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Mitsubishi Chemical Advanced Materials UHMW-PE CLEANSTAT

    • Product Name: Mitsubishi Chemical Advanced Materials UHMW-PE CLEANSTAT
    • Factroy Site: Yudu County, Ganzhou, Jiangxi, China
    • Price Inquiry: admin@ascent-chem.com
    • Manufacturer: Ascent Petrochem Holdings Co., Limited
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    Specifications
    HS Code 620134
    Material UHMW-PE
    Color Black
    Density 0.95 g/cm3
    Waterabsorption <0.01 %
    Tensilestrengthatyield 17 MPa
    Elongationatbreak >200 %
    Tensilemodulus 700 MPa
    Charpynotchedimpactstrength 100 kJ/m2
    Shoredhardness 62
    Coefficientoffriction 0.15
    Volumeresistivity 10^6 - 10^9 ohm-cm
    Surfaceresistivity 10^6 - 10^9 ohm
    Thermalconductivity 0.40 W/mK
    Coefficientoflinearthermalexpansion 200 um/m-°C
    Meltingtemperature 135 °C
    Maximumservicetemperature 80 °C
    Flammability UL 94 HB
    Chemicalresistance Resistant to most acids, alkalis, alcohols, and detergents

    As an accredited Mitsubishi Chemical Advanced Materials UHMW-PE CLEANSTAT factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.

    Packing & Storage
    Packing Mitsubishi Chemical Advanced Materials UHMW-PE CLEANSTAT is supplied in 25 kg moisture-barrier bags on pallets, securely shrink-wrapped for transport.
    Container Loading (20′ FCL) Container Loading (20′ FCL): Mitsubishi Chemical Advanced Materials UHMW-PE CLEANSTAT loaded palletized, dry, securely braced, and sealed for ocean transport.
    Shipping Mitsubishi Chemical Advanced Materials UHMW-PE CLEANSTAT is a non-hazardous, static-dissipative UHMW polyethylene supplied as sheets, rods, or profiles. It is not regulated for transport and has no UN number or hazard class. Ship in sealed packaging, keep dry and clean, and handle as general freight.
    Storage Store Mitsubishi Chemical Advanced Materials UHMW-PE CLEANSTAT in a clean, dry, well-ventilated area at ambient temperature, away from direct sunlight, heat, flames, and strong oxidizers. Keep in original sealed packaging, laid flat, protected from dust, oils, and contamination. Avoid prolonged UV exposure, excessive loads, and static charge buildup. Maintain cleanroom-compatible handling where required. Do not store near incompatible chemicals or ignition sources.
    Shelf Life Shelf life is indefinite when stored properly in a cool, dry, clean environment, protected from UV light, moisture, and contaminants.
    Application of Mitsubishi Chemical Advanced Materials UHMW-PE CLEANSTAT

    Mitsubishi Chemical Advanced Materials UHMW-PE CLEANSTAT stock shapes are specified where static dissipation, low-wear contact surfaces, and cleanroom process compatibility intersect in production equipment. Surface resistance of the supplied stock, measured under ASTM D257 at 23 °C and 12 % RH, typically falls between 106 Ω and 109 Ω. The material is not a conductor and must not be used as a primary grounding path. Because ultra-high-molecular-weight polyethylene does not exhibit a measurable melt flow rate under ISO 1133-1, downstream parts are machined from compression-moulded or ram-extruded sheet and rod rather than injection-moulded. The six application sectors below are separated by process environment, regulatory boundary, and failure mode. Machining practice, cleaning method, and compliance documentation differ accordingly; no universal processing condition applies across all segments.

