| HS Code | 724976 |
| Property 1 Dk Dielectric Constant | 3.0 - 3.5 at 10 GHz |
| Property 2 Df Dissipation Factor | < 0.002 at 10 GHz |
| Property 3 Tg Glass Transition Temperature | >= 200 °C |
| Property 4 Td Decomposition Temperature | >= 400 °C |
| Property 5 Peel Strength To Copper | >= 0.8 N/mm |
| Property 6 Moisture Absorption | <= 0.1 % |
| Property 7 Flexural Strength | >= 300 MPa |
| Property 8 Cte Z Axis Expansion | <= 40 ppm/°C |
| Property 9 Dielectric Strength | >= 50 kV/mm |
| Property 10 Resin Content Suitable For Ccl | 55 - 65 wt% |
As an accredited Low-Dielectric Modified PPO/PPE Resin (Df<0.002) for AI Server CCL factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.
| Packing | Packaged in 25 kg sealed aluminum foil bags, nitrogen-purged, moisture-proof with desiccant, for AI Server CCL low-dielectric resin. |
| Container Loading (20′ FCL) | 20′ FCL shipment of Low-Dielectric Modified PPO/PPE Resin (Df<0.002) for AI Server CCL, packed in drums on pallets, securely loaded. |
| Shipping | Shipping: Supplied in sealed, moisture-proof drums or containers to preserve low dielectric properties. Ship via standard freight, avoiding extreme heat, sunlight, and physical damage. Ensure proper labeling and secure palletization. Industrial use only. Handle with care to avoid leakage. |
| Storage | Store in a sealed, moisture-proof container in a cool, dry, well-ventilated area. Avoid direct sunlight, heat sources, and open flames. Maintain temperature below 25°C and protect from humidity. Keep tightly closed when not in use. Follow local regulations; use within manufacturer’s specified shelf life to preserve low dielectric properties. |
| Shelf Life | Shelf life is 6 months from manufacture if stored sealed, below 25°C, in a cool, dry, shaded area. |
At 56 Gb/s PAM4 and 112 Gb/s PAM4, the dielectric loss in a 100 Ω differential pair is directly proportional to the loss tangent of the laminate dielectric. For AI server backplanes with signal path lengths exceeding 600 mm and layer counts beyond 30, a laminate Df below 0.002 at 10 GHz is treated as a starting specification, not a margin. The modified PPO/PPE resin used in this application is formulated by blending a low-molecular-weight polyphenylene ether backbone with a low-polar crosslinker and a surface-treated fused silica filler. The filler median particle size is held between 1.5 µm and 2.5 µm, and the filler loading is varied from 20 phr to 35 phr depending on the target Z-CTE. Prepregs are produced on a vertical treater with resin content controlled at 65–72 wt% on 1078 glass and 58–65 wt% on 2116 glass. B-stage conditions are 155–170°C for 3–5 min, with residual flow tuned to 18–22%. Final lamination in a vacuum press is carried out at 210°C for 120 min under 2.5 MPa, with vacuum held below 100 Pa. The cured laminate exhibits a Dk of 3.3–3.5 and Df of 0.0018–0.0020 when measured by split-post dielectric resonator per IEC 61189-2-721 at 10 GHz. The glass transition temperature by DMA is 195–205°C, and the TGA decomposition temperature at 5% mass loss is 385–395°C. On production lots, the Z-CTE below Tg is 45–55 ppm/°C, and above Tg it rises to 260–290 ppm/°C; this creates residual stress in high-aspect-ratio via structures unless sequential lamination parameters are adjusted.
