film | 1.45 - 1.50 |
| Light Transmittance | >95% in visible range |
| Viscosity 25 C | 5 - 20 cP |
| Solids Content | 5 - 10 wt% |
| Solvent System | Alcohol/ether based electronic-grade solvent |
| Density 25 C | 0.80 - 0.95 g/cm³ |
| Flash Point | >23°C (closed cup) |
| Purity | Electronic/EL grade, ≥99.99% trace metal purity |
| Filtration | 0.1 μm filtered |
| Storage Temperature | 2 - 8°C |
| Shelf Life | 6 months from date of manufacture |
As an accredited Anti-Reflective Coating Electronic/EL Grade factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.
| Packing | Packaging: 1 L amber glass bottle with PTFE-lined cap, sealed under nitrogen, for Electronic/EL Grade anti-reflective coating. |
| Container Loading (20′ FCL) | 20′ FCL loading: drums of Anti-Reflective Coating (Electronic/EL Grade) secured upright, with clean, dry, well-ventilated container and proper hazard labeling. |
| Shipping | Shipments of Anti-Reflective Coating Electronic/EL Grade are handled as controlled chemical materials. Product is packaged in sealed, corrosion-resistant containers to prevent contamination. Transport follows applicable hazardous material regulations, with proper labeling and documentation. Avoid exposure to moisture, extreme heat, or direct sunlight during transit and storage. |
| Storage | Store in a tightly sealed, original container in a cool, dry, well-ventilated area away from incompatible materials, heat, sparks, and direct sunlight. Keep free from moisture and contamination. Ensure secondary containment and proper labeling. Do not store above recommended temperature, and follow manufacturer’s specific shelf-life guidance for Electronic/EL Grade chemical integrity. |
| Shelf Life | Anti-Reflective Coating Electronic/EL Grade has a shelf life of 12 months when stored sealed in its original container at room temperature. |
For ArF photoresist bottom anti-reflective coating work on a coater/developer track, the non-negotiable constraint is that the optical stack must not generate downwind reflectance exceeding 0.35% at 193 nm across a 1.35–1.55 refractive-index window after post-apply bake. The electronic/EL-grade anti-reflective coating precursor is dispensed through a 0.05 μm PTFE point-of-use filter at 2.1–3.4 wt% solids in 2-heptanone/PGMEA 70:30 v/v, with a graduated open-cup dispense of 1.8–2.7 mL for 300 mm wafers and spin-up at 1,200–1,800 rpm before edge bead removal. Industry compliance standards include ISO 14644-1:2015 Class 3 cleanroom operation, SEMI S2-0718 for track exhaust and interlock sequencing, ASTM D3359-17 for cross-cut adhesion after cure, and REACH 1907/2006/EC Article 33 declarations for solvent-borne components. The downstream production process is integrated into a 300 mm in-line track with vapor-primed hexamethyldisilazane adhesion promotion, chilled wafer at 18–22°C, post-apply bake at 175–205°C for 60–90 s on a proximity hotplate, photoresist coat, softbake, immersion or dry ArF exposure, post-exposure bake, and pattern development in 2.38 wt% tetramethylammonium hydroxide. Terminal finished product types include ArF dry logic wafers, ArF immersion DRAM nodes, KrF power management integrated circuits, and redistribution-layer photoresist stacks for advanced packaging. Observed production-scale failure modes include air-bubble microvoiding when the filter upstream pressure drops below 0.07 MPa, and a reflectivity cliff-edge at thickness above 168 nm where standing-wave amplitude at the resist interface doubles, producing resist footing at 14 nm half-pitch structures.
During thin-film electroluminescent lamp fabrication, the sputter-deposited indium tin oxide transparent front electrode on moving polyethylene terephthalate web requires an anti-reflective overcoat that tolerates subsequent thermal and plasma exposure without interfacial cracking. The electronic/EL-grade anti-reflective coating precursor is diluted to 4.5–6.5 wt% solids in a 3:1 isopropanol/water solvent system containing 0.2 wt% acetic acid catalyst; this loading produces a dried film thickness of 85–115 nm after micro-gravure application at 14–22 m/min web speed. Industry compliance standards for the finished electroluminescent lamp include IEC 60068-2-14:2023 thermal cycling, ASTM D1003-21 haze and luminous transmittance, ASTM D3359-17 adhesion, ISO 14644-1:2015 Class 5 coating room operation, and RoHS 2011/65/EU Annex II restrictions for lead, cadmium, and phthalate plasticizers. Downstream production process involves corona treatment of the PET/ITO surface at 38–42 mN/m surface energy, in-line filtration through a 0.2 μm polypropylene filter, gravure roll speed differential of 1.0–1.3% to avoid ribbing, and forced-air drying at 125–135°C for 45–70 s, followed by UV cure at 1,200 mJ/cm². Terminal finished product types include automotive instrument cluster electroluminescent panels, membrane-switch backlight assemblies, airplane cabin exit signage, and industrial keypad/control-panel electroluminescent lamp overlays. A production line observation shows that if the web enters the sputter zone with residual solvent above 0.8 wt%, the indium tin oxide layer develops microcracks at the coating interface; pre-drying under 40% relative humidity is therefore enforced.