    Why Semiconductor Wafer Guides Require Surface Resistance Below 1 × 109 Ω Instead of Insulative UHMW-PE

    In ion implant end-station wafer handling and lithography interface components, insulative UHMW-PE contact pads sustain field-induced charging when relative humidity drops below 30 % RH. CLEANSTAT UHMW-PE is machined into edge-grip end effector pads and backside vacuum nests because the bulk dissipative phase allows charge to bleed from the wafer contact line to machine ground through the aluminium carrier. The full assembly must satisfy the protected-area requirements of ANSI/ESD S20.20 and IEC 61340-5-1; the polymer contact surface is held between 106 Ω and 109 Ω at 500 V measurement voltage to avoid both residual charging and charged-device-model discharge. Machining is performed on 12 mm and 20 mm sheet using carbide-tipped tools with a positive rake of 8°–12°, spindle speeds of 1,500–3,000 rpm for a 10 mm diameter end mill, and dry air or nitrogen coolant. Water-soluble lubricants are excluded because glycol-based films alter surface resistance and leave ionic contamination on wafer contact faces. Dimensional control is complicated by a coefficient of linear thermal expansion in the range of 1.3–2.0 × 10-4 K-1; a 500 mm guide rail machined at 20 °C and installed at 40 °C expands by approximately 1.3 mm. Slotted mounting holes are therefore specified on semiconductor guide rails. Machined edges are deburred with a sharp high-speed steel scraper, not by flame polishing, because local melting creates an insulative skin that disrupts surface conductivity. Ultrasonic cleaning at 40 kHz for more than 10 minutes can open surface porosity and shift resistance readings; instead, parts are wiped with 70 % isopropanol and deionized water, then dried at 40 °C for 2 hours before packaging. Terminal assemblies include wafer edge guides, vacuum nests, and robot end-effector contact pads used in 200 mm and 300 mm front-end tools. Each lot is supplied with a surface resistivity certificate traceable to ASTM D257 and a conformance record for the specified static-dissipative range.

    Selective soldering pallets for through-hole PCBAs impose two conflicting requirements: the fixture must dissipate static from PCB panel handling while surviving brief contact with molten solder and aggressive no-clean flux chemistry. Natural UHMW-PE has a Vicat softening point near 80 °C, so CLEANSTAT UHMW-PE is machined only into pallet frames, board support ledges, and sacrificial edge strips, not into primary molten-metal contact areas or wave solder nozzles. Machining from 10 mm and 15 mm sheet uses compression-clamping fixtures to suppress chip breakout in bolt slots. Regrind addition to the machining blank is not applicable because the stock shape is supplied as a finished compression-moulded or ram-extruded form; however, post-machining antistatic sprays are avoided because organic antistats migrate into the flux and alter solder wetting on through-hole leads. The pallet surface resistance measured at 500 V under ASTM D257 must remain between 106 Ω and 109 Ω, and the assembled pallet-to-ground path must not exceed 1 × 109 Ω when the workstation is qualified under ANSI/ESD S20.20. Rosin-based no-clean flux residues are wiped immediately with isopropanol to prevent carrier absorption and dimensional drift. Continuous service is limited to 80 °C; immersion in methylene chloride or strong oxidizing acids is not permitted. Terminal products are selective soldering pallets for power-supply PCBAs, board edge guides for ICT fixtures, and ESD-safe assembly workboards. Published data for this specific configuration in solder-exposed edge zones is limited, so thermal mapping of the pallet surface is recommended during the first production run.

    Tablet Deduster Contacts and FDA 21 CFR 177.1520 Regulatory Boundaries

    Pharmaceutical tablet dedusters use UHMW-PE spiral rods and contact strips because polymer wear debris generation is lower than metal-on-metal contact under compressive loads of 20–50 N. CLEANSTAT UHMW-PE is selected when the bulk tablet mass acquires triboelectric charge during pan coating transfer; surface resistance between 106 Ω and 109 Ω per ASTM D257 dissipates charge without creating the spark risk of a conductor. In this sector, the regulatory boundary is not the raw material certificate but the finished contact part. FDA 21 CFR 177.1520 covers olefin polymers for repeated food-contact use, and while many pharmaceutical manufacturers accept this as a starting point for process-contact parts, direct drug-product contact requires an extractables assessment under USP <1663> and ICH Q3D because the carbon-based dissipative filler may contribute extractable residues. Part design avoids blind holes and sharp internal corners to reduce residue trapping; radii below 2 mm are not machined without five-axis ball-end finishing. Cleaning is performed with 70 % isopropanol or 0.5 % hydrogen peroxide solution. Autoclaving above 121 °C is excluded because UHMW-PE undergoes permanent dimensional change, and hexane or strong oxidizing acids are not permitted for cleaning. The deduster contact parts are cleaned in a Class 7 room, double-bagged, and supplied with a particulate certificate consistent with ISO 14644-1. Terminal components include deduster spiral inserts, capsule orienting rails, and low-speed star wheel pockets for tablet packaging.

