|
HS Code |
120490 |
| Common Name | Trifluoromethane |
| Iupac Name | Trifluoromethane |
| Chemical Formula | CHF3 |
| Molar Mass | 70.01 g/mol |
| Cas Number | 75-46-7 |
| Appearance | Colorless gas |
| Odor | Slightly ethereal |
| Boiling Point | -82.1 °C |
| Melting Point | -155.0 °C |
| Density | 4.247 kg/m³ (at 25 °C) |
| Solubility In Water | Moderate |
| Vapor Pressure | 4.24 MPa (at 21.1 °C) |
| Autoignition Temperature | 728 °C |
| Flammability | Non-flammable |
| Un Number | 2451 |
As an accredited Trifluoromethane factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.
| Packing | A high-pressure steel cylinder labeled "Trifluoromethane, 99.9% pure, 10 kg". Warning symbols indicate flammable gas and pressurized contents. |
| Shipping | Trifluoromethane is shipped as a compressed, liquefied gas in high-pressure cylinders. It is classified as a hazardous material due to its asphyxiation risk and pressurized state. Cylinders must be properly labeled, securely fastened, and protected from physical damage during transport. Handling must comply with international, federal, and local regulations. |
| Storage | Trifluoromethane should be stored in tightly closed, clearly labeled cylinders or containers, in a cool, dry, well-ventilated area, away from heat, sparks, flames, and incompatible substances. Cylinders should be secured upright to prevent tipping. Avoid direct sunlight and temperatures above 52°C (125°F). Storage areas must be equipped with appropriate gas detection and ventilation systems to prevent hazardous accumulation. |
Applications of Trifluoromethane in Industrial ManufacturingAs an original manufacturer of specialty chemical raw materials, we supply high-purity trifluoromethane to leading downstream industries. This gas finds targeted application in semiconductor etching, fluorine chemical synthesis, plasma chemistry, and refrigerant gas formulation. Below are detailed use cases relevant to traceable production environments. 1. Dry Etching Gas for Semiconductor Device FabricationLeading semiconductor fabs use high-purity trifluoromethane as a precise etchant in dielectric and tungsten patterning steps. The gas enables consistent anisotropic profiles during the critical plasma dry etching of advanced memory and logic node features. Process engineers select the ratio and flow rate based on microstructure geometry, layer stack materials, and chamber configuration. Quality teams enforce rigorous sub-ppb contaminant limits throughout all delivery and storage steps to ensure process integrity. Industry compliance standards
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2. Feedstock for Specialty Fluorochemical SynthesisChemical producers adopt trifluoromethane as a fluorine-transfer reagent in the commercial-scale manufacture of fine and specialty fluorinated chemicals, where selectivity and yield optimization are critical. As a direct fluorine source in halogen-exchange and nucleophilic fluorination steps, strict process analytics and material traceability support downstream product qualification for agrochemical, electronic, or pharmaceutical end uses. Industry compliance standards
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3. Plasma Chemistry for Surface ModificationCompanies in advanced materials and display technologies use trifluoromethane for plasma-based surface activation and cleaning processes on glass, metals, and polymers. Controlled introduction of the gas provides enhanced fluorination at the substrate interface, increasing hydrophobicity and adjusting surface energy for downstream wet process compatibility. Operators calibrate dosing according to substrate composition and target application. Industry compliance standards
Typical usage ratio
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4. Refrigerant Blending Component for Heat Management ApplicationsTrifluoromethane serves as a vital blending component in several next-generation refrigerant gas formulations with low global warming potential and high thermodynamic efficiency. Producers formulate HFC and HFO blends under tightly controlled conditions, adjusting ratios to meet targeted cooling performance, pressure ratings, and compliance with international environmental protocols. Industry compliance standards
Typical usage ratio
Downstream process integration
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Years ago we saw a gap forming in the chemical landscape. The market started asking for a solution that could balance efficiency and a lighter environmental load. We rolled up our sleeves and poured resources into Trifluoromethane production, putting our on-site reactors to work. Every batch that leaves our plant meets purity thresholds demanded by semiconductor etching, refrigeration, and specialty chemical processes. This gas stands out for a reason: you won’t find chlorinated impurities sneaking into our cylinders. The focus stays squarely on reducing metal contamination, since chip and flat panel lines count every defect.
