| HS Code | 621540 |
| Chemical Name | 1,1,1-Trifluoro-2-(trifluoromethyl)-4-penten-2-ol |
| Cas Number | 646-97-9 |
| Molecular Formula | C6H6F6O |
| Molecular Weight | 208.10 g/mol |
| Exact Mass | 208.0323 g/mol |
| Iupac Name | 1,1,1-trifluoro-2-(trifluoromethyl)pent-4-en-2-ol |
| Synonyms | 2-Allyl-1,1,1,3,3,3-hexafluoropropan-2-ol; 1,1,1,3,3,3-hexafluoro-2-(prop-2-en-1-yl)propan-2-ol |
| Smiles | C=CCC(C(F)(F)F)(C(F)(F)F)O |
| Inchi | InChI=1S/C6H6F6O/c1-2-3-4(13,5(7,8)9)6(10,11)12/h2,13H,1,3H2 |
| Appearance | Colorless liquid |
| Density | 1.418 g/mL at 25 °C |
| Boiling Point | 96-97 °C |
| Flash Point | 8 °C (closed cup) |
| Refractive Index | 1.335 |
| Solubility | Soluble in common organic solvents; sparingly soluble in water |
| Chemical Name | 1,1,1-Trifluoro-2-(trifluoromethyl)-4-penten-2-ol |
| Iupac Name | 1,1,1-Trifluoro-2-(trifluoromethyl)pent-4-en-2-ol |
| Synonyms | 2-Allyl-1,1,1,3,3,3-hexafluoro-2-propanol |
| Cas Number | 2252-44-0 |
| Molecular Formula | C6H6F6O |
| Molecular Weight | 208.10 g/mol |
| Linear Formula | (CF3)2C(OH)CH2CH=CH2 |
| Smiles | C=CCC(O)(C(F)(F)F)C(F)(F)F |
| Inchi | InChI=1S/C6H6F6O/c1-2-3-4(13,5(7,8)9)6(10,11)12/h2,13H,1,3H2 |
| Appearance | Colorless liquid |
| Boiling Point | 82-83 °C at 760 mmHg |
| Flash Point | 21 °C (69 °F) |
| Density | 1.436 g/mL at 25 °C |
| Refractive Index | 1.339 at 20 °C |
| Solubility | Soluble in most organic solvents; slightly soluble in water |
| Purity | 98% |
As an accredited 1,1,1-Trifluoro-2-(Trifluoromethyl)-4-Penten-2-Ol factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.
| Packing | Packaged in a 5 g amber glass bottle with a PTFE-lined screw cap, under nitrogen, for stability. |
| Container Loading (20′ FCL) | Load 20' FCL with sealed drums/IBCs of 1,1,1-Trifluoro-2-(trifluoromethyl)-4-penten-2-ol, properly secured, ventilated, and compliant with dangerous goods regulations. |
| Shipping | Ship as UN1993, Flammable liquid, n.o.s. (1,1,1-trifluoro-2-(trifluoromethyl)-4-penten-2-ol), Class 3, Packing Group II/III according to flash point. Use approved containers, grounded equipment, and keep away from ignition sources. Include proper shipping documentation and emergency response information. Not anticipated to be a marine pollutant. |
| Storage | Store in a tightly sealed, properly labeled container in a cool, dry, well-ventilated area, away from direct sunlight, heat, and open flames. Keep separated from oxidizing agents, acids, and reactive metals. Ensure the storage area is fire-resistant and equipped with appropriate containment, and inspect periodically for leaks or container damage. |
| Shelf Life | Stable for at least one year when stored tightly sealed, cool, dry, away from light and oxidizers. |
In thiol-ene photopolymerization of fluorinated hard-coat formulations, 1,1,1-trifluoro-2-(trifluoromethyl)-4-penten-2-ol functions as a monofunctional allyl monomer that introduces pendant hexafluorinated tertiary alcohol groups after step-growth addition to polythiols. The compound is blended into a stoichiometric thiol package, typically pentaerythritol tetrakis(3-mercaptopropionate), with a thiol:ene molar ratio between 0.90:1.00 and 1.05:1.00, while the fluorinated alcohol is dosed at 5–20 wt% of total reactive solids. Below 5 wt%, water contact angle on cured films remains below 100° and anti-smudge performance is insufficient for display cover glass; above 20 wt%, the monofunctional diluent reduces crosslink density and Taber haze after 500 cycles degrades under ASTM D4060-19. Production-scale UV curing uses conveyorized 365 nm LED arrays with a UVA dose of 2–4 J/cm² under nitrogen blanketing below 50 ppm O₂ to suppress thiol oxidation and surface tack. Coating lines apply the formulation by roll-to-roll microgravure at 3–10 µm wet film thickness onto polyethylene terephthalate, polycarbonate, or display cover glass. Compliance is evaluated according to ASTM D3359-23 cross-cut adhesion, ISO 2409:2020, and ASTM D4060-19 abrasion resistance. Terminal product types include anti-fingerprint hard coatings on automotive interior glass and display cover glass, mar-resistant hydrophobic topcoats on molded polycarbonate lenses, and low-haze protective layers on optical films.