    Dry powder packaging lines handling infant formula, soluble coffee, and fine chemical powders exhibit static adhesion on guide rails and star wheels that creates weight inconsistency because powder accumulates on feed points and detaches as clumps. CLEANSTAT UHMW-PE is machined into container guides, worm screws, and transfer plates between checkweigher and discharge. The surface resistance requirement is derived from process measurement, not from the material datasheet alone: an electrostatic voltmeter reading on the production line above ±100 V at 25 °C and 30 % RH indicates that the grounding circuit or the surface resistance path is out of specification. A single-point ground is attached to a stainless-steel insert threaded into the polymer; relying on a braided wire clamped to the surface alone is rejected because UHMW-PE cold-flow reduces contact pressure over time. Fastening torque on the threaded insert is set to 2–3 N·m to prevent creep-induced loosening. Machining is followed by 24-hour stress relief at 60 °C in a forced-air oven before final geometry reaming. Surface roughness on feed faces is controlled to Ra 0.4–0.8 µm to reduce powder adhesion and maintain a coefficient of friction below 0.10 against stainless steel; the actual value depends on speed and load. EU 10/2011 and FDA 21 CFR 177.1520 are referenced when the part is placed within 300 mm of open product; however, CLEANSTAT UHMW-PE is not automatically a direct food-contact material in all jurisdictions, so site-specific migration testing is required for continuous contact with fatty foods. Where flammable dust atmospheres are present, the material cannot be treated as a substitute for a full risk assessment under IEC 60079-32-2. Terminal products are discharge chute liners, container feed screws, and transfer star wheels running at 60–120 containers per minute.

    The compliance matrix below consolidates the primary standards, measured parameters, acceptance boundaries, and terminal parts for the application sectors. It is intended as an engineering reference, not as a substitute for lot-specific certification.

    Application sectorGoverning standard or clauseMeasured parameterAcceptance boundaryTerminal part
    Semiconductor wafer handlingANSI/ESD S20.20, IEC 61340-5-1, ASTM D257Surface resistance at 500 V, 12 % RH106–109 ΩWafer edge guide, vacuum nest
    Selective soldering palletsANSI/ESD S20.20, ASTM D257Surface resistance at 100 V and 500 V106–109 Ω; no shift greater than one order of magnitudePallet frame, board support ledge
    Pharmaceutical tablet contactFDA 21 CFR 177.1520, USP <1663>, ISO 14644-1Extractables, airborne particle countSite-specific; cleanroom class must be maintainedDeduster insert, capsule orienting rail
    Dry powder packagingEU 10/2011, FDA 21 CFR 177.1520, IEC 60079-32-2Surface resistance, electrostatic voltmeter reading106–109 Ω; process surface below ±100 VContainer worm screw, transfer star wheel
    Cleanroom automationISO 14644-1:2015, ASTM D257Airborne particle count, surface resistanceClass 5 count limit; 106–109 ΩLinear guide wear strip, pick-and-place head
    Clinical automationISO 10993-5, ASTM D257Cytotoxicity where indicated, surface resistance after 500 cyclesSurface resistance below 1 × 109 ΩMicroplate nest, tube rack base

    When Cleanroom Automation Wear Strips Must Meet ISO 14644-1 Class 5 Particle Emission Limits