On flexible OLED cover-lens planarization lines between the color-neutralization layer and the vacuum barrier, the electronic/EL-grade anti-reflective coating precursor functions as a refractive-index matching layer whose outgassing and film-thickness uniformity determine downstream barrier integrity. The precursor is mixed at 1.8–2.6 wt% solids in n-butyl alcohol/diacetone alcohol 85:15 v/v and slot-die coated onto a 40 μm colorless polyimide substrate at a wet film thickness of 5.0–7.5 μm to yield a 95–130 nm dry index-matching layer. Industry compliance standards include ASTM E595-15 for total mass loss below 0.1% and collected volatile condensable materials below 0.05%, IEC 62341-6-1:2017 for OLED optical performance, ASTM D1003-21 haze below 0.5%, and REACH 1907/2006/EC Annex XVII restrictions on residual solvent levels. Downstream production process applies the coating after 120°C desiccation of the colorless polyimide roll, uses a slot-die coater with 0.8–1.2 mm lip gap and 0.2–0.4 mL/min per mm die swath flow, then cures in a nitrogen-purged multi-zone oven at 80°C, 120°C, and 180°C with residence time of 4–6 min; after cure, a vacuum-deposited silicon oxynitride barrier layer is applied directly. Terminal finished product types include foldable AMOLED display cover windows, rollable OLED panel front films, wearable device screen-protection films, and automotive interior curved display covers. A known processing boundary is that exposure to amine-containing hard-coat primers before complete cure produces visible mura and adhesion loss; the line must maintain ≤0.1 ppm amine vapor in the coating vestibule.
For display cover glass anti-reflective overcoats used in LCD and OLED modules, the formulation must reconcile zero-shear viscosity of 2.5–4.5 mPa·s with Newtonian behavior up to 1,000 s⁻¹ and maintain stable wetting on cleaned alkali-aluminosilicate glass. The electronic/EL-grade anti-reflective coating precursor is formulated at 2.0–3.0 wt% solids in PGMEA/isopropanol 60:40 v/v and applied through a slot-die coater with die lip gap 0.05–0.10 mm onto glass sheets of 0.7–1.1 mm thickness. Industry compliance standards include ISO 9211-4:2012 for adhesion, abrasion, humidity, and temperature testing of optical coatings, ASTM D1003-21 for transmittance ≥ 95.0% and haze ≤ 0.3%, MIL-C-675C durability for anti-reflection coatings, and RoHS 2011/65/EU Annex II. Downstream production process begins with ultrasonic alkaline detergent cleaning at 55±2°C, plasma cleaning at 300 W for 30 s, slot-die coating at 0.8–1.5 m/min line speed, drying at 60°C for 90 s, then thermal cure at 200–230°C for 30–45 min in a Class 100 convection oven to remove silanol condensation by-products. Terminal finished product types include LCD television front glass, OLED smartphone cover lenses, point-of-sale kiosk touch screens, and outdoor digital signage front filters. A repeated field failure encountered in production is die-lip accumulation of 0.5–1.0 wt% high-boiling residue after 45–60 min of continuous coating, causing streak defects; the corrective sequence is an interrupted slot-die purge with 70:30 PGMEA/DI water at 0.5 mm gap and 0.3 L/h flow.
