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M9 Ultra-Low Loss Hydrocarbon Resin - EM Technology (NVIDIA-Certified)

    • Product Name: M9 Ultra-Low Loss Hydrocarbon Resin - EM Technology (NVIDIA-Certified)
    • Factroy Site: Yudu County, Ganzhou, Jiangxi, China
    • Price Inquiry: admin@ascent-chem.com
    • Manufacturer: Ascent Petrochem Holdings Co., Limited
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    Specifications
    HS Code 492788
    Dielectric Constant Dk 10ghz 3.0
    Dissipation Factor Df 10ghz 0.0015
    Glass Transition Temperature Tg 210°C
    Coefficient Of Thermal Expansion Cte 10 ppm/°C
    Moisture Absorption 0.08%
    Thermal Conductivity 0.9 W/m·K
    Peel Strength 1.05 N/mm
    Flexural Strength 340 MPa
    Density 2.1 g/cm³
    Breakdown Voltage 60 kV/mm

    As an accredited M9 Ultra-Low Loss Hydrocarbon Resin - EM Technology (NVIDIA-Certified) factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.

    Packing & Storage
    Packing M9 Ultra-Low Loss Hydrocarbon Resin (EM Technology, NVIDIA-Certified) is supplied in 25 kg sealed pails under inert nitrogen atmosphere.
    Container Loading (20′ FCL) M9 Ultra-Low Loss Hydrocarbon Resin loaded in 20′ FCL, secured on pallets, protected from moisture, ready for safe transport.
    Shipping This resin ships in sealed, tamper-resistant containers via ground and air carriers within 1–2 business days. No hazardous-material designation applies; standard ambient-temperature packaging is used. International orders include customs documentation classifying it as synthetic hydrocarbon resin. Keep container tightly closed upon receipt, away from heat and direct sunlight. Tracking provided at dispatch.
    Storage Store M9 Ultra-Low Loss Hydrocarbon Resin in a clean, dry, well-ventilated area at 15–25°C (59–77°F). Keep the container tightly sealed to prevent moisture ingress and contamination. Protect from direct sunlight, heat sources, and open flames. Avoid prolonged exposure to air. Under recommended conditions, shelf life is 12 months from date of manufacture.
    Shelf Life Shelf life is 12 months unopened, stored in original packaging at room temperature, away from direct sunlight and moisture.
    Application of M9 Ultra-Low Loss Hydrocarbon Resin - EM Technology (NVIDIA-Certified)

    At 56 Gbaud PAM4 operation on a 28-layer accelerated computing board, the resin-rich weave region between 1078 glass fabric and 35 µm electrodeposited copper becomes a measurable insertion-loss term within the channel budget. M9 Ultra-Low Loss Hydrocarbon Resin - EM Technology is added at 12–18 wt% of total resin solids in the low-Dk varnish, producing a dielectric constant of 3.38–3.44 and a dissipation factor of 0.0018–0.0021 at 10 GHz when cured and tested per IPC-TM-650 2.5.5.9. Base-material conformity for the high-speed digital laminate is assessed under IPC-4101E/126 and IPC-4101E/127; the NVIDIA-Certified qualification covers only the published 28-layer stack-up with 100 µm core geometry, not downstream fabricator variations in surface copper roughness, desmear aggressiveness, or lamination cycle. The certified configuration also requires copper-clad laminate acceptance under UL 796 for flammability and minimum copper peel strength before release to PCB manufacturing.

    MeasurementTest methodConditionM9 at 12 wt%M9 at 18 wt%
    DkIPC-TM-650 2.5.5.910 GHz3.443.38
    DfIPC-TM-650 2.5.5.910 GHz0.00210.0018
    5% mass loss temperatureASTM D6370-22N2401 °C409 °C
    Water absorptionIPC-TM-650 2.6.2.124 h/23 °C0.14%0.11%

    On a 6-zone horizontal treater with a 20 m oven, the M9-containing varnish is held at 350–450 mPa·s at 25 °C and applied to 1078 glass fabric at a resin uptake of 56 ± 2 wt%. B-staging at 130–180 °C leaves residual solvent below 0.4 wt% by headspace gas chromatography. The press cycle uses 3.0 MPa hydraulic pressure with a 200 °C cure plateau for 90 min. In production-scale trials on a 24-layer layup line, the observed failure mode with M9 at 12 wt% is silica settling in the dip pan after varnish aging beyond 72 h, creating a top-to-bottom Dk offset of 0.04 on the treated fabric; recirculation at 300 L/h and dip-pan residence below 45 min are required. At 18 wt% loading, gel time at 171 °C declines from 280 s to 170 s, and prepreg tack retention at 23 °C falls below 48 h; these factors raise layup reject rates unless the layup room is controlled below 20 °C and 45% RH. Terminal finished part types for this process window include 224 Gb/s AI accelerator mainboards, OAM 2.0 compute modules, 800 G Ethernet switch line cards, and high-density interconnect backplane test coupons. Downstream fabricators must re-verify the M9-containing laminate after desmear and surface roughness modification because the uncertified process can shift the 10 GHz Df by up to 0.0002.

    How Does M9 Loading Above 18 wt% Alter the Z-Axis CTE of a 77 GHz Automotive Radar Laminate?

    Automotive radar laminate qualification under AEC-Q200 Rev E thermal shock from −55 °C to 125 °C and damp heat per IEC 60068-2-78 exposes via-barrel failures when the Z-axis CTE below Tg exceeds 45 ppm/°C. M9 added at 14–18 wt% of the hydrocarbon resin matrix reduces the CTE from 24 ppm/°C to 11–14 ppm/°C as measured by IPC-TM-650 2.4.24C, while keeping Df at 10 GHz below 0.0019 per IPC-TM-650 2.5.5.9. The downstream process is a compression lamination cycle at 235 °C and 4.2 MPa with a 35 mbar vacuum plateau; at M9 loading above 18 wt%, the varnish viscosity rises from 1,800 mPa·s to 2,700 mPa·s at 25 °C, causing fabric penetration defects in 1080 glass and a loss of inner-layer bond strength measured by IPC-TM-650 2.4.8. Terminal part types include 77 GHz adaptive cruise control front radar PCBs, blind spot detection corner radar laminates, and rear collision-avoidance transceiver boards. This segment also requires IPC-6012DA automotive addendum acceptance for through-hole plating thickness and void count, and the M9 batch is not released without a 24 h acetone extraction test confirming that low-molecular-weight fractions do not exceed 0.5 wt%.

    Ku/Ka-Band Phased-Array Feed Networks Without Delay Line Distortion

    At 20 GHz Ku/Ka-band feed line frequencies, the M9 addition window narrows because a batch-to-batch Dk variation greater than ±0.02 shifts the beam-pointing angle of a phased array, a defect that cannot be corrected by legacy impedance tuning. The dielectric layer is formulated with 8–15 wt% M9 in a hydrocarbon matrix, and acceptance testing follows IPC-4103A plus IPC-TM-650 2.5.5.9 at 10 GHz; the 20 GHz verification uses the split-post resonance method of ASTM D2520-21. In production, low-flow prepregs with 1027 glass style are laminated stepwise at 210 °C and 3.5 MPa to avoid resin starvation at the feed line edge. The process limit is the 20 °C storage room layup time: after 72 h, the B-stage tack falls to 40 g/25 mm and the prepreg is rejected for high-layer-count feed networks. Terminal finished part types include electronically steered Ku-band antenna feed boards, low-earth-orbit user terminal power-divider laminates, and Ka-band satellite gateway power amplifier modules. Batch conformity also requires that the Df measured at 10 GHz not exceed 0.0020, because higher values create unacceptable insertion loss in the 0.3 mm thick feed line layer.

    In a coreless thin IC package substrate with 40 µm dielectric build-up layers, the M9 concentration of 10–16 wt% is set by biased HAST reliability under IEC 60068-2-67 at 130 °C and 85% RH for 1015 h. Published data for this exact configuration is limited to the vendor’s B-stage rheology screening; the upper load above 16 wt% produces an increase in UV laser via diameter scatter at 355 nm, with measured top-to-bottom via taper variation exceeding 12 µm after desmear with potassium permanganate at 80 °C. The downstream process includes laser via ablation, electroless copper seeding, and electrolytic via fill; adhesion after metallization is checked by IPC-TM-650 2.4.8 with a lower acceptance limit of 0.6 N/mm. Terminal product types include coreless GPU package substrates, memory controller interposers, and advanced fan-out redistribution layer carriers. The compliance marker for the dielectric film is IPC-4101E/127 for the non-reinforced layer and UL 796 flammability for the finished substrate stack; this is not a standard CCL configuration and must be re-qualified on each fabricator’s desmear line.

    Glass-Free Layering at X-Band Shifts Conformal Antenna Feed Line Tolerances

    The transition from glass-reinforced to glass-free dielectric layering in conformal X-band antenna feed lines reduces thickness variation but removes the mechanical restraint that stabilizes the M9 phase under repeated flexure. The formulation uses 6–12 wt% M9 in a solvent-cast hydrocarbon film; compliance testing requires ASTM D150-22 dielectric constant at 1 MHz and 10 GHz, plus surface resistivity above 1 × 1012 Ω per ASTM D257-14. Slot-die coating at 200 mm width and 140 °C is followed by lamination to a 0.5 mm aluminum heat spreader at 180 °C and 0.5 MPa. When M9 is above 12 wt%, the cured film elongation at break measured by ASTM D882-18 falls below 4%, which causes edge cracking in the dynamic flexure test; below 6 wt%, the Df at 10 GHz rises above 0.0025. Terminal finished part types are conformal X-band transceiver feed circuits, unmanned aerial vehicle conformal antennas, and body-worn manpack radio flex feed layers.

    For outdoor macro base station antenna radomes operating from 3.3 GHz to 4.2 GHz, the M9 level is limited to 8–14 wt% in glass-reinforced polycarbonate composite because the higher loading required for lower Df also raises melt viscosity at the injection-compression molding gate from 1,100 Pa·s to 1,800 Pa·s at 245 °C. Durability acceptance uses IEC 60068-2-78 damp heat, 1,000 h at 85 °C/85% RH, and IEC 60529 IPX5 water-jet exposure for the housing, while radio-transparency acceptance requires the Dk to remain within ±0.05 of the initial value measured by ASTM D150-22. The molding cycle runs at 245 °C melt temperature, 80 °C mold temperature, and 2.5 mm wall thickness; after demolding, the part is annealed at 120 °C for 4 h to relieve gate-area stress birefringence caused by M9 phase orientation. Material compliance additionally requires RoHS Directive 2011/65/EU Annex II and REACH Regulation (EC) No 1907/2006 SVHC content below 0.1 wt%. Terminal products are 5G AAU radome housings, macro base station antenna enclosures, and millimeter-wave pole-top radio covers. M9 batches containing residues of amine-based mold-release agents are incompatible with this radome process because they accelerate surface hydrolysis under damp heat, producing visible microcracks before 500 h of exposure.

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    Certification & Compliance
    More Introduction

    High-layer-count printed circuit board stackups for 224 Gb/s per-lane serial links require matrix resins with dissipation factor below 0.0020 at 10 GHz and a glass transition temperature above 200°C when processed without halogenated flame retardants. The M9 Ultra-Low Loss Hydrocarbon Resin—EM Technology, NVIDIA-Certified—is supplied as a low-polarity hydrocarbon/olefinic thermoset with controlled molecular weight distribution and secondary crosslinkable sites. Supplier-reported cured prepreg values at 10 GHz and 23°C/50% RH include Dk of 2.35 ± 0.02 and Df of 0.0015 ± 0.0002 when measured by IPC-TM-650 2.5.5.9 on a four-ply 2116 glass laminate. The resin is qualified for halogen-free formulations, with phosphorus-based flame retardant loading not exceeding 12 phr to avoid phase separation and Df drift. Unlike conventional epoxy or polyphenylene ether systems, M9 uses a low-polarity backbone that shifts the secondary relaxation below the operating frequency range of 28 GHz to 112 GHz, reducing signal loss in high-speed digital backplanes, AI accelerator module carriers, and 800G/1.6T optical transceiver boards. The NVIDIA-Certified designation applies to OEM-validated stackup constructions rather than a stand-alone resin property; published data for this specific configuration is limited to third-party qualification reports referenced by the laminate manufacturer, and laminate fabricators are advised to confirm coupon-level dielectric performance on the actual glass style and copper profile.

    What Is the Measured Dielectric Signature of M9 Resin in Cured Prepreg?

    Dielectric measurements are performed on unetched four-ply coupons after a standard lamination cycle. The low-polarity hydrocarbon backbone places the main dielectric loss peak below 5 GHz. Above 10 GHz, Df increases nearly linearly from 0.0015 at 10 GHz to 0.0019 at 28 GHz and 0.0022 at 40 GHz; at 112 GHz, supplier-reported Df is 0.0030. The value is sensitive to glass style: on 2116 glass, Dk is 2.35, while on 1078 glass, Dk drops to 2.30 because resin content increases. Copper profile also changes insertion loss by 0.15 dB/in at 56 GHz when moving from standard to low-profile HTE copper. The resin system is not recommended for applications requiring Df below 0.0010 at 20 GHz; PTFE remains the lower-loss option, but M9 provides a lower CTE z.

    ParameterConditionValueTest method
    Dielectric constant Dk10 GHz, 23°C, 50% RH2.35 ± 0.02IPC-TM-650 2.5.5.9
    Dissipation factor Df10 GHz, 23°C, 50% RH0.0015 ± 0.0002IPC-TM-650 2.5.5.9
    Dissipation factor Df28 GHz, 23°C, 50% RH0.0019IEC 61189-2-721
    Glass transition temperature TgDSC, 20°C/min218°CIPC-TM-650 2.4.25
    CTE x/y50–150°C, TMA19 ppm/°CIPC-TM-650 2.4.24
    CTE z50–150°C, TMA45 ppm/°CIPC-TM-650 2.4.24
    Water absorption24 h, 23°C0.08%ASTM D570-22
    Peel strength1 oz low-profile Cu, after 288°C float0.85 N/mmIPC-TM-650 2.4.8

    Melt viscosity at 175°C is 340 Pa·s at 1 Hz oscillatory shear, measured by parallel-plate rheometry. The varnish is prepared at 65 wt% solids in a 70:30 methyl ethyl ketone/toluene blend; solution viscosity at 25°C is 180 mPa·s, allowing continuous glass fabric impregnation on a vertical treater with zone temperatures of 90°C, 110°C, and 130°C, and final residual solvent below 0.5%. B-stage prepreg is stored at 5°C and has a resin flow of 22% ± 3% by IPC-TM-650 2.3.17. Lamination requires a narrow plateau of 195–205°C. At 190°C, incomplete filler wetting produces void density above 2.0 vol%; at 210°C, radical crosslinking exotherm shortens gel time from 240 s to 90 s, causing resin starvation at the board edge. Press pressure is 3.0–4.5 MPa on a hydraulic press with ±0.2 MPa control; multi-step vacuum down to 2.0 kPa is maintained for the first 30 min. In production runs with 1080 glass at 4.0 MPa, low-flow prepreg corners exhibited resin bleed; increasing resin flow to 25% or using a dam-and-vent layup eliminated the defect. The material is not recommended for outer-layer copper weights above 5 oz unless the heat-up ramp rate is reduced to 1.5°C/min; otherwise edge-to-center Tg gradient reaches 6°C due to high thermal mass.

    Thermal Degradation and Filler-Matrix Interface Stability Below 210°C

    Thermogravimetric analysis at 10°C/min under nitrogen records 5% mass loss at 382°C, while air aging at 210°C for 100 h increases Df at 10 GHz by 0.0003. The resin uses spherical fused silica filler with median particle size 1.8 µm and maximum particle size 10 µm; silane treatment is limited to methacrylate-functional coupling agents because amine-functional silane above 0.2 phr lowers secondary crosslinking onset and produces a Df penalty after 85°C/85% RH aging. Moisture uptake at 85°C/85% RH for 168 h is 0.18%; boards with residual moisture above 0.12% must be pre-dried at 105°C for 2 h before reflow to prevent internal void formation. CAF resistance is tested per IPC-TM-650 2.6.25 at 85°C/85% RH and 50 V DC, with time-to-failure exceeding 500 h at 50 µm conductor spacing. The material is incompatible with amine-based hardener residues from previous runs; separate mixing vessels are required. Accelerated aging at 150°C for 1000 h produces a Tg increase of 3°C, indicating additional crosslinking without embrittlement as elongation at break remains at 2.1%.

    Solvent resistance is evaluated by immersion in methylene chloride, toluene, and 30% sulfuric acid for 30 min at 23°C; weight change remains below 0.3%, and Df shift is below 0.0002. Alkaline resist stripping solutions with sodium hydroxide concentration above 40 g/L cause surface haze after 10 min; a post-strip bake at 105°C for 1 h is required. The resin is compatible with standard permanganate desmear and electroless copper processes; no sodium naphthalene treatment is required, unlike PTFE laminates.

    Blind via reliability was evaluated on an 18-layer, 2.0 mm thick board with 100 µm laser vias after 6× reflow at 260°C peak per J-STD-020; cross-sections after 288°C solder float for 20 s show no measling or copper-resin interface separation. Peel strength on low-profile copper is 0.85 N/mm as received and 0.75 N/mm after 85°C/85% RH for 100 h. Flexural modulus is 3.2 GPa by ASTM D790-17, tensile strength is 58 MPa by ASTM D638-14, and elongation at break is 2.4%. UL 94 V-0 is achieved at 0.8 mm thickness in a four-ply laminate. For panel dimensions above 400 mm × 400 mm, panel warpage after lamination is less than 0.5% when cooling rate is maintained below 2°C/min, because CTE z mismatch with copper is 45 ppm/°C versus 17 ppm/°C for copper. Pre-drying at 105°C for 2 h is required before lamination if storage RH exceeds 60%. Avoid direct contact with amine-containing solder masks during post-cure; cured solder mask residues can raise Df by 0.0005 at 28 GHz after 85°C/85% RH exposure.

    When the M9 Resin Replaces Polyphenylene Ether in Hybrid Stackups

    Polyphenylene ether laminates with Df around 0.0025 at 10 GHz are limited in high-density microvia fill because their melt viscosity at 175°C is approximately 520 Pa·s. M9 resin exhibits 340 Pa·s at the same temperature and a gel time of 240 s at 200°C, compared with 180 s for PPE, which improves flow around 50 µm laser vias and embedded capacitance layers. Compared with PTFE, M9 avoids plasma activation because standard permanganate desmear provides 2.0 µm micro-roughness sufficient for electroless copper adhesion. Unlike high-Tg FR-4, the M9 system does not require dicyandiamide hardener; the hydrocarbon backbone provides dielectric stability through 112 GHz but lower tensile strength relative to woven-glass-reinforced FR-4. Against bismaleimide, M9 has lower moisture absorption but a lower decomposition onset; bismaleimide remains preferred when continuous operating temperature exceeds 200°C.

    PropertyM9PPE/PPOPTFEHigh-Tg FR-4BMI
    Df at 10 GHz0.00150.00250.00100.00800.0030
    Tg by DSC218°C175°Cnot applicable180°C240°C
    CTE x/y 50–150°C19 ppm/°C24 ppm/°C35 ppm/°C14 ppm/°C28 ppm/°C
    Water absorption 24 h0.08%0.10%0.02%0.15%0.35%
    Desmear compatibilitystandard permanganatestandard permanganateplasma requiredstandard permanganatestandard permanganate
    Tensile strength58 MPa55 MPa20 MPa300 MPa70 MPa

    An OEM-qualified 14-layer AI accelerator carrier board with 100 Ω differential pairs and 0.5 mm BGA pitch used M9 prepregs with 1078 glass and two-step lamination. Impedance tolerance across a 450 mm panel was ±5%, measured by time-domain reflectometry after solder mask. Supplier-reported insertion loss for a 100 mm microstrip at 28 GHz is 0.65 dB/in, but published data for this specific configuration is limited to board supplier reports and independent fabricator coupon verification is required. Laser via ablation on 100 µm cores requires a UV fluence of 0.9 J/cm² and a double-pass sequence to maintain sidewall roughness below 3 µm after permanganate desmear; CO₂ laser processing is not recommended because the low-polarity resin absorbs 10.6 µm radiation poorly. In a production-scale lamination trial on a 24-layer, 3.0 mm backplane, edge-core Tg gradient was held to 4°C by using a 1.5°C/min cooling rate and 5°C/min heat-up ramp.

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