The insertion loss contribution of this dielectric at 28 GHz is measured on 50 Ω stripline coupons after 7 days at 85°C/85% RH; the Df shift under these conditions is below 0.0002 for well-cured material, but rises above 0.0005 when the degree of cure drops below 90%. Therefore the press cycle is not relaxed simply because the resin has low Df. Copper foil is specified as low-profile HVLP with Rz below 2.0 µm, because the skin-depth-dominated conductor loss at 112 Gb/s is sensitive to foil roughness. Fabricators have observed that changing from standard RTF foil to HVLP reduces insertion loss by 0.15–0.25 dB/in at 28 GHz, but peel strength falls from 1.1 N/mm to 0.75 N/mm; hence the filler interface and silane coupling package must be optimized to maintain 0.7 N/mm minimum after thermal stress per IPC-TM-650 2.4.8. Published data for the exact configuration of modified PPE/PPO with HVLP foil in 70-layer AI server backplanes remains limited, so fabricator qualification reports are typically used for first-pass design margins.
In sequential lamination of a 70-layer line card core, the cured PPE/PPO laminate is subjected to 5 or more additional press cycles at 200°C or higher. Each cycle oxidizes exposed copper and shifts the resin crosslink density, which can increase Df by 0.0003–0.0006 unless oxygen is excluded by nitrogen purge or vacuum. The through-via reliability in this stack is limited by resin starvation, not drill smear. When the minimum melt viscosity of the prepreg at 171°C falls below 1,200 Pa·s, resin fills the through-vias insufficiently under 2.0 MPa, producing annular voids at the via-pad interface. Qualification of a 0.20 mm diameter through-via in a 2.4 mm stack after 5 sequential lamination cycles is performed by cross-section and thermal stress at 288°C for 10 s according to IPC-TM-650 2.6.8. Plasma desmear uses a 2.45 GHz O₂/CF₄ plasma at 400 W for 30–60 min, but the PPE/PPO surface can re-deposit silica-rich residue if the CF₄ fraction is too low. The result is intermittent electroless copper coverage and a drop in via pull strength from 1.2 N to 0.6 N in failing lots. CAF resistance is measured at 85°C/85% RH under 50 V DC for 1,000 h per IPC-TM-650 2.6.25; accepted lots show no conductive filament bridging at 100 µm line-to-line spacing. The low-polar crosslinker network is beneficial here because it reduces the number of ionizable hydroxyl groups at the glass-resin interface, but only if the silane coupling package on the fused silica is fully hydrolyzed and condensed. Incomplete silane condensation yields residual silanol groups that increase moisture uptake by 0.03–0.05 wt% and shorten CAF life by approximately 40%.
| Property | 1078 glass prepreg | 2116 glass prepreg | Test method |
|---|---|---|---|
| Resin content | 65–72 wt% | 58–65 wt% | IPC-TM-650 2.3.16 |
| Dk at 10 GHz | 3.3–3.4 | 3.4–3.5 | IEC 61189-2-721 |
| Df at 10 GHz | 0.0018–0.0020 | 0.0019–0.0020 | IEC 61189-2-721 |
| Z-CTE below Tg | 45–55 ppm/°C | 50–60 ppm/°C | IPC-TM-650 2.4.24 |
| Td 5% | 385–395°C | 380–390°C | ASTM E1131 |
| CAF 85°C/85% RH, 50 V, 1,000 h | no failure | no failure | IPC-TM-650 2.6.25 |
For a through-via with diameter 0.20 mm and panel thickness 2.4 mm, the aspect ratio is 12:1. The modified PPE/PPO prepreg must retain sufficient flow to fill the via gap, but the same flow cannot flood the surface lands. Differential scanning calorimetry of the prepreg shows a cure exotherm peak at 185–195°C at a heating rate of 20°C/min. The resin is therefore staged to a gel time of 180–220 s at 171°C, which corresponds to a minimum melt viscosity of 1,300–1,600 Pa·s measured by oscillatory rheometry at 10 rad/s. If viscosity falls below 1,200 Pa·s, the resin tends to drain into the via and leave the pad regions starved; if viscosity exceeds 2,000 Pa·s, the via fills poorly and voiding occurs at the knee of the via. The press cycle is split into three stages: first, a low-pressure stage at 0.5 MPa from 120°C to 160°C to allow resin to enter the via; second, a flow stage at 2.0 MPa from 160°C to 190°C; and third, a cure stage at 2.5 MPa from 190°C to 210°C. The total cycle time above 180°C is 90–120 min. Degree of cure after this cycle is 94–96% by DSC residual enthalpy. A lower degree of cure of 90% is acceptable for initial dimensional stability, but it produces a Df increase of 0.0004–0.0007 after 24 h of 85°C/85% RH aging. Vacuum is maintained below 100 Pa during the entire heat-up stage because PPE/PPO oxidation can generate carbonyl species that raise Df at 10 GHz by 0.0003 and reduce Td 5% by 8–12°C.