| Coating method | Solids loading | Wet film thickness | Cure condition | Optical acceptance |
|---|---|---|---|---|
| Slot-die | 2.0–3.0 wt% | 4.5–6.0 μm | 220°C for 30 min | ASTM D1003-21 haze ≤ 0.3% |
| Micro-gravure | 3.2–4.5 wt% | 3.0–5.0 μm | 150°C for 2 min plus UV | ISO 9211-4:2012 abrasion |
| Dip coating | 1.2–2.0 wt% | 2.0–3.0 μm | 180°C for 60 min | MIL-C-675C durability |
In automotive HMI cover lens anti-reflective overcoat qualification, the test sequence is defined by heat, humidity, and abrasion regimes that go well beyond consumer display specifications. The coating is compounded at 2.4–3.6 wt% solids in butyl acetate/diisobutyl ketone 50:50 v/v with 0.8–1.2 wt% blocked acid catalyst; this level produces a cured film of 110–150 nm after application. Industry compliance standards include IEC 60068-2-14:2023 change-of-temperature cycling from −40°C to 85°C, IEC 60068-2-30:2005 damp heat cyclic testing, ISO 15184:2020 pencil scratch hardness, ASTM D4060-19 Taber abrasion, and REACH 1907/2006/EC Annex XVII for restricted substances. Downstream production process applies the coating to CNC-machined polycarbonate or polymethyl methacrylate lenses after UV-curable hard-coat primer, using a robotic spray system with 1.0–1.2 mm nozzle orifice, 0.25–0.35 MPa atomizing air, and 20–25 s flash-off; thermal cure follows at 110–125°C for 40–60 min to prevent deformation of 3–5 mm thick lens stock. Terminal finished product types include center-information display touch panels, instrument cluster cover lenses, head-up display combiner elements, and side-camera monitor covers. A known boundary is that coating thickness below 80 nm triggers visible color splitting at oblique angles above 30°; above 200 nm, the coating loses pencil hardness from 3H to H and develops microcracks after 500 thermal cycles.
When the same precursor is used in micro-OLED waveguide patterning, the primary requirement shifts to refractive-index stability within a ±0.005 tolerance over 400–700 nm and vacuum outgassing low enough for silicon-based emissive stacks. The electronic/EL-grade anti-reflective coating is diluted to 3.0–4.2 wt% solids in mesitylene/ethyl lactate 80:20 v/v and deposited on 8-inch glass or silicon wafers by inkjet with 1.5 pL drop volume or by spin coating at 1,000–2,000 rpm. Industry compliance standards include ASTM E595-15 total mass loss below 0.10%, ISO 14644-1:2015 Class 2 wafer handling, SEMI S2-0718 for lithography cluster tool interlocks, ASTM D3359-17 adhesion, and ISO 9211-4:2012 humidity and temperature aging. Downstream production process uses a photolithographic patterning step after coating: image reversal resist is applied over the anti-reflective coating layer, exposed through a chrome mask at 365 nm with 220 mJ/cm², developed, and the anti-reflective coating is reactive-ion etched in CF₄/O₂ plasma at 60–90 W and 20 mTorr to open sub-pixel optical windows; subsequently an atomic-layer-deposited Al₂O₃ barrier is grown at 80°C to seal edge defects. Terminal finished product types include micro-OLED displays for augmented-reality near-eye optics, electronic viewfinder panels, head-mounted display medical monitors, and sub-1 μm pixel-pitch waveguide test structures. A field-verified limitation is that etch selectivity against the photoresist falls below 0.8:1 if the post-bake temperature exceeds 230°C, which forces the line to hold bake uniformity to ±3°C across the wafer.
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The anti-reflective coating electronic/EL grade designated ARC-EL/300 is a wet-process fluorinated organosiloxane formulation intended for single-layer quarter-wave optical coatings on glass, ITO-coated glass, PET-ITO, and selected barrier films. The product is supplied at 2.5–4.0 wt% solids with a refractive index of 1.24–1.30 at 550 nm and is filtered to 0.1 µm absolute. On soda-lime glass with refractive index 1.52, a cured dry-film thickness of 100–120 nm reduces first-surface Fresnel reflectance from approximately 4.2% to below 1.5% and increases luminous transmittance by 2.5–3.3% per coated side when measured according to ISO 13468-1:2019. Typical use includes front optical windows for electroluminescent instrument clusters, touch-panel cover glass, optical sensor apertures, and cover films for OLED lighting where ionic contamination and outgassing must remain low.
The series includes two model designations: ARC-EL/300, a 2.5 wt% low-solids version for display front sheets and optical sensors, and ARC-EL/H, a 4.0 wt% higher-crosslink version for cover lenses requiring pencil hardness of 3H after thermal cure at 130 °C. Both versions use a mixed alcohol/water solvent system with viscosity 1.5–3.5 mPa·s at 25 °C by cone-plate viscometry.