Platinum(0)-siloxane catalysts such as Karstedt’s complex promote anti-Markovnikov addition of trialkoxysilanes to the terminal allyl group, producing 3-(triethoxysilyl)propyl-substituted fluorinated tertiary alcohols. The reaction is conducted in a jacketed glass-lined reactor at 70–90 °C with a platinum loading of 10–20 ppm relative to olefin, using triethoxysilane or trimethoxysilane at a Si-H:alkene molar ratio of 1.05:1.00 to drive residual hydride depletion. Exothermal excursions above 95 °C generate internal double-bond isomers via platinum-catalyzed double-bond migration, detectable by 1H NMR as vinylidene and internal allylic proton signals; these inactive isomers are controlled below 3 area% to maintain downstream silane purity. The resulting fluorinated silane is formulated into anti-fingerprint coating baths at 0.5–2.0 wt% in hydrofluoroether-ethanol mixtures, with pH adjusted to 4.5–5.5 using acetic acid to regulate alkoxysilane condensation kinetics. Dip coating proceeds at withdrawal speeds of 1–3 mm/s, followed by condensation curing at 120–150 °C for 30–60 min in a forced-air oven. Adhesion of the cured fluorosilane layer to glass is verified by ASTM D3359-23 and ISO 2409:2020; contact angle retention after 5,000 cycles of felt abrasion is assessed by ASTM D4060-19. Terminal product types include oleophobic coatings for smartphone cover glass, low-surface-energy treatments for sapphire watch windows, and anti-fouling optical lens coatings.
Esterification of the tertiary hydroxy group with methacryloyl chloride under anhydrous tetrahydrofuran at 0–5 °C converts 1,1,1-trifluoro-2-(trifluoromethyl)-4-penten-2-ol into a fluorinated methacrylate carrying both a methacryloyl polymerizable group and a pendant allyl group. The purified monomer is copolymerized with aliphatic urethane acrylate oligomers and perfluorinated acrylate comonomers in optical fiber cladding formulations, where the fluorinated methacrylate is incorporated at 10–30 wt% of the total UV-curable matrix to depress cured refractive index below 1.40 and to limit moisture absorption under IEC 60793-2-50:2018 damp heat aging. Free-radical polymerization is initiated with 1-hydroxycyclohexyl phenyl ketone at 1–3 phr under nitrogen-purged UV curing at 365 nm and 200–400 mJ/cm²; fiber draw towers employ dual-layer wet-on-dry coating dies at line speeds of 300–1,200 m/min. The final cladding layer thickness is maintained at 2–5 µm by die orifice geometry and line-speed tuning. Relevant optical and mechanical compliance standards include IEC 60793-2-50:2018 for multimode fiber specifications, ISO 1183-1:2019 for cured resin density, and ASTM D445 for uncured resin viscosity control. Terminal product types include primary cladding resins for silica multimode fiber, secondary coatings for bend-insensitive fiber, and low-index matrix resins for fiber optic ribbon assemblies.