Long before Trifluoromethane attracted wider attention as a nuanced working fluid, we knew its C3 medical and electronics track record pointed to higher value than generic alternatives. Our intermediate chemists collaborate side by side with engineers, fine-tuning purification columns and running mid-process QA that tracks real ppm-level variance. Through each stage, we keep the material dry and oxygen-free; even trace water vapor can skew reactivity and stall customer throughput. Regular third-party audits back up this commitment.
We don’t pretend Trifluoromethane is interchangeable with bulk refrigerants or other fluoro-organic gases. Each order reflects lab-verified characteristics: content over 99.99%, helium leak testing for packaging, and oil-free filling lines eliminating risk of background hydrocarbons. Cylinder sizes suit both R&D and full-scale fab lines—no oversized tanks creating dunnage headaches. After years processing bulk volumes for plasma process tool OEMs, we learned that surface passivation can’t be an afterthought. Surface chemistry inside our cylinders gets checked so nobody draws down reactive traces during critical tool startup.
Customers in high-tech industries watch every potential point of introduction, so we keep a clear chain of custody on each lot. Large facilities send cross-functional teams to audit our loading stations and blend rooms. In the rare event of nonconformity, real operators—not call center staff—work with the end user to walk back through every handling step. Feedback gets captured in our process logs and triggers both corrective action and preventive maintenance bookings. It’s the only way we keep failures vanishingly rare.
Not every customer comes asking for the same thing. In plasma etching lines, Trifluoromethane acts as an etchant and source of reactive fluorine. Because it dissociates cleanly without seeding chlorine or bromine into vacuum chambers, fabs that chase nanometer-scale pattern integrity demand it. Downstream, other hydrofluorocarbons leave residue or fouling on aluminum and copper traces; ours avoids this step and spares operators from expensive downtime. Engineers at our main customer sites flag its greater selectivity as a top factor keeping yields up.
Solid-state device fabricators depend on Trifluoromethane’s tight delivery. One mask misfire can mean hours of lost production or, worse, entire wafer lots written off. Our gas enables pattern transfer and chamber cleaning without setting off cross-contamination. Electronics-grade specs require just the right blend of reactivity and purity. Refrigerant use is a distant second for our volume, but for cryogenic systems—MRI cooling, superconducting magnets, physics labs—a non-flammable, stable refrigerant opens up safer and more predictable low-temperature runs. Older CFCs or HCFCs don’t stack up when reliability and regulatory targets both matter.
As chemical manufacturers, we see daily the missteps that come from chasing raw speed or the lowest raw material cost. Consistent Trifluoromethane comes from reactors built for the long view. Years of investment in fluorination technology allow us to avoid side reactions and sidestep process upsets that can produce unwanted byproducts. Garbage in, garbage out—one slip in fluorine feed control or reaction time throws off a whole day’s work. Most of our technical staff have been running these units for a decade or longer, and their collective know-how shapes every shift. Internally, we benchmark each plant run and publish stats on achievable impurity reduction, so every operator sees the line between acceptable and exceptional.
There’s no magic to our supply chain. We start with vetted raw materials from global sources—the same feedstocks sent directly to pharma and microelectronics. Before we let any precursor through, it sees full spectral fingerprinting. As we scale the process, batch records and sample points map each reactor cycle, giving us the ability to track deviations in real time rather than after the fact. We don’t keep a “black box” on plant operations, and our QC team knows a missing log sheet means an incomplete batch.
After chemical synthesis, multiple stage distillation strips volatile organic impurities, acids, and trace metals. We check every product lot in-house with gas chromatography, FTIR, and moisture analysis. Steam, utility lines, and vent gas all run through closed loops—years of experience taught us that even minor backflow or unfiltered bleed can corrupt a valuable run. Over time, process improvements have cut our reject rate by over 80%. Actual people on the plant floor make that possible; we keep turnover low by training for promotion and solving problems with hands-on fixes.
Over decades we’ve paid close attention to side-by-side tests against other etchants and refrigerants. Relative to gases like hexafluoroethane or perfluoropropane, Trifluoromethane exhibits higher reactivity under lower power plasma, and breaks down more selectively. Its molecular structure lets tool makers design for sharper etch profiles or less collateral attack, especially on advanced foundry lines. In refrigeration, compared to legacy blends, the low ozone-depletion potential scores points with compliance inspectors—and the narrower boiling range lets cryo units operate with steadier head pressures and fewer oil carryover issues.