    Cleanroom linear-motion carriages operating in Class 5 semiconductor packaging rooms replace metal-on-polymer guide ways with CLEANSTAT UHMW-PE wear strips to reduce slip-stick and metallic particulate. Under ISO 14644-1:2015, Class 5 permits no more than 3,520 particles/m3 at particle sizes ≥0.5 µm, but moving-contact parts are evaluated separately by airborne particle counting near the wear interface. The wear strip geometry is machined to a thickness tolerance of ±0.05 mm over a 600 mm length from 6 mm sheet, with edges chamfered at 30° to prevent corner chipping. Because UHMW-PE exhibits creep under continuous load, preload on the linear rail is limited to 0.2–0.5 % strain, and flatness is re-verified after 24 h at 40 °C. The dissipative filler contributes to particle loading if the surface is abraded; therefore, running-in is performed for 120 cycles at 20 mm/s, followed by vacuum wiping with a HEPA-filtered air knife. Surface resistance is tested at 100 V and 500 V under ASTM D257; a reading shift of more than one order of magnitude between the two voltages indicates surface contamination or conductive filler agglomeration and the part is rejected. Published data for CLEANSTAT UHMW-PE in fluorinated cleanroom chemistries is limited, so wettability and particle release must be site-tested before use in immersion tooling. Terminal products are linear guide wear strips, cam followers, and vacuum pick-and-place heads in semiconductor packaging cells. Service temperature must remain below 80 °C; localized frictional heating above that threshold produces dimensional variation and may increase wear rate.

    Clinical laboratory automation and medical device assembly fixtures use CLEANSTAT UHMW-PE when pipette tip racks, microplate nests, and test tube carriers are repeatedly contacted by robotic grippers. The requirement is not limited to static dissipation; the fixture must also withstand 0.5 % sodium hypochlorite disinfection and 5-minute exposure to 70 % isopropanol. Autoclaving at 121 °C is outside the service envelope because UHMW-PE undergoes irreversible creep and dimensional drift; chemical disinfection is therefore mandatory. The material is machined into 96-well nest plates and gripper fingers with through-hole positions held to ±0.10 mm from dowel references. After machining, parts are immersed in deionized water at 40 °C for 20 minutes to remove loose carbon filler from the surface, rinsed, and inspected under 10× magnification for particle inclusions. The antistatic performance is measured before and after 500 cycles of automated handling to detect wear-induced changes; if surface resistance drifts above 1 × 109 Ω on wear tracks, the nest is replaced because static interference can fault barcode readers and plate sensors. ISO 10993-5 is referenced only for cytotoxicity when the part is used within a medical device manufacturing fixture that may contact patient-contacting components; the raw material certificate alone does not establish device-level biocompatibility. Terminal products are microplate nests, tube rack bases, and gripper contact pads for automated specimen sorting systems. Operating conditions are limited to 5 °C–40 °C for precision fixtures and 30–70 % RH to avoid dimensional movement beyond ±0.25 mm over a 300 mm span.

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    Certification & Compliance
    More Introduction

    Mitsubishi Chemical Advanced Materials supplies its static-dissipative ultra-high-molecular-weight polyethylene grade under the TIVAR® CleanStat designation, commonly specified as UHMW-PE CLEANSTAT. The product is a black, bulk-modified polyolefin supplied as sheet and rod stock for machining of wafer handling components, chip trays, cassette nests, guide rails, and other cleanroom fixtures where uncontrolled electrostatic discharge can damage sensitive devices or attract airborne particulate. The base polymer is UHMW-PE with an average molecular mass above 1×10^6 g/mol or a viscosity number above 2,000 mL/g when characterized to ISO 1628-3. The dissipative response is incorporated into the polymer matrix rather than applied as a post-machining coating, so machined surfaces retain electrical function after cutting and edge finishing. Qualification lots require lot-specific surface resistivity and static decay data because measured values shift with humidity, electrode geometry, surface contamination, and machining condition. The material is used in semiconductor front-end and back-end tooling, hard disk drive manufacturing, flat panel display handling, and pharmaceutical cleanroom machinery. Its primary function is to bleed static charge through a defined ground path while maintaining a surface resistivity that is high enough to avoid the rapid discharge events associated with conductive materials and low enough to prevent charge accumulation on insulative polymers.