When a fabricator replaces a hydrocarbon-based low-Dk resin with modified PPE/PPO in an 800G switch fabric CCL, the main process changes are not in lamination temperature but in prepreg tack control, filler wetting, and flame retardant compatibility. Halogen-free CCLs require UL 94 V-0 at the final laminate thickness, typically 0.45–0.60 mm. For Df-sensitive layers, phosphate-based flame retardants are kept below 3 wt% or replaced by nitrogen-based synergists because the P=O absorption band and moisture sensitivity can push Df from 0.0019 to 0.0026 at 10 GHz. The modified PPE/PPO resin has an inherent char yield of 28–32% at 800°C under nitrogen, which supports V-0 in thin cores when combined with 5–8 wt% zinc borate or melamine polyphosphate. However, melamine polyphosphate increases prepreg water absorption to 0.18–0.22 wt% after 24 h immersion, which degrades CAF margin. The press out-gassing profile shows higher condensate from the nitrogen-based flame retardant; thus vacuum pump filters require more frequent replacement, and the final vacuum level must remain below 100 Pa. On production treaters, the compounded resin is coated at 55–60°C because the solvent-free hot-melt viscosity at 100°C is 800–1,200 Pa·s. The lower viscosity compared to hydrocarbon systems improves glass wet-out but also increases resin dusting when the treater line speed exceeds 8 m/min. Published data for this exact halogen-free PPE/PPO configuration in 800G switch fabric CCL is limited; the values above are drawn from raw-material supplier bulletins and fabricator trial reports.
For thin-core package substrate applications, the same PPE/PPO backbone is compounded with a higher purity fused silica and coated on 1027 or 1035 E-glass. The target core thickness is 0.06–0.10 mm, and the panel size is 510 × 515 mm; warpage after thermal release must remain below 0.5%. The composite CTE is adjusted to 30–35 ppm/°C below Tg by increasing filler loading to 35–45 phr, but this reduces peel strength to 0.65–0.75 N/mm on HVLP foil. To maintain Df below 0.002 at 10 GHz, the silane coupling agent on the filler is limited to vinyl or methacryl silanes; amino silanes are excluded because residual amine accelerates PPE oxidation during 288°C solder float. The core is produced through hot-melt coating, B-staging at 160°C for 3 min, and vacuum lamination at 200°C for 90 min. For 0.06 mm cores, the press pad must be buffered with a compliant release sheet to reduce resin squeeze-out; without this, thickness variation exceeds ±10% and the core becomes unsuitable for fine-line semi-additive processing. Laser drillability at 355 nm UV is acceptable, but the silica-filled PPE/PPO produces a glass-rich residue that requires a two-step desmear: alkaline permanganate at 80°C for 10 min, followed by plasma at 2.45 GHz for 20 min. The residual Df after this two-step desmear shifts by less than 0.0002 if the rinse water conductivity is kept below 5 µS/cm.