Users consistently mention how our strict limits on chlorides and sulfur make maintenance outages less frequent. We shaved the variations in delivery down to negligible levels, avoiding spikes that could upset endpoint detection algorithms or stress wafer edge profiles. Competitors may offer nominally “equivalent” products, but field feedback shows that switching between brands excites maintenance crews and can toll yield in subtle ways. We stick to the same recipe batch after batch to keep the learning curve shallow, and our regular data review with fab process engineers uncovers improvement areas rapidly.
Producing top-grade Trifluoromethane involves a constant balancing act. The industry tightens tolerances every year, pushing specs for moisture, non-volatile residue, and volatile inorganics even lower. Regulatory environments shift, particularly for gases with warming potential. We engage directly with local and international standards bodies, rather than scrambling to adapt late. Over the last five years, we’ve halved greenhouse gas emissions per ton produced, by recovering effluent and sending it through on-site destruction units before any venting. Tracking supply and regulation, we maintain deep reserves to buffer against upstream hiccups and work with customers to arrange flexible delivery. Never just-in-time; we take responsibility for continuity.
Our approach includes real-time monitoring of every bulk tank and shipping vessel. Before any truck leaves our gates, in-line sensors confirm cylinder pressures and check for leaks. Beyond compliance, we see this transparency as practical—nobody wants to recall a delivery or lose days to unnecessary root cause analyses. In the rare event of a supply chain disruption, we talk directly with end users to coordinate backup plans. This proactive stance shields process schedules for manufacturers in sectors where shut-downs cascade to costly delays. Because we fill each vessel in-house, there’s no handoff to third parties that could introduce contamination or chain-of-custody confusion.
As long-term producers, we pay close attention to feedback at the customer edge. Process engineers ask for ever-purer inputs, and as more fabs move to three-dimensional architectures, the margin for error shrinks. In-house R&D targets new purification methods, tighter component tracking, and rapid-response analytics. We partner up with tool makers and academic labs, supporting targeted studies and pilot line trials. Growing demand for lower-emission process gases pushes us to respond with greener production—and we push waste recovery and gas scrubbing technologies harder each budget cycle.
We stay realistic about market volatility. Price spikes, regulatory proposals, or raw material bottlenecks arrive with little warning. Having seen firsthand the disruption caused by sudden policy lurches on CFCs and HFCs, we invested in forward-looking compliance systems and robust risk management. Internally, that means close inventory controls, regular drills for upset response, and full traceability on every batch. Newer applications—think quantum computing or emerging battery chemistries—drive experiments with blends or doped streams. Where customer specs diverge from baseline, our pilot-scale synthesis allows us to run trials before committing tonnage to commercial lines.
Many players in the chemical supply chain make big promises about service and traceback, but genuine manufacturer-to-customer ties run deeper. We control every step from synthesis through fill, so if something goes off-spec, the fixes come from within our own walls. End users stop by our plant and walk the lines, checking operations for themselves. Field engineers spend time at customer sites dealing with actual production challenges, not just arm’s-length support calls. We respond in person, answer technical questions directly, and draw on years of in-house troubleshooting data to resolve issues.
Direct supply builds trust and keeps risk low for customers who depend on process stability. If a reactor fouls or a batch falls near a spec limit, accountability stays local—not shipped down the line to a nameless third party. Feedback works both ways; plant managers review customer returns and less-than-perfect feedback in our morning meetings, closing the gap between lab reports and real-world demands. We’ve learned that honest conversations and a transparent approach to material supply put everyone on steadier ground.
As the market shifts and expectations rise, we keep our focus close to the source: clean chemistry, dependable delivery, and full visibility for buyers demanding more from their suppliers. Trifluoromethane will continue to play a central role in precision manufacturing and safe, efficient refrigeration, but the platform supporting it hinges on real-world diligence and responsive innovation. Our experience—drawn directly from the plant floor and reinforced by long-term partnerships—guides us as we work to meet these new industry benchmarks. With direct feedback loops and robust technical know-how, we shape our process around what matters most to those on the production line. This is not just another product, but an ongoing investment in trust, reliability, and advancement for every operator who relies on flawless supply.