    When Static Decay Time Governs Semiconductor Handling Fixture Design

    In dry etch, ion implantation, wafer sorting, and tape-and-reel transport, fixture materials are evaluated by charge decay from a specified starting voltage. For UHMW-PE CLEANSTAT, surface resistivity is commonly reported between 1×10^6 Ω/sq and 1×10^9 Ω/sq when tested to IEC 61340-2-3 or ASTM D257 with a concentric ring electrode at 100 V, after conditioning at 23±2 °C and 50±5 % RH. Resistivity values near the upper end of this range can still provide acceptable decay when the component is connected to a verified hard ground, but grounding path resistance must be measured separately because surface oxidation, machine oil, or polymer wear debris can raise contact resistance above the intended design limit.

    Static decay is typically evaluated from 5,000 V to 50 V under 12 % RH using MIL-PRF-81705D Method 4046. Reported decay times for static-dissipative UHMW-PE are generally below 0.1 s, although lower humidity, thicker machined sections, and insufficient electrode contact can extend decay time. The dissipative range is intentional. Conductive grades below 1×10^5 Ω/sq can produce a rapid discharge that may damage magnetoresistive heads, gate oxides, or charged device model sensitive circuits. Insulative grades above 1×10^12 Ω/sq do not provide controlled charge relaxation. UHMW-PE CLEANSTAT is not a conductor and must not be used as a ground conductor; it functions as a resistance-controlled charge-relaxation layer. In assembled condition, the resistance from the CleanStat component to equipment ground should be maintained below 1×10^7 Ω. Where surface films from handling or cutting fluids are present, cleaning with cleanroom-compatible detergent or isopropanol is required before electrical verification.

    Mechanical, Tribological, and Thermal Specifications for UHMW-PE CLEANSTAT

    The mechanical envelope of UHMW-PE CLEANSTAT remains close to unfilled UHMW-PE because the dissipative additive is used at a loading that is not intended to provide fiber reinforcement. Table 1 lists typical values reported in manufacturer technical bulletins. These values are not specification limits and should not be used for design without lot-specific validation.

    Table 1: Typical physical and electrical values reported for UHMW-PE CLEANSTAT
    PropertyTest methodReported typical value
    DensityISO 1183-1 / ASTM D7920.94–0.95 g/cm³
    Tensile yield stressISO 527-217–21 MPa
    Elongation at breakISO 527-2>250 %
    Flexural modulusISO 178600–800 MPa
    Notched Izod impactISO 180/ANo break
    Water absorption, 24 hASTM D570<0.01 %
    Surface resistivityIEC 61340-2-3 / ASTM D2571×10^6 to 1×10^9 Ω/sq
    Static decay from 5000 V to 50 VMIL-PRF-81705D Method 4046<0.1 s

    Because UHMW-PE is viscoelastic rather than linearly elastic, creep is the dominant mechanical design limit. At continuous compressive stress above approximately 10 MPa, progressive deformation can occur over hours to weeks depending on temperature, part aspect ratio, and machined stress history. Published long-term creep data for this specific dissipative grade is limited; designers should conduct short-term creep tests on machined prototypes at the target compressive stress rather than extrapolating from unfilled UHMW-PE datasheet curves without verification. Thermal limits should also be derived from the application, but continuous use above 80 °C is not typical for dimensionally stable components because heat deflection and creep accelerate. At low temperature, UHMW-PE retains impact toughness well below -150 °C, although machined corners, sharp keyways, and tapped holes can act as stress concentrators.