In 193 nm immersion photoresist polymers, the ester formed from 1,1,1-trifluoro-2-(trifluoromethyl)-4-penten-2-ol and methacrylic acid is copolymerized with 2-methyl-2-adamantyl methacrylate and 3-hydroxy-1-adamantyl methacrylate. The fluorinated tertiary alcohol-derived methacrylate is charged at 15–35 mol% of the monomer feed to modulate dry-etch resistance and acid-cleavage contrast. Free-radical polymerization is carried out in 2-butanone at 65–70 °C with 2,2′-azobis(2-methylpropionitrile) at 0.5–1.0 mol% of total vinyl equivalents; the polymer is precipitated in hexane, redissolved, and filtered through 0.2 µm PTFE membranes before photoresist formulation. Spin coating on silicon wafers uses 1,500–3,000 rpm to produce 100–200 nm films, followed by pre-bake at 100–110 °C for 60–90 s. ArF immersion exposure at 193 nm is followed by post-exposure bake at 110–120 °C and development in aqueous tetramethylammonium hydroxide at 0.26 N. Photoacid generator-generated acid cleaves the tertiary fluorinated ester linkage, switching exposed domains from hydrophobic to alkali-soluble; unexposed areas retain the bulky fluorinated ester to maintain contrast and etch resistance. Dry-etch resistance is evaluated using inductively coupled CF4/CHF3 plasma at 20:80 gas ratio with etch rate compared to a 193 nm resist reference. Process compliance is assessed under SEMI S2-0723 and SEMI S8-0723 equipment safety and ergonomic guidelines; trace metal specifications are controlled to ≤50 ppb total Na, Fe, and Al by inductively coupled plasma mass spectrometry. Terminal product types include ArF immersion photoresist films for logic and memory photolithography, topcoat-free immersion resists with enhanced receding contact angle, and fluoropolymer underlayer contrast-enhancement materials.
Polydimethylsiloxane-co-methylhydrosiloxane copolymers carrying residual Si-H sites are functionalized with this fluorinated tertiary alcohol through platinum-catalyzed hydrosilylation in toluene at 80–100 °C using Speier’s or Karstedt’s catalyst at 5–15 ppm platinum relative to the siloxane mass. The fluorinated allyl alcohol is added at 2–8 mol% of the available Si-H sites, leaving residual Si-H for subsequent moisture-cure crosslinking or for platinum-catalyzed addition with vinyl-terminated silicones. Hydrosilylation progress is tracked by FT-IR disappearance of the Si-H band at 2160 cm⁻¹ and by 1H NMR vinyl proton loss. The grafted polysiloxane is formulated as a solvent-borne release coating at 2–5 wt% active solids in heptane or hydrofluoroether, applied to paper, film, or metal substrates by five-roll coaters, and cured in a forced-air oven at 120–150 °C for 30–90 s. Release force against a standard acrylic pressure-sensitive adhesive is measured according to ASTM D4525-13; residual adhesion is determined by ASTM D3359-23 or ISO 2409:2020. Water contact angle of cured films exceeds 110° under ASTM D5946-17. The pendant fluorinated tertiary alcohol lowers surface energy sufficiently to permit release performance at 2–8 mol% substitution without the heavy fluorocarbon content required in conventional perfluoropolyether release systems. Terminal product types include differential release liners for pressure-sensitive adhesive labels, low-peel silicone release films for medical electrodes, and fouling-release marine coatings based on platinum-cured silicone elastomers.
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The compound 1,1,1-trifluoro-2-(trifluoromethyl)-4-penten-2-ol (C6H6F6O, 208.10 g mol−1) is a fluorinated tertiary alcohol carrying a terminal allyl group and two α-trifluoromethyl substituents. The hydroxyl-bearing carbon is fully substituted by two CF3 groups and a 2-propenyl chain, which separates the material from primary fluorinated alcohols such as 2,2,2-trifluoroethanol and from the secondary alcohol 1,1,1,3,3,3-hexafluoro-2-propanol. The terminal double bond contributes a theoretical iodine value of 122 g I₂/100 g, while the hydroxyl group is sterically shielded and remains largely unreactive under mild acid-catalyzed esterification conditions. The product is handled as a low-water, low-color liquid in 316L stainless steel or glass-lined equipment; quantitative partition coefficients and closed-cup flash point data for this specific configuration are not well established in the open literature.
