| HS Code | 849944 |
| Chemical Name | 4,4'-Bismaleimidodiphenylmethane |
| Cas Number | 13676-54-5 |
| Molecular Weight | 358.35 g/mol |
| Appearance | Yellow crystalline powder |
| Density | 1.43 g/cm³ |
| Melting Point | 156-160 °C |
| Glass Transition Temperature Cured | ≥ 250 °C |
| Thermal Decomposition Temperature Tga 5 Weight Loss | ≥ 400 °C |
| Dielectric Constant 1 Mhz | 3.4-3.6 |
| Dissipation Factor 1 Mhz | 0.003-0.006 |
| Flexural Strength | 120 MPa |
| Water Absorption 24 H | < 1% |
As an accredited Bismaleimide (BMI) Resin for High-Temperature CCL & Packaging factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.
| Packing | Supplied in 25 kg sealed drums with moisture-proof inner lining, nitrogen purge, and clear hazard labeling for safe transport. |
| Container Loading (20′ FCL) | 20′ FCL loading of BMI resin in sealed drums, properly secured, with ventilation and moisture protection for safe transport. |
| Shipping | Bismaleimide (BMI) resin is shipped in sealed, moisture-proof containers to preserve reactivity. Store away from heat, ignition sources, and incompatible materials. Handle with gloves and eye protection. Standard ambient transport is suitable; avoid prolonged exposure to high temperatures to maintain product integrity and performance. |
| Storage | Store Bismaleimide (BMI) resin in a tightly sealed, moisture-proof container in a cool, dry, well-ventilated area away from direct sunlight, heat sources, and incompatible oxidizers. Keep storage temperature stable, ideally below 25°C, to prevent premature curing. Verify shelf life regularly; use first-in, first-out. Avoid skin contact and follow manufacturer’s handling guidelines. |
| Shelf Life | Store sealed in a cool, dry place. Shelf life is typically 6 months from manufacture if unopened. |
At low-solids varnish blending stations for halogen-free FR-4 replacement, the incorporation of bismaleimide resin into a novolac-epoxy backbone is typically conducted at 15–25 phr per 100 phr base epoxy resin, with the BMI component milled to a mean particle size below 10 μm and dispersed under high shear at 1500–2500 rpm until Hegman fineness reaches 5–6. The varnish viscosity is held between 180 and 320 mPa·s at 25°C to maintain 7628 glass fabric wet-out without excessive resin dusting; glass fabric is pre-dried to below 0.1% moisture because residual water generates voids at the BMI cure plateau. Halogen content is controlled to comply with IEC 61249-2-21, requiring chlorine below 900 ppm, bromine below 900 ppm, and total halogens below 1500 ppm; flame retardance is validated under UL 94 V-0 with afterflame times not exceeding 10 s after two 10-s flame applications. The laminate is pressed in a vacuum-assisted multi-opening hot press with platen temperature uniformity within ±2°C, heated at 1.5–3.0°C/min to 190–210°C, held for 90–120 min under 2.5–3.5 MPa, and post-cured at 220–230°C for 2–4 h. Glass transition temperature by DMA according to IPC-TM-650 2.4.24.1 or ASTM E1640 rises from approximately 165–175°C for unmodified halogen-free epoxy to 195–215°C with the BMI addition; T-288 resistance at 288°C is commonly specified above 60 min for lead-free assembly. The resulting CCL grade is slit into panels for automotive electronic control units, transmission controllers, electric power steering modules, server backplanes, and 5G base station transceiver boards.