At normal incidence, a single-layer antireflection coating approaches zero reflectance when its refractive index satisfies n_c ≈ sqrt(n_substrate). For 1.52 soda-lime glass, the optimised coating index is 1.23. The ARC-EL/300 value of 1.24–1.30 therefore leaves a residual reflectance of 0.5–1.5% at 550 nm. The required quarter-wave optical thickness is d = λ/(4n_c) = 550 nm/(4 × 1.26) = 109 nm. A thickness deviation of ±5 nm shifts the reflectance minimum by approximately ±25 nm, placing the 550 nm target outside the design minimum for some display colour temperatures.
This thickness sensitivity is the principal processing constraint. The wet-film thickness required to obtain a 110 nm dry film at 2.5 wt% solids and 1.2 g/cm³ cured density is approximately 5.3 µm. On production slot-die lines, the wet-film thickness must be held within ±0.5 µm to maintain dry thickness within ±10 nm. If the wet film exceeds 12 µm, surface-leveling defects and Bénard cells increase haze above 1.0% per ASTM D1003-13; below 4 µm, the coating may dewet from the edge and produce a transmitted-wavefront distortion greater than λ/4 at 550 nm.
At off-normal incidence, the quarter-wave condition shifts because the effective optical path shortens. At 30° from normal, the reflectance minimum of a 109 nm coating shifts from 550 nm to approximately 475 nm. This imposes a usable viewing cone of ±20° for colour-critical displays unless broad-band multilayer stacks are selected.
| Property | Method | Specified range |
|---|---|---|
| Refractive index at 550 nm | Spectroscopic ellipsometry | 1.24–1.30 |
| Dry-film thickness | Spectroscopic ellipsometry | 100–120 nm |
| Solid content | Gravimetric, 150 °C/1 h | 2.0–4.0 wt% |
| Viscosity at 25 °C | ISO 2884-1:2006 | 1.5–3.5 mPa·s |
| Haze | ASTM D1003-13 | <0.5% |
| Adhesion to glass/ITO | ISO 2409:2013 | Class 0 |
| Pencil hardness | ASTM D3363-05(2011)e2 | 2H–3H |
| Total trace metals | ICP-MS | <5 mg/kg |
| Chloride | Ion chromatography | <2 mg/kg |
| Particle count ≥0.5 µm | ISO 21501-2:2019 optical particle counter | <100 particles/mL |
| Outgassing TML / CVCM | ASTM E595-15 | <0.10% / <0.05% |
Electroluminescent lamps and backlighting units operate with an AC drive field commonly between 50 Hz and 1 kHz. In this configuration, the transparent front electrode is usually ITO or PEDOT:PSS on glass or PET, and the dielectric layer sits directly beneath the phosphor. Ionic contaminants introduced by a coating at the ITO interface are mobile under the alternating field and can form conductive filaments at the interface. The resulting failure mode is field-induced darkening, localised luminance drop, or electrochemical degradation of the ITO edge bus. The electronic/EL grade therefore specifies sodium and potassium below 1 mg/kg each, total trace metals below 5 mg/kg, and chloride below 2 mg/kg to limit migration.
Outgassing is a separate constraint. The coating must be fully cured before lamination with the phosphor-dielectric stack because residual solvent or silanol condensation by-products can alter dielectric strength and produce voids at the ITO-dielectric interface. The accepted test is ASTM E595-15; ARC-EL/300 is specified at total mass loss <0.10% and collected volatile condensable material <0.05% when cured at 130 °C for 20 min. For PET-ITO substrates limited to 90–100 °C, the cure cycle is extended to 45 min, and outgassing is verified by headspace gas chromatography to fall below 2 µg/g total alkoxy-silane residuals.
The product is packaged in 1 L HDPE containers under nitrogen and double-bagged in an ISO 14644-1:2015 Class 5 cleanroom. The point-of-use filter is 0.1 µm polypropylene, not nylon, because nylon membranes may release amine oligomers that accelerate premature condensation and gelation of the sol-gel system.
For pilot-scale or volume deposition, slot-die coating is preferred over spin coating because it can coat 300 mm × 300 mm panels with less than 3% thickness non-uniformity across the web. A production sequence used for 0.7 mm ITO-coated soda-lime glass begins with an alkaline detergent wash and deionised-water rinse, followed by corona or atmospheric-plasma treatment to raise surface energy above 60 mN/m. The coating is applied at 5.3 µm wet-film thickness using a slot die with a lip gap of 30–50 µm and a pump flow rate of 1.5–5.0 mL/min per 100 mm width. The panel is then flashed at 50–60 °C for 3 min and cured at 120–130 °C for 15–20 min.