| Parameter | Standard / method | Requirement | Typical qualified value |
|---|---|---|---|
| Dk at 10 GHz | IEC 61189-2-721 | 3.3–3.5 | 3.4 |
| Df at 10 GHz | IPC-TM-650 2.5.5.5 | <0.002 | 0.0019 |
| Flame retardancy | UL 94 | V-0 at 0.45 mm | V-0 |
| Glass transition | IPC-TM-650 2.4.25 | ≥190°C | 198°C |
| Z-CTE below Tg | IPC-TM-650 2.4.24 | ≤60 ppm/°C | 48 ppm/°C |
| CAF 85°C/85% RH, 50 V, 1,000 h | IPC-TM-650 2.6.25 | no failure | no failure |
| RoHS restricted substances | IEC 62321 | Pb, Hg, Cd, Cr VI, PBB, PBDE below limits | compliant |
| REACH SVHC | EC 1907/2006 | ≤0.1 wt% per SVHC | compliant |
After 1,000 thermal cycles from -40°C to 125°C, the peel strength of low-profile HVLP foil on a Df 0.002 PPE/PPO core drops from 0.85 N/mm to 0.62 N/mm when the filler interface lacks vinyl silane coverage. The failure location is not the copper-dielectric interface but a boundary layer of hydrolyzed silane and unfilled resin. Adhesion is measured per IPC-TM-650 2.4.8 after thermal cycling and after solder float at 288°C for 10 s. Production boards with Rz 1.2 µm HVLP foil show better 28 GHz insertion loss than Rz 2.5 µm RTF foil by 0.18–0.25 dB/in; however, the same roughness reduction lowers initial peel strength by 0.25–0.40 N/mm. For 112 Gb/s differential pair routing, the foil roughness is therefore specified as a maximum Rz 2.0 µm, not a minimum, and the resin system is formulated to compensate for adhesion through a combination of low-polar epoxy-functional adhesion promoter and controlled filler packing. The mechanical robustness of the adhesion promoter is limited: adding more than 1.5 wt% raises the Df at 10 GHz by 0.0003 and reduces the Td 5% by 5–8°C. After 1,000 cycles, cross-section inspection of failed strips shows microcracks extending along the glass-fiber bundle edges, indicating that the Z-CTE mismatch rather than bulk resin degradation dominates the adhesion loss. Fabricators therefore specify a maximum Z-CTE below Tg of 55 ppm/°C and a minimum filler loading of 25 phr for this layer stack.
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Introduced as a low-dielectric modified poly(phenylene ether)/poly(phenylene oxide) resin system for AI-server copper-clad laminate, the representative grade LD-PPE-002 is supplied as a toluene/MEK-soluble reactive thermoplastic with a dissipation factor Df < 0.002 at 10 GHz when cured into a laminate and measured according to IPC-TM-650 2.5.5.13. The system is specified for 800G-class line cards, switch backplanes, and accelerator-board CCL where insertion-loss budgets at 28 GHz are controlled below -0.85 dB/in for 85 Ω differential pairs. Unlike unmodified PPO/PPE, the grade contains a reactive end-cap that enters a free-radical cure with a styrenic crosslinker during B-stage and lamination, yielding a dielectric constant Dk of 2.45 ± 0.05 at 10 GHz and a glass transition temperature measured by dynamic mechanical analysis of 175–205 °C under IPC-TM-650 2.4.24.3.
The product’s primary differentiation in AI-server CCL is the combination of Df < 0.002 with halogen-free flame retardance at 0.8 mm laminate thickness under UL 94 V-0. In production-scale impregnation, the varnish is held at 25 °C with solids 62–68 wt% and viscosity 40–90 mPa·s, then applied to 1035 or 1078 E-glass fabric to produce prepreg with resin content 55–65 wt%. The low viscosity permits wet-out of low-profile copper foil, but batch-to-batch variation in residual solvent below 0.3 wt% must be controlled; higher retained solvent causes dielectric-loss drift of 0.00015–0.00025 at 10 GHz after solder reflow. The shipped pellets have a bulk density of 0.55–0.65 g/cm³ and moisture content ≤0.05 wt%. Pre-drying at 90 °C for 4 h is required when the resin is exposed to relative humidity above 60 %, because absorbed moisture hydrolyzes the phosphorus-based flame retardant during extrusion and increases Df scatter by 0.00010–0.00015.