Resin flow termination in BMI-modified prepreg is governed by the superposition of BMI homopolymerization kinetics and the epoxy novolac advancement, which narrows the gelation window to approximately 3–5 min once the prepreg surface temperature exceeds 180°C. In production-scale vacuum presses with 6-opening, 1200 mm × 1800 mm platens, the practical heating rate of 1.5–3.0°C/min creates a through-stack temperature lag of 6–12°C between the outer copper-clad layer and the center prepreg core; when the outer layers reach the BMI cure onset near 185°C, the center may remain below the gel point, causing non-uniform resin flow and centerline resin starvation. The addition of BMI at 20–30 phr per 100 phr epoxy shifts the complex viscosity at 150°C from approximately 800–1200 Pa·s to 2400–4000 Pa·s, as measured by parallel-plate rheometry at 1 Hz, and reduces the minimum melt viscosity window by 40–60%. To compensate, lamination recipes use stepped pressure profiles: 0.8–1.2 MPa during the first 10–15°C rise above 140°C, followed by 2.5–3.5 MPa only after surface thermocouples confirm 165–175°C, then a 180–220°C cure plateau for 90–150 min. Non-isothermal DSC at 5, 10, 15, and 20 K/min by ASTM E698 gives apparent activation energy between 85 and 110 kJ/mol for the BMI-epoxy co-cure, which quantifies the sensitivity of gel time to small temperature excursions. Failure modes observed on the line include edge-flow streaks, dry weave at the center of 12-layer boards, and white spots under copper foil after solder float at 288°C for 10 s according to IPC-TM-650 2.4.13. T-288 test acceptance is typically set at greater than 30 min, while T-300 is specified above 5 min for thick copper power boards. Because free primary aliphatic amines undergo rapid Michael addition with BMI, accelerator packages are reformulated toward latent imidazole or dicyandiamide systems; otherwise pot life drops below 24 h at 25°C and varnish gelation is observed in the treater tray. The terminal formats include power modules, automotive LED driver boards, and industrial power converter multilayers, where the high glass transition temperature of 200–215°C by DMA and thermal decomposition onset above 380°C by ASTM E1131 provide the necessary thermal margin.
Where thin-core package substrates move from conventional epoxy to bismaleimide–triazine systems, the immediate process variable is resin content on 1027 and 1035 glass cloth, which is raised to 55–70 wt% to achieve flatness and dimensional stability after through-hole formation. Commercial BT core laminates for FC-BGA, system-in-package, and antenna-in-package applications maintain a cyanate ester-to-BMI weight ratio between 70:30 and 30:70; the BMI component raises crosslink density and lowers x-y thermal expansion, while the cyanate ester component moderates dielectric loss. The varnish is solvent-based and coated at 8–15 m/min on vertical treaters with staged drying from 110°C to 180°C; B-stage prepreg is controlled to a volatile content below 1.5% and a gel time of 180–260 s at 171°C. Lamination is conducted at 200–230°C under 3.0–4.0 MPa for 90–180 min, followed by a nitrogen post-cure at 220–240°C for 2–4 h to complete cyanate ester trimerization and BMI addition reactions. Compliance is verified against IPC-4101E/121 for low-CTE package substrate laminates, JEDEC JESD22-A104 for thermal cycling from −40°C to 125°C, and IPC-TM-650 2.4.24.1 for glass transition temperature; x-y CTE is measured by ASTM E831 between 50°C and 100°C and is typically constrained to 10–14 ppm/°C in the glass axis. The resulting cores are delivered as 0.1–0.3 mm panels for FC-BGA carriers used in CPUs, GPUs, application processors, and 5G millimeter-wave antenna-in-package modules.
| Cyanate ester / BMI weight ratio | DMA Tg (°C) | X-Y CTE (ppm/°C) | Dk at 10 GHz | Df at 10 GHz | Water absorption (%) |
| 70:30 | 245–260 | 12–14 | 3.2–3.5 | 0.004–0.006 | 0.25–0.35 |
| 50:50 | 260–280 | 10–12 | 3.4–3.7 | 0.005–0.008 | 0.30–0.45 |
| 30:70 | 280–300 | 9–11 | 3.6–3.9 | 0.007–0.010 | 0.35–0.50 |
Thermally, BMI-crosslinked poly(phenylene ether) laminates exhibit a narrower cure margin than standard hydrocarbon systems because the BMI radical addition and PPE chain extension compete during the same 180–210°C press plateau; this imposes a maximum useful BMI addition of 5–15 phr per 100 phr PPE resin before the cured network shows measurable dielectric loss increase. The varnish is prepared by dissolving PPE resin in toluene or xylene, dispersing BMI powder under high shear at 1500–2500 rpm, and adding silica filler to 25–45 wt% of total solids; viscosity is held at 300–600 mPa·s at 25°C for slot-die coating onto 1035 or 1078 glass. Prepreg drying is conducted at 120–150°C to a volatile content below 1.0%, and lamination is performed at 200–220°C under 2.0–3.0 MPa for 60–120 min. Dielectric constants at 10 GHz, measured by split-post dielectric resonator according to ASTM D7449, typically fall between 3.4 and 3.8, with dissipation factor from 0.003 to 0.006; thermal decomposition temperature by ASTM E1131 remains above 400°C at 5% mass loss. UL 94 V-0 is retained through halogen-free flame retardant packages, and RoHS Directive 2011/65/EU compliance is documented at the homogeneous material level. The resulting laminates enter millimeter-wave radar antenna boards, 5G small-cell filters, and high-speed digital backplanes where the combination of low Df and high solder float resistance is required.