    Supplied shapes are normally machined on CNC mills, lathes, or routers. Carbide or polycrystalline diamond tooling with positive rake is preferred. Because the coefficient of linear thermal expansion is high, approximately 150×10^-6 K^-1 to 200×10^-6 K^-1, tight-tolerance features should be machined in a temperature-stable environment and checked after thermal stabilization. Pre-drying is not required under ambient relative humidity up to 60 % due to water absorption below 0.01 %, but cutting fluids and polishing compounds must be removed before cleanroom use.

    What Distinguishes CleanStat from Unfilled TIVAR UHMW-PE and Conductive-Loaded UHMW-PE?

    The selection difference is electrical rather than purely mechanical. Unfilled TIVAR UHMW-PE is an insulative polymer with surface resistivity above 1×10^12 Ω/sq, making it unsuitable for charged device model control unless combined with an external ionizer or a separate grounding layer. Carbon-loaded conductive UHMW-PE is often below 1×10^5 Ω/sq and can discharge too quickly for sensitive devices; it may also exhibit higher particle generation due to carbon-rich wear debris. UHMW-PE CLEANSTAT occupies the static-dissipative range and is bulk-modified, so machining does not remove a conductive coating or create an insulative machined surface.

    Table 2: Comparative electrical and operational profile
    ParameterUHMW-PE CLEANSTATUnfilled TIVAR UHMW-PEConductive-loaded UHMW-PE
    Surface resistivity1×10^6 to 1×10^9 Ω/sq>1×10^12 Ω/sq<1×10^5 Ω/sq
    Static decay<0.1 sNo controlled decay<0.01 s typical
    Mechanical strengthApproaches unfilled UHMW-PEBase UHMW-PEReduced by filler loading
    Cleanroom particle tendencyRequires lot qualificationCommonly specified for low particulate workHigher due to carbon debris
    Machining behaviorSimilar to UHMW-PEStandard UHMW-PE machiningHigher tool wear

    The difference also affects process design. Conductive-loaded UHMW-PE is sometimes used for grounding straps or high-speed charge dissipation, whereas UHMW-PE CLEANSTAT is selected for direct contact with components that must not be exposed to rapid electrostatic discharge. In wet process baths, standard UHMW-PE is acceptable for chemical resistance but cannot prevent charge accumulation on the wafer or carrier; UHMW-PE CLEANSTAT is selected when the fixture itself must provide a controlled resistance-to-ground path. Compared with PEEK and PTFE, UHMW-PE CLEANSTAT is used where impact toughness, low moisture absorption, and controlled dissipative behavior are the controlling variables; PTFE exhibits lower friction but higher creep, while PEEK provides higher temperature capability but at higher cost.

    Minimizing Particulate Generation in Downstream CNC Machining of CleanStat

    Machining operations for UHMW-PE CLEANSTAT should follow cleanroom fixture manufacturing practice. Sharp tooling, continuous chip extraction, and immediate washing in ultrapure water or cleanroom-compatible detergent are required to prevent loose polymer chips from remaining in tapped holes, undercuts, or vacuum channels. Abrasive polishing compounds should be avoided because they can embed in the polymer surface and release particles later. For sub-fab qualification, particle shedding is often evaluated by liquid particle counting or shaker testing; published data for this specific grade is limited, so a lot-specific protocol is necessary for critical direct-wafer-contact applications.

    Regulatory documentation should be obtained for the production lot rather than assumed from generic product literature. Manufacturer documentation may state compliance with EU 2011/65/EU RoHS and REACH SVHC as amended. For food contact or medical use, additional compliance under FDA 21 CFR 177.1520 or ISO 10993 must be confirmed for the final machined component. UHMW-PE CLEANSTAT is not automatically certifiable for every cleanroom application, and the end user is responsible for validating that additives and surface cleanliness meet process-specific requirements. Avoid prolonged exposure to strong oxidizing acids at elevated temperatures and to aromatic solvents, because these media can swell or degrade UHMW-PE. The material is not intended as a load-bearing electrical conductor, and it should not be used for EMI shielding or for dissipation of high-frequency alternating fields.

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