Distillation of the technical-grade stream is performed in short-path wiped-film evaporators rather than packed columns. Both CF3 groups increase volatility relative to hydrocarbon alcohols of similar carbon number, but the terminal allyl group is susceptible to radical oligomerization if the bulk temperature exceeds 90 °C for extended periods without a radical inhibitor. Production-scale operations commonly use a falling-film or wiped-film unit with an internal condenser held at 5–10 mbar and a jacket temperature of 80–100 °C; however, published data for this specific configuration is limited, and optimization is managed by GC-FID sampling at the condenser. Overheating in the reboiler produces a non-distillable dimer fraction and a peroxide-positive residue, requiring mechanical cleaning of the evaporator at intervals that depend on stabilizer concentration.
The α,α-bis(trifluoromethyl) tertiary alcohol framework suppresses dehydration to a fluorinated ketene under acidic conditions, a pathway that is more pronounced in secondary α-trifluoromethyl alcohols. The same steric congestion reduces the rate of hydrogen-bond-mediated impurity complexation; water and tetrahydrofuran are removed more slowly, and their carryover into downstream lithium or magnesium organometallic processes is quantified by ASTM E203. A water specification of ≤0.05 wt% is applied when the material is used as a proton donor in ring-opening polymerization or as a reactive diluent in moisture-sensitive urethane systems. Distillation recovery is further limited by the terminal allyl group, which can undergo thermal ene or radical addition at temperatures above 120 °C. A stabilizer such as 4-methoxyphenol at 50–150 ppm is introduced before fractional distillation; the stabilizer content is confirmed by HPLC-UV at 280 nm. In a 10 m² wiped-film evaporator, loss of allyl functionality during distillation is observed when residue time exceeds 20 min, so short-path residence time control is a primary processing boundary.
Application in UV-cure thiol-ene systems exploits the terminal allyl group rather than the hydroxyl. The material is added at 2–10 wt% relative to thiol-functional resin; C=C conversion is monitored by ATR-FTIR through the loss of the 1645 cm⁻¹ absorption. Unlike saturated fluorinated alcohols, this compound becomes covalently bound into the network instead of remaining a migratory diluent. This distinction is critical in low-surface-energy coating formulations where migration to the air interface can alter adhesion after ASTM D3359 crosshatch testing. In fluorinated urethane synthesis, the tertiary hydroxyl remains largely unreacted at 25 °C in the presence of dibutyltin dilaurate at 0.01 mol%, whereas primary fluorinated alcohols reach quantitative conversion under the same conditions. The allyl group can therefore be preserved for subsequent UV or thiol-ene fixation; if a pendant carbamate linkage is required, the alcohol is activated with 1,1′-carbonyldiimidazole in anhydrous methyl tert-butyl ether at 0–5 °C.
Two supply models are available: a technical-grade stream containing 50–150 ppm of 4-methoxyphenol as a shelf-life stabilizer, and a stabilizer-free high-purity grade for free-radical polymerization where controlled initiation is required. The stabilizer-free grade is specified with a peroxide value below 1.0 meq O₂ kg⁻¹ by ISO 3960 and is packaged under nitrogen in HDPE drums. A representative technical-grade specification includes assay by GC-FID ≥97.0 area%, water by ASTM E203 ≤0.05 wt%, color by ASTM D1209 ≤20 APHA, and peroxide value ≤2.0 meq O₂ kg⁻¹. These thresholds are process specifications rather than regulatory limits; they are derived from the sensitivity of downstream siloxane and urethane systems to protic impurities. Addition of stabilizer-containing grade to a UV-cure acrylate formulation at 10 wt% retards surface cure at 365 nm; the inhibition time is measurable by photo-DSC. The high-purity grade eliminates this delay but requires use within 6 months of packaging when stored at 5 °C under nitrogen.
Glass transition modification in fluoropolymers is performed by copolymerizing the allylic double bond with electron-poor methacrylates; the pendant fluorinated tertiary alcohol introduces free volume. In a continuous polymerization line using a twin-screw extruder with an L/D ratio of 40:1, the monomer is fed after the initiator stage to limit premature gelation. Barrel zones are maintained at 120–180 °C; vacuum devolatilization at −0.08 MPa removes unreacted monomer. Tg depression is measured by ASTM D3418. Published data for this specific configuration is limited, and the feed rate is established by FTIR measurement of unconverted allyl groups at 1645 cm⁻¹.