Replacement of low-Dk epoxy at 77 GHz radar antenna board production is contingent on controlling the cyanate ester–BMI cure exotherm and the nitrogen-rich heterocyclic structures that raise moisture uptake above epoxy-equivalent levels. The cyanate ester-to-BMI weight ratio is commonly maintained at 60:40 to 50:50; higher BMI fractions above 50 wt% increase crosslink density but also introduce imide carbonyl groups that elevate dissipation factor at 79 GHz beyond 0.008 when measured by split-post dielectric resonator according to ASTM D7449. Raw materials are pre-dried below 0.05% moisture when floor RH exceeds 60%, because absorbed water accelerates cyanate ester hydrolysis and produces carbamate side products that widen the Dk distribution across a panel. The prepreg is produced on a vertical treater with staged ovens from 120°C to 170°C, maintaining B-stage volatile content below 1.2% and a flow window above 15% at 170°C. Lamination uses a ramp-hold program of 170°C for 30 min, 190°C for 30 min, 210°C for 60 min, and 240°C for 120 min under nitrogen back-fill to prevent oxidative darkening of the copper foil; press pressure is raised from 0.7 MPa to 3.0 MPa after the melt viscosity minimum, which occurs at 150–170°C. CTE in the x-y direction is controlled to 10–13 ppm/°C by ASTM E831, and T-300 at 300°C is specified above 30 min for assembly compatibility. JEDEC JESD22-A104 thermal cycling from −40°C to 125°C is used to qualify the substrate for automotive radar modules, where solder-joint reliability is directly tied to in-plane expansion. The terminal parts include 77–79 GHz radar antenna boards, adaptive cruise control sensors, and short-range corner radar modules. Published data for exact commercial resin ratios in proprietary radar laminates is limited; however, the ranges above correspond to publicly reported formulations and production lot data.
| Application scenario | Standard / directive | Test method / clause | Key control target |
| Halogen-free high-Tg CCL | IEC 61249-2-21 | halogen extraction | Cl < 900 ppm; Br < 900 ppm; total < 1500 ppm |
| Halogen-free high-Tg CCL | UL 94 V-0 | vertical burn | afterflame ≤ 10 s |
| Halogen-free high-Tg CCL | IPC-TM-650 2.4.24.1 | DMA Tg | 195–215°C |
| Package substrate core | IPC-4101E/121 | low-CTE laminate | X-Y CTE 10–14 ppm/°C |
| Package substrate core | JEDEC JESD22-A104 | thermal cycling | −40°C to 125°C |
| 77 GHz radar laminate | ASTM D7449 | split-post dielectric resonator | Df at 10 GHz ≤ 0.006 |
| Metal-base power laminate | IEC 60068-2-14 | thermal cycling | −40°C to 125°C |
A recurring bottleneck in high-layer-count board lamination is the bond-line thickness drift caused by BMI-modified prepreg flow during the vacuum press cycle, especially when 10–20 wt% BMI is blended into an epoxy adhesive film for high-density interconnect and rigid-flex multilayer builds. The adhesive film is coated on a comma coater or slot-die line at 50–100 μm dried thickness onto 1080 or 2116 glass after silane coupling treatment; B-stage cure is held at 120–150°C to keep the residual flow above 20% and volatiles below 0.8%. During lamination, temperature is ramped at 2–4°C/min to 170–200°C and pressure is held at 1.5–2.5 MPa for 60–120 min; the BMI component reduces bond-line collapse and increases the post-cure glass transition temperature from approximately 150–160°C to 180–200°C by DMA according to IPC-TM-650 2.4.24.1. Peel strength on low-profile copper foil remains above 0.8 N/mm after thermal stress, as tested by IPC-TM-650 2.4.8; moisture absorption is controlled below 0.30% after 24 h immersion to prevent conductive anodic filament formation in high-density layouts. Compliance records include UL 94 V-0, IEC 61249-2-21 halogen limits, and RoHS Directive 2011/65/EU at the homogeneous material level. Terminal formats include 8–20-layer HDI rigid-flex boards, high-layer-count server boards, and advanced driver assistance system camera modules.