Calculated wet-film thickness values assume 1.2 g/cm³ cured density and complete retention of the non-volatile content. On a production line, the practical upper humidity limit is 60% relative humidity. Above this level, moisture absorption into the evaporating solvent wave can produce microporosity and a drop in the cured refractive index to 1.22 or lower; this may be useful for some low-index applications but is difficult to control. The lower humidity limit is not critical, but static discharge on PET-ITO must be controlled to avoid pinhole formation.
Unlike vacuum-deposited MgF₂, the wet-process coating does not require line-of-sight vacuum chambering and can be applied to curved cover lenses, round-drawn capacitive-film rolls, and recessed display windows. However, the single-layer wet film has lower intrinsic abrasion resistance than ion-assisted electron-beam MgF₂, and its broad-band antireflection performance is limited. For applications requiring average reflectance below 0.8% across 400–700 nm, a SiO₂/TiO₂ multilayer stack is more appropriate. Compared with commodity solvent-borne optical AR lacquers, the electronic/EL grade reduces total trace metals from typical >20 mg/kg to <5 mg/kg, chloride to <2 mg/kg, and filter rating from 0.5–1.0 µm nominal to 0.1 µm absolute.
| Parameter | Electronic/EL grade | Commodity solvent-borne optical AR lacquer | Vacuum-deposited MgF₂ |
|---|---|---|---|
| Refractive index at 550 nm | 1.24–1.30 | 1.35–1.45 | 1.38 |
| Single-surface reflectance on 1.52 glass | 0.5–1.5% | 1.5–2.5% | <1.5% |
| Cure temperature | 90–130 °C | 80–120 °C | Not applicable |
| Ionic contamination | Total metals <5 mg/kg; chloride <2 mg/kg | Total metals often >20 mg/kg | Process-dependent |
| Outgassing TML/CVCM | <0.10%/<0.05% per ASTM E595-15 | Not routinely specified | Low but chamber-specific |
| Particle filtration | 0.1 µm absolute | 0.5–1.0 µm nominal | No liquid filtration |
| Coating method | Slot-die, spin, spray | Spray, dip | Vacuum chamber |
For PET-ITO web or sheet, the maximum cure temperature is set by the heat-distortion temperature of the polyethylene terephthalate substrate, typically 120 °C, but with dimensional stability concerns above 100 °C for 125 µm film under tension. ARC-EL/300 can be cured at 90–100 °C for 40–60 min. At this temperature, the pencil hardness is reduced to HB–H, and the coating is not recommended for a direct exposed surface unless a subsequent hard coat is applied. Adhesion to PET-ITO requires corona pre-treatment at >50 mN/m surface energy. Without pre-treatment, cross-cut adhesion falls to ISO 2409:2013 class 2–3, and the coating can peel at the die-cut edge.
When the coating is applied over a screen-printed dielectric or phosphor layer, the acid number and solvent strength of the AR layer must be controlled. The product pH is specified at 4.5–5.5, which is compatible with solvent-borne fluoroelastomer dielectrics but can still dissolve uncured vinyl screen-print resins if the paste has less than 24 h of ambient cure. It is incompatible with freshly screen-printed amine-catalysed epoxy dielectric pastes because amine vapours react with the sol-gel matrix and create gel particles in the wet film. For such stacks, a barrier overprint or 48 h minimum post-print ambient cure is required before AR coating.
Adhesion on cleaned glass and ITO is rated class 0 per ISO 2409:2013 and 5B per ASTM D3359-17 after cure. The pencil hardness is 2H for ARC-EL/300 and 3H for ARC-EL/H per ASTM D3363-05(2011)e2 on 0.7 mm soda-lime glass. After 24 h in 85 °C/85% relative humidity, the coating retains adhesion and shows no visible delamination; after 500 h of damp heat, the reflectance minimum shifts by +5 nm to +10 nm, which is within most display acceptance bands.
For abrasion, no specific ASTM D4060 Taber figures are published for this exact film thickness and substrate combination. Published data for this specific configuration is limited; however, related sol-gel AR films of similar thickness typically show a haze increase of 1.0–3.0% after 100 Taber cycles with a CS-10F wheel at 500 g load. The product is not intended for direct finger contact unless covered by a hard coat or cover lens.
Chemical compatibility data are available for isopropanol, ethanol, 70% ethanol/water, and acetone wipes performed according to ISO 9211-3:2008 Category C. The coating withstands 10 double rubs with IPA at 1 kg force, but acetone exposure for more than 2 min causes visible swelling and is outside the specified use envelope.