Unmodified PPO/PPE exhibits a dielectric loss tangent in the range of 0.0007–0.0012 at 10 GHz in bulk form, but the high molecular weight required for mechanical integrity raises melt viscosity above 3000 Pa·s at 300 °C and 100 s⁻¹ under ISO 11443. This viscosity prevents adequate flow during lamination of high-layer-count boards, leaving voids between dense 0/90 weave bundles and low-profile copper. Copper adhesion is further limited by the lack of polar functional groups; peel strength on standard electrodeposited copper is typically below 0.4 N/mm under IPC-TM-650 2.4.8. The modified grade addresses these limitations by reducing melt viscosity to 1400–1800 Pa·s at 300 °C and 100 s⁻¹ and by incorporating a low-polarity adhesion promoter that raises copper peel strength to 0.7–1.1 N/mm without increasing Df above 0.002.
For AI-server CCL, the resin is combined in prepreg form with 10–25 phr of a low-Df hydrocarbon resin or 5–10 phr of a styrenic copolymer to adjust tack and B-stage flow. Filler addition is limited to fused silica with a median particle size D50 of 2.0–3.0 µm and maximum loading 20 phr; higher filler content raises minimum melt viscosity above 220 Pa·s and prevents void removal in 18-layer stacks. For halogen-free V-0 performance, phosphorus content in the cured laminate is maintained at 2.4–2.8 wt% by phosphorus analysis according to IPC-TM-650 2.3.28.
Table 1 provides the specification set for LD-PPE-002 as a neat resin and as a laminate on 1078 E-glass with 1-oz reverse-treated copper. The values are supplier specification limits, not statistical process-control averages; lot acceptance is based on the indicated method and frequency.
| Property | Test method | Specification |
|---|---|---|
| Dissipation factor at 10 GHz | IPC-TM-650 2.5.5.13 | Df < 0.002 |
| Dielectric constant at 10 GHz | IPC-TM-650 2.5.5.13 | 2.40–2.50 |
| Glass transition temperature by DMA | IPC-TM-650 2.4.24.3 | 175–205 °C |
| Degradation temperature, 5 % mass loss in N₂ | ASTM E1131-08 | > 390 °C |
| CTE, pre-Tg | IPC-TM-650 2.4.24.2 | 45–60 ppm/°C |
| Water absorption | IPC-TM-650 2.6.2.1 | 0.12–0.20 % |
| Melt viscosity at 300 °C, 100 s⁻¹ | ISO 11443 | 1400–1800 Pa·s |
| Copper peel strength after solder float | IPC-TM-650 2.4.8 | 0.7–1.1 N/mm |
| Flame retardance at 0.8 mm | UL 94 | V-0 |
| Df drift after 288 °C solder float × 3 | IPC-TM-650 2.5.5.13 | ΔDf ≤ 0.0002 |
Relative to other low-loss resins used in AI-server CCL, the modified PPE/PPE system occupies a processability–loss balance. Cyanate ester laminates achieve a higher Tg of 220–250 °C but exhibit Df of 0.005–0.008 at 10 GHz and require cure temperatures above 220 °C. PTFE-based laminates provide Df below 0.001 but need sintering temperatures above 350 °C and yield low copper adhesion unless the surface is etched with sodium naphthalenide. Hydrocarbon resin systems with Df in the 0.002–0.003 range have lower Tg of 140–170 °C, limiting performance in reflow-intensive assemblies. Compared with these, LD-PPE-002 is specified for lamination at 190–220 °C and retains a DMA Tg above 175 °C after cure.