In insulated metal substrate lines for IGBT power module packaging, BMI resin is added at 20–40 phr per 100 phr epoxy to the dielectric adhesive layer to prevent thermal degradation during wire bonding and solder reflow at 260–288°C. The high-viscosity compound is mixed with alumina or boron nitride filler at 60–85 wt% filler loading and coated onto aluminum or copper base plates at 100–200 μm dry thickness; the filler network raises thermal conductivity to 2–4 W·m⁻¹·K⁻¹, while the BMI network maintains dielectric strength above 20 kV/mm under oil. Lamination is carried out at 190–210°C under 3.0–5.0 MPa for 90–180 min, followed by a 220°C post-cure for 2 h. Thermal cycling qualification follows IEC 60068-2-14 with −40°C to 125°C cycles, and JEDEC JESD22-A104 is applied for package-level reliability; flame retardance is certified to UL 94 V-0, and REACH Regulation (EC) No 1907/2006 Annex XVII restrictions are screened for the filler and resin system. The resulting metal-base CCL is used in IGBT modules, EV inverter power stages, motor drive power modules, and renewable energy converter assemblies, where the failure mode of interest is delamination at the copper-resin interface after 1000 thermal cycles.
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Bismaleimide (BMI) resin grade BMI-2600H is supplied as an amber solid flake based on 4,4′-bismaleimidodiphenylmethane and 2,2′-diallyl bisphenol A. The base monomer has a molecular weight of 358.35 g/mol and a maleimide equivalent weight of 179.2 g/eq. Cure proceeds through an ene reaction between allyl and maleimide groups, followed by Diels-Alder cycloaddition and thermal isomerization; the addition-cure network releases no water or low-molecular-weight volatile by-products. That behaviour distinguishes the resin from polyamic acid polyimide systems, which require imidization and evolve solvent and water during cure. Published lot-to-lot data for this specific formulated grade is limited; the numerical ranges below represent supplier certificates of analysis and typical cured-panel values rather than independent multi-laboratory validation.
The resin is offered as neat flake, powder, and as a 65 wt% solids varnish in an 80:20 weight ratio of methyl ethyl ketone to propylene glycol methyl ether acetate. Typical varnish viscosity at 25 °C is 30–60 mPa·s by ASTM D2196-20. Neat resin softening point is 70–90 °C by ASTM E28-18, complex melt viscosity at 150 °C is 0.8–2.5 Pa·s by ASTM D4440-15, and gel time at 171 °C is 140–220 s. Residual volatile content after b-staging is targeted at ≤0.8 wt%. After a cure schedule of 190 °C for 2 h plus 250 °C for 4 h, the cured resin exhibits a DMA glass transition temperature of 285–310 °C by ASTM D7028-07e1, thermal decomposition at 5% weight loss of 430–460 °C in nitrogen by ASTM E1131-20, and coefficient of linear thermal expansion below Tg of 40–50 ppm/°C by ASTM E831-19.
Water absorption after 24 h immersion at 23 °C is 0.8–1.2 wt% by ASTM D570-22. Dielectric constant at 10 GHz on cured plaques is 3.3–3.5, and dissipation factor is 0.004–0.006 by IPC-TM-650 2.5.5.9. Outgassing by ASTM E595-15 after 125 °C for 24 h gives total mass loss of 0.1–0.3% and collected volatile condensable material of ≤0.05%, which is relevant for cavity packages and hermetic module designs.
Relative to standard high-Tg epoxy, the cured BMI network provides a larger margin against decomposition and dimensional instability. In a multilayer CCL, an epoxy with DMA Tg near 160–180 °C is typically limited to short excursions above 240 °C, whereas BMI-2600H retains a solid-state modulus above 1 GPa to 260–280 °C. The comparative data below are taken from cured-panel measurements using the cited methods.
| Property | Test method | BMI-2600H | High-Tg epoxy | Bismaleimide triazine resin | Cyanate ester |
|---|---|---|---|---|---|
| DMA glass transition temperature | ASTM D7028-07e1 | 285–310 °C | 150–180 °C | 220–270 °C | 250–300 °C |
| Thermal decomposition temperature, 5% mass loss in nitrogen | ASTM E1131-20 | 430–460 °C | 320–360 °C | 380–410 °C | 400–430 °C |
| Coefficient of linear thermal expansion below Tg | ASTM E831-19 | 40–50 ppm/°C | 45–65 ppm/°C | 45–60 ppm/°C | 45–60 ppm/°C |
| Dielectric constant at 10 GHz | IPC-TM-650 2.5.5.9 | 3.3–3.5 | 3.8–4.2 | 3.0–3.4 | 2.8–3.2 |
| Dissipation factor at 10 GHz | IPC-TM-650 2.5.5.9 | 0.004–0.006 | 0.015–0.020 | 0.004–0.007 | 0.003–0.006 |
| Water absorption, 24 h immersion | ASTM D570-22 | 0.8–1.2% | 1.5–2.5% | 1.0–1.8% | 1.5–2.5% |
The principal differentiation is decomposition margin. BMI-2600H begins thermal decomposition at 430–460 °C, which is 70–100 °C above a typical high-Tg epoxy and 20–30 °C above a typical cyanate ester. Cyanate ester retains lower dielectric loss, but its higher equilibrium moisture uptake and brittleness require tighter laminate handling and storage controls. Bismaleimide triazine systems occupy an intermediate position in signal loss and moisture resistance but generally report lower peel strength and longer gel times; the selection therefore depends on whether the design is thermally limited, signal-integrity limited, or copper-adhesion limited.