Moisture-sensitive polycondensation compounding uses a gravimetric feed hopper with a nitrogen-purged rotary valve. The hopper is connected to a co-rotating twin-screw extruder with an L/D ratio of 52:1 and a vacuum vent at zone 9. Feed trials with 5 wt% of the fluorinated allylic monomer show that free water above 0.05 wt% increases torque variability; this is monitored by ISO 1133 melt flow stability and by ASTM E203 Karl Fischer sampling at the feed port.
For applications requiring a saturated fluorinated alcohol, 1,1,1,3,3,3-hexafluoro-2-propanol remains preferred as a solvent because its secondary hydroxyl permits faster hydrogen-bond exchange and easier atmospheric distillation. The title compound is selected when a reactive terminal double bond is needed after the solvent function has been removed. In pharmaceutical intermediate synthesis, the allyl group can be converted to an epoxide or halohydrin; the tertiary fluorinated alcohol then remains as a chiral auxiliary or as a protecting-group environment. The tertiary hydroxyl is resistant to oxidation under Swern conditions, which is not the case for primary 2,2,2-trifluoroethanol.
The structural differences produce measurable changes in downstream processing. The table below compares the title compound, HFIP, and 2,2,2-trifluoroethanol; the pKa values for the two reference alcohols are available in the literature, while a reliable open-literature pKa for the title compound is not established.
| Parameter | 1,1,1-Trifluoro-2-(trifluoromethyl)-4-penten-2-ol | 1,1,1,3,3,3-Hexafluoro-2-propanol | 2,2,2-Trifluoroethanol |
|---|---|---|---|
| Alcohol substitution | Tertiary; two α-CF₃ groups and one allyl carbon | Secondary; two α-CF₃ groups | Primary; one α-CF₃ group |
| Terminal C=C functionality | Present; radical addition and thiol-ene | Absent | Absent |
| Esterification rate under acid catalysis | Lower than primary fluorinated alcohols due to steric shielding | Moderate | High |
| Proton acidity | Weaker than HFIP under equal conditions; limited open pKa data | pKa ≈ 9.3 | pKa ≈ 12.5 |
| Main processing limitation | Allyl autoxidation and peroxide accumulation | Volatility and solvent strength | Low boiling point and primary alcohol reactivity |
In pharmaceutical intermediate synthesis, the presence of the allyl group allows covalent tagging via thiol-ene click chemistry; the reaction is followed by ¹H NMR disappearance of vinyl protons at 5.2–5.9 ppm. This covalent tethering is not available with HFIP or 2,2,2-trifluoroethanol. The tertiary hydroxyl can be retained as an auxiliary; however, the low nucleophilicity of the tertiary alkoxide limits the use of the compound in Williamson etherification, and published data for this specific configuration is limited.
In Grignard coupling steps, tetrahydrofuran extraction of the product from aqueous brine can generate a persistent peroxide on the allyl group. Replacement with methyl tert-butyl ether reduces peroxide accumulation but slows phase separation because the product has limited water solubility and a high density. In production-scale separations, a continuous centrifugal extractor with a backpressure setting of 0.5–1.0 bar and a residence time of 2–5 min is used. The allyl group reacts with Grignard reagents only under transition-metal catalysis; without a nickel or palladium catalyst, the substrate remains intact, but the hydroxyl must be protected as a silyl ether before exposure to strong nucleophiles. Deprotonation forms an alkoxide that increases water carryover into the organic phase; this step is controlled by FTIR monitoring of the O–H stretch at 3600 cm⁻¹.
Hydrolytic stability testing under 85 °C/85% RH for 1000 h shows that the allyl group is more sensitive to autoxidation than the CF₃ groups. In coated aluminum panels, the hydroxyl may function as a latent adhesion promoter toward epoxy primers; however, contact with amine-based hardeners in two-component polyurethane mixing lines forms a fluoride-releasing adduct and should be avoided at ambient temperature. Storage is maintained under nitrogen in 316L stainless steel or HDPE containers; unlined carbon steel accelerates peroxide decomposition, and acid number is monitored by ASTM D664. Registration under Regulation (EC) No 1907/2006 is required for the substance imported or manufactured at ≥1 tonne per year. No food-contact clearance is claimed under 21 CFR, and no RoHS restriction applies to the monomer as such.