| Resin system | Df at 10 GHz | Dk at 10 GHz | Tg | Process boundary |
|---|---|---|---|---|
| Modified PPO/PPE | < 0.002 | 2.40–2.50 | 175–205 °C | Lamination 190–220 °C; toluene/MEK varnish |
| Hydrocarbon resin | 0.002–0.003 | 2.40–2.60 | 140–170 °C | Lamination 180–200 °C; lower thermal stability |
| Cyanate ester | 0.005–0.008 | 2.80–3.00 | 220–250 °C | Cure above 220 °C; moisture uptake |
| PTFE | 0.0005–0.001 | 2.10 | No Tg; crystalline melt 327 °C | Sintering above 350 °C; adhesion limited |
| Epoxy | 0.015–0.025 | 3.50–4.00 | 150–180 °C | Lamination 170–190 °C |
| BMI | 0.005–0.010 | 2.90–3.20 | 260–300 °C | Cure 220–250 °C; brittle after cure |
Compounding of LD-PPE-002 on a 40:1 L/D co-rotating twin-screw extruder with side-fed flame-retardant solids requires barrel zones from 240 °C at the feed throat to 270 °C at the die. At die temperatures above 295 °C, the terminal vinyl or methacrylate groups begin thermally induced radical generation; capillary viscosity under ISO 11443 increases by 40–60 % within 90 s of residence time. Below 255 °C, the viscosity exceeds 2200 Pa·s, causing main-motor amperage spikes and non-uniform dispersion of the phosphorus-based flame retardant. Production-scale extrusion therefore uses melt pressure of 18–25 MPa before the screen pack and a die-face pelletizer water temperature of 35–45 °C to prevent hydrolysis of the phosphorus additive.
Prepreg varnish formulation uses a solvent blend of toluene:methylene chloride:MEK at 50:30:20 by weight where local emission permits allow; a toluene/MEK replacement at 70:30 raises varnish viscosity by 20–35 %. The reactive varnish has a pot life of 24 h at 25 °C; after 24 h, coating defects increase because microgel formation alters the resin-molecular-weight distribution. This is the principal operational boundary for high-volume impregnation: the working reservoir must be replenished continuously rather than left overnight.
During lamination of an 18-layer backplane, the prepreg stack is heated from 25 °C to 195 °C at 2.5–3.0 °C/min. The resin enters its minimum-viscosity window of 120–160 Pa·s between 150 °C and 175 °C. Void removal requires a vacuum below 2.7 kPa absolute for at least 20 min before full pressure of 2.0–3.0 MPa is applied. Pressure applied below 160 °C causes gelation ahead of void extraction; pressure applied above 185 °C produces copper-foil displacement and resin starvation at the board edge.
Copper-foil adhesion after lamination is sensitive to the surface treatment. Low-profile reverse-treated foils with Rz 2.0–3.0 µm give peel strengths of 0.7–0.9 N/mm; standard HTE foils with Rz 4.0–5.5 µm give 0.9–1.1 N/mm but increase conductor loss at 28 GHz by 3–5 %. The product is therefore specified with reverse-treated foil when the electrical insertion-loss budget is the controlling constraint.
Avoid amine-based catalysts and amine-cured epoxy additives because residual primary and secondary amines accelerate oxidative coupling of PPO terminal hydroxyls, shifting Df upward by 0.0002–0.0004 after 96 h of thermal aging at 150 °C under IPC-TM-650 2.5.5.13. The same mechanism reduces varnish stability and causes visible resin darkening in B-staged prepreg. If an epoxy modifier is added for adhesion, anhydride-cured or isocyanate-capped systems are preferred over amine-cured systems.
Free-radical cure kinetics of the reactive end-cap show an onset exotherm at 145 °C and a peak exotherm at 175 ± 5 °C by differential scanning calorimetry at 10 °C/min under ASTM E1356. The cure is 85–90 % complete after 60 min at 195 °C; post-cure above 200 °C for 2 h raises conversion to 95 % but increases crosslink density and reduces copper peel strength by 10–15 %. This is the main thermal-budget boundary in high-layer-count lamination.
In a representative 16-layer signal-integrity test vehicle with 100 Ω differential pairs, insertion loss measured by a vector network analyzer with a calibrated through-reflect-line kit is -0.65 dB/in at 14 GHz and -0.83 dB/in at 28 GHz after standard reflow. The extracted Dk at 28 GHz is 2.48 and Df is 0.0018 using split-cylinder resonator calibration. Published data for this exact stackup is limited and should be confirmed with the CCL fabricator’s coupon design.
The resin is not intended for sequential lamination processes exceeding 6 reflow cycles because cumulative oxidation increases Df by 0.00005 per cycle at 10 GHz after 288 °C reflow exposure; published data for this specific configuration is limited, and each CCL supplier must verify the value on the actual board stack.