Compared with high-molecular-weight polyimide films, the BMI system does not require high-temperature imidization, and it can be processed on standard epoxy treater and press equipment. However, the cured BMI network is less ductile than thermoplastic polyimide and must be formulated with diallyl bisphenol A for peel and flexural fatigue resistance.
For high-density interconnect designs with 25–50 µm line and space, conductive anodic filament resistance is evaluated at 85 °C and 85% relative humidity under 50 V DC by IPC-TM-650 2.6.25. Typical time to failure exceeds 1000 h for BMI-2600H-based laminates, although published data for this specific laminate configuration is limited and must be verified on the finished stack-up.
At the lamination press, the practical operating window is controlled by the interval between resin melt flow and gel onset. During b-staging on a horizontal treater with a 15 m drying tunnel zoned at 90 °C, 120 °C, and 130 °C, 7628 E-glass fabric is processed at 18–25 m/min to produce prepreg with 40–50 wt% resin content, volatile content ≤0.8 wt%, and 171 °C flow of 25–40%. The resin exhibits minimum complex melt viscosity of 0.5–2.5 Pa·s at 120–150 °C and gel onset at 170–190 °C. A lamination ramp of 3–5 °C/min through this region permits volatiles to escape before crosslinking; ramp rates above 7 °C/min have produced void contents above 2% when measured by IPC-TM-650 2.3.30.
Rheological characterization is performed on a parallel-plate rotational rheometer with 25 mm diameter plates and a 1 mm gap. Dynamic temperature ramps at 3 °C/min from 80 to 250 °C track complex viscosity, storage modulus, and loss modulus; gelation is assigned to the G′/G″ crossover at 170–190 °C. Disposable plate systems are required because cured BMI strongly adheres to metal tooling. Release agents containing silicone should be avoided to prevent contamination of subsequent electroless copper metallization.
Press cure is typically 180–220 °C for 60–120 min at 20–40 kg/cm², followed by an oven post-cure of 200–250 °C for 2–4 h. Vacuum-assisted pressing with absolute pressure below 2 kPa during heat-up is used for thick multilayer panels because entrapped solvent lowers dielectric breakdown strength. Incomplete post-cure is measured as a Tg depression of 15–30 °C and an increase in dissipation factor at 10 GHz of 0.001–0.002; post-cure residence time is therefore monitored by differential scanning calorimetry residual exotherm, with the target below 5 J/g after final cure.
Formulation latitude exists through filler addition. Adding 10–30 wt% fused silica reduces CTE to 30–38 ppm/°C but increases varnish viscosity and reduces 171 °C flow to 15–28%; the lamination pressure is then increased to 30–50 kg/cm² to maintain wetting. The same filler addition can lower Dk to 3.0–3.3 at 10 GHz if low-loss silica is used. Halogen-free CCL constructions may incorporate 10–20 wt% phosphorus-based flame retardant to achieve UL 94 V-0; this addition is known to raise water absorption by 0.2–0.5 percentage points.
The resin is incompatible with free amine accelerators and imidazole catalysts above 0.1 phr; addition at higher levels causes gelation during varnish mixing or prepreg drying. Pre-drying at 80–100 °C for 4–6 h is required if product has been stored above 60% relative humidity. Storage below 5 °C extends shelf life to 6 months; material held at 25 °C should be used within 3 months.
Laser-via processing of cured CCL from BMI-2600H employs either UV or CO₂ drilling; the carbonaceous residue is removed by alkaline potassium permanganate desmear at 60–80 °C for 3–5 min, followed by glass etching and electroless copper deposition. Copper foil adhesion on treated surfaces is typically 0.8–1.2 N/mm by IPC-TM-650 2.4.8. In semiconductor package substrate applications, the resin is used for core and buildup layers that must survive multiple lead-free reflow cycles at 260 °C; dimensional movement after 6 cycles is typically below 0.15% in the x-y plane when measured by thermal mechanical analysis on constrained panels. Published data for this specific configuration is limited, so package qualification should include solder shock and pressure cooker testing to JEDEC J-STD-020